BR112022011485A2 - Precursor de relevo fotopolimerizável com propriedades de superfície ajustáveis - Google Patents

Precursor de relevo fotopolimerizável com propriedades de superfície ajustáveis

Info

Publication number
BR112022011485A2
BR112022011485A2 BR112022011485A BR112022011485A BR112022011485A2 BR 112022011485 A2 BR112022011485 A2 BR 112022011485A2 BR 112022011485 A BR112022011485 A BR 112022011485A BR 112022011485 A BR112022011485 A BR 112022011485A BR 112022011485 A2 BR112022011485 A2 BR 112022011485A2
Authority
BR
Brazil
Prior art keywords
surface properties
adjustable surface
photo
precursor
light
Prior art date
Application number
BR112022011485A
Other languages
English (en)
Inventor
Beyer Matthias
Becker Armin
Wendland Torben
Schlegel Isabel
J Fronczkiewicz Peter
Wundling Anja
Original Assignee
Xsys Germany Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xsys Germany Gmbh filed Critical Xsys Germany Gmbh
Publication of BR112022011485A2 publication Critical patent/BR112022011485A2/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

PRECURSOR DE RELEVO FOTOPOLIMERIZÁVEL COM PROPRIEDADES DE SUPERFÍCIE AJUSTÁVEIS. A presente invenção refere-se a um precursor de relevo fotopolimerizável compreendendo (A) um portador dimensionalmente estável, (B) uma camada formadora de relevo fotopolimerizável pelo menos contendo um aglutinante elastomérico reticulável, um monômero etilenicamente insaturado, um aditivo tensoativo com capacidade de migração, um fotoiniciador ativável com luz UVA e um fotoiniciador ativável com luz UVC. A invenção refere-se ainda a um método para produzir uma estrutura de relevo.
BR112022011485A 2019-12-12 2020-12-14 Precursor de relevo fotopolimerizável com propriedades de superfície ajustáveis BR112022011485A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19215470.6A EP3835869A1 (de) 2019-12-12 2019-12-12 Fotopolymerisierbarer reliefvorläufer mit einstellbaren oberflächeneigenschaften
PCT/EP2020/086029 WO2021116496A1 (de) 2019-12-12 2020-12-14 Fotopolymerisierbarer reliefvorläufer mit einstellbaren oberflächeneigenschaften

Publications (1)

Publication Number Publication Date
BR112022011485A2 true BR112022011485A2 (pt) 2022-08-23

Family

ID=68887215

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112022011485A BR112022011485A2 (pt) 2019-12-12 2020-12-14 Precursor de relevo fotopolimerizável com propriedades de superfície ajustáveis

Country Status (8)

Country Link
US (1) US20230031598A1 (pt)
EP (2) EP3835869A1 (pt)
JP (1) JP2023505912A (pt)
CN (1) CN115210644A (pt)
BR (1) BR112022011485A2 (pt)
CA (1) CA3160941C (pt)
MX (1) MX2022007159A (pt)
WO (1) WO2021116496A1 (pt)

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1522444B2 (de) 1967-03-10 1977-07-07 Basf Ag, 6700 Ludwigshafen Polymerisationsinhibitor enthaltendes lichtvernetzbares gemisch
DE2909992A1 (de) 1979-03-14 1980-10-02 Basf Ag Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen
DE3045516A1 (de) 1980-12-03 1982-07-08 Basf Ag, 6700 Ludwigshafen Lichtempfindliches mehrschichtenmaterial und verfahren zur herstellung von haftschichten dafuer
DE3144905A1 (de) 1981-11-12 1983-05-19 Basf Ag, 6700 Ludwigshafen Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials
JPS58117537A (ja) 1982-01-06 1983-07-13 Toray Ind Inc 感光性樹脂組成物
DE3541162A1 (de) 1985-11-21 1987-05-27 Basf Ag Photoempfindliche aufzeichnungsmaterialien mit elastomeren pfropfcopolymerisat-bindemitteln sowie reliefformen daraus
DE19859623A1 (de) * 1998-12-23 2000-08-24 Basf Drucksysteme Gmbh Photopolymerisierbare Druckformen mit Oberschicht zur Herstellung von Reliefdruckformen
EP1170121B1 (en) 2000-06-13 2002-06-26 Agfa-Gevaert Direct-to-plate flexographic printing plate precursor
US6773859B2 (en) 2001-03-06 2004-08-10 E. I. Du Pont De Nemours And Company Process for making a flexographic printing plate and a photosensitive element for use in the process
JPWO2005070691A1 (ja) * 2004-01-27 2007-09-06 旭化成ケミカルズ株式会社 レーザー彫刻可能な印刷基材用感光性樹脂組成物
JP4782580B2 (ja) 2005-11-01 2011-09-28 旭化成イーマテリアルズ株式会社 フレキソ印刷用感光性樹脂組成物
JP4673197B2 (ja) * 2005-11-24 2011-04-20 日立Ｇｅニュークリア・エナジー株式会社 液体試料のモニタリング方法及び液体試料分析装置
JP2010055021A (ja) * 2008-08-29 2010-03-11 Fujifilm Corp 平版印刷版の作製方法
WO2018177500A1 (de) * 2017-03-27 2018-10-04 Flint Group Germany Gmbh Verfahren zur herstellung von bildhaften reliefstrukturen
CN111512231B (zh) * 2017-10-10 2024-03-15 恩熙思德国有限公司 具有低程度的杯形挤压和槽纹的凸纹前体
JP7012526B2 (ja) 2017-12-20 2022-01-28 旭化成株式会社 フレキソ印刷原版、及びフレキソ印刷版

Also Published As

Publication number Publication date
JP2023505912A (ja) 2023-02-13
CA3160941C (en) 2024-04-16
MX2022007159A (es) 2022-08-19
CN115210644A (zh) 2022-10-18
EP4073587A1 (de) 2022-10-19
WO2021116496A1 (de) 2021-06-17
EP3835869A1 (de) 2021-06-16
US20230031598A1 (en) 2023-02-02
CA3160941A1 (en) 2021-06-17

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