BR7207887D0 - Processo para a producao de um revestimento estabilizador e/ou isolante em superficies semicondutoras - Google Patents

Processo para a producao de um revestimento estabilizador e/ou isolante em superficies semicondutoras

Info

Publication number
BR7207887D0
BR7207887D0 BR7887/72A BR788772A BR7207887D0 BR 7207887 D0 BR7207887 D0 BR 7207887D0 BR 7887/72 A BR7887/72 A BR 7887/72A BR 788772 A BR788772 A BR 788772A BR 7207887 D0 BR7207887 D0 BR 7207887D0
Authority
BR
Brazil
Prior art keywords
stabilizer
production
insulating coating
semiconductor surfaces
semiconductor
Prior art date
Application number
BR7887/72A
Other languages
English (en)
Portuguese (pt)
Inventor
R Berkner
Original Assignee
Semikron Gleichrichterbau
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semikron Gleichrichterbau filed Critical Semikron Gleichrichterbau
Publication of BR7207887D0 publication Critical patent/BR7207887D0/pt

Links

Classifications

    • H10W74/47—
    • H10P14/6306—
    • H10P14/6308—
    • H10P14/6312—
    • H10P14/6508—
    • H10P14/6509—
    • H10P14/6536—
    • H10P14/6538—
    • H10P14/683—
    • H10W74/131—
    • H10P14/6304—
    • H10P14/6342—
    • H10P14/6686—
    • H10P14/6922—
BR7887/72A 1971-11-10 1972-11-10 Processo para a producao de um revestimento estabilizador e/ou isolante em superficies semicondutoras BR7207887D0 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2155849A DE2155849C3 (de) 1971-11-10 1971-11-10 Verfahren zur Herstellung eines stabilisierenden und/oder isolierenden Überzuges auf Halbleiteroberflächen

Publications (1)

Publication Number Publication Date
BR7207887D0 true BR7207887D0 (pt) 1973-09-25

Family

ID=5824722

Family Applications (1)

Application Number Title Priority Date Filing Date
BR7887/72A BR7207887D0 (pt) 1971-11-10 1972-11-10 Processo para a producao de um revestimento estabilizador e/ou isolante em superficies semicondutoras

Country Status (10)

Country Link
US (1) US3896254A (cg-RX-API-DMAC10.html)
JP (1) JPS4876475A (cg-RX-API-DMAC10.html)
BR (1) BR7207887D0 (cg-RX-API-DMAC10.html)
CH (1) CH565451A5 (cg-RX-API-DMAC10.html)
DE (1) DE2155849C3 (cg-RX-API-DMAC10.html)
ES (1) ES407115A1 (cg-RX-API-DMAC10.html)
FR (1) FR2159344B1 (cg-RX-API-DMAC10.html)
GB (1) GB1408314A (cg-RX-API-DMAC10.html)
IT (1) IT970349B (cg-RX-API-DMAC10.html)
SE (1) SE376686B (cg-RX-API-DMAC10.html)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4210498A (en) * 1974-11-20 1980-07-01 Matsushita Electric Industrial Co., Ltd. Method of increasing the amplification of a transistor through use of organic compounds
US4098921A (en) * 1976-04-28 1978-07-04 Cutler-Hammer Tantalum-gallium arsenide schottky barrier semiconductor device
US4199649A (en) * 1978-04-12 1980-04-22 Bard Laboratories, Inc. Amorphous monomolecular surface coatings
GB2111037B (en) * 1981-11-23 1984-10-17 Hughes Aircraft Co Preparing substrates for semi-conductors
US5225235A (en) * 1987-05-18 1993-07-06 Osaka Titanium Co., Ltd. Semiconductor wafer and manufacturing method therefor
US4925809A (en) * 1987-05-23 1990-05-15 Osaka Titanium Co., Ltd. Semiconductor wafer and epitaxial growth on the semiconductor wafer with autodoping control and manufacturing method therefor
US5389194A (en) * 1993-02-05 1995-02-14 Lsi Logic Corporation Methods of cleaning semiconductor substrates after polishing
DE4432294A1 (de) * 1994-09-12 1996-03-14 Telefunken Microelectron Verfahren zur Reduzierung der Oberflächenrekombinationsgeschwindigkeit in Silizium
DE19537545A1 (de) * 1995-10-09 1997-04-10 Telefunken Microelectron Verfahren zur Herstellung einer Lumineszenzdiode
US6335481B1 (en) * 1998-09-30 2002-01-01 Fuji Photo Film Co., Ltd. Semiconductor particle sensitized with methine dye
DE19948206A1 (de) * 1999-10-07 2001-04-12 Merck Patent Gmbh Verfahren zur Herstellung hochreiner Salzsäure
JP4375991B2 (ja) * 2003-04-09 2009-12-02 関東化学株式会社 半導体基板洗浄液組成物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL230243A (cg-RX-API-DMAC10.html) * 1957-08-07
US3188229A (en) * 1961-10-03 1965-06-08 Du Pont Process of adhering an organic coating to a substrate
US3346384A (en) * 1963-04-25 1967-10-10 Gen Electric Metal image formation
US3450017A (en) * 1966-04-15 1969-06-17 Pentacon Dresden Veb Cameras
DE1564580A1 (de) * 1966-04-27 1969-07-31 Semikron Gleichrichterbau Verfahren zur Stabilisierung der Sperreigenschaft von Halbleiterbauelementen
NL6707515A (cg-RX-API-DMAC10.html) * 1967-05-31 1968-12-02
GB1237433A (en) * 1968-06-06 1971-06-30 Standard Telephones Cables Ltd Improvements in or relating to photolithographic masks
US3666548A (en) * 1970-01-06 1972-05-30 Ibm Monocrystalline semiconductor body having dielectrically isolated regions and method of forming

Also Published As

Publication number Publication date
DE2155849C3 (de) 1979-07-26
IT970349B (it) 1974-04-10
SE376686B (cg-RX-API-DMAC10.html) 1975-06-02
FR2159344A1 (cg-RX-API-DMAC10.html) 1973-06-22
CH565451A5 (cg-RX-API-DMAC10.html) 1975-08-15
DE2155849A1 (de) 1973-05-17
GB1408314A (en) 1975-10-01
JPS4876475A (cg-RX-API-DMAC10.html) 1973-10-15
FR2159344B1 (cg-RX-API-DMAC10.html) 1977-12-23
ES407115A1 (es) 1975-10-16
US3896254A (en) 1975-07-22
DE2155849B2 (de) 1978-11-16

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