BR112017024923A2 - aparelho e método para a evaporação e deposição de materiais usando um filamento de corda - Google Patents

aparelho e método para a evaporação e deposição de materiais usando um filamento de corda

Info

Publication number
BR112017024923A2
BR112017024923A2 BR112017024923A BR112017024923A BR112017024923A2 BR 112017024923 A2 BR112017024923 A2 BR 112017024923A2 BR 112017024923 A BR112017024923 A BR 112017024923A BR 112017024923 A BR112017024923 A BR 112017024923A BR 112017024923 A2 BR112017024923 A2 BR 112017024923A2
Authority
BR
Brazil
Prior art keywords
deposition
evaporation
materials
controlled
part support
Prior art date
Application number
BR112017024923A
Other languages
English (en)
Inventor
W Choquette Robert
Original Assignee
Mustang Vacuum Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mustang Vacuum Systems Inc filed Critical Mustang Vacuum Systems Inc
Publication of BR112017024923A2 publication Critical patent/BR112017024923A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

um aparelho e método para a evaporação e deposição de materiais em um substrato. um material de fonte pode ser fixado a um filamento de corda dentro e uma câmara de vácuo. um mecanismo pode ser controlado para aquecer o filamento de corda e evaporar o material de origem. peças para revestimento podem ser carregadas em um suporte de peça. um mecanismo de motor pode ser controlado rodando o suporte de peça. o material de fonte evaporado pode ser depositado nas peças no suporte de peça. a taxa da deposição pode ser controlada em parte controlando a fonte de energia.
BR112017024923A 2015-05-18 2016-05-18 aparelho e método para a evaporação e deposição de materiais usando um filamento de corda BR112017024923A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201562162899P 2015-05-18 2015-05-18
PCT/US2016/033068 WO2016187294A1 (en) 2015-05-18 2016-05-18 Apparatus and method for the evaporation and deposition of materials using a rope filament

Publications (1)

Publication Number Publication Date
BR112017024923A2 true BR112017024923A2 (pt) 2018-07-31

Family

ID=57320685

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112017024923A BR112017024923A2 (pt) 2015-05-18 2016-05-18 aparelho e método para a evaporação e deposição de materiais usando um filamento de corda

Country Status (6)

Country Link
US (1) US20180148826A1 (pt)
EP (1) EP3308383A1 (pt)
KR (1) KR20180033129A (pt)
CN (1) CN107851483A (pt)
BR (1) BR112017024923A2 (pt)
WO (1) WO2016187294A1 (pt)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116043170B (zh) * 2023-02-22 2024-05-03 合肥东昇智能装备股份有限公司 一种输送系统、氧化铝镀层氧化程度调节装置及方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3612822A (en) * 1969-06-25 1971-10-12 Sylvania Electric Prod Evaporation filament assembly
DE4025659A1 (de) * 1990-08-14 1992-02-20 Leybold Ag Umlaufraedergetriebe mit einem raedersatz, insbesondere fuer vorrichtungen zum beschichten von substraten
US6270580B2 (en) * 1999-04-12 2001-08-07 Advanced Micro Devices, Inc. Modified material deposition sequence for reduced detect densities in semiconductor manufacturing
US20020027294A1 (en) * 2000-07-21 2002-03-07 Neuhaus Herbert J. Electrical component assembly and method of fabrication
US6638839B2 (en) * 2001-07-26 2003-10-28 The University Of Toledo Hot-filament chemical vapor deposition chamber and process with multiple gas inlets
DE102004041854B4 (de) * 2004-04-27 2008-11-13 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur thermischen Vakuumbeschichtung
JP5362543B2 (ja) * 2006-03-15 2013-12-11 ライルス，コスモス バネの張力を使用する弦楽器
US20100122657A1 (en) * 2008-11-14 2010-05-20 Jui Hai Hsieh Electrode, Chemical Vapor Deposition Apparatus Including the Electrode and Method of Making

Also Published As

Publication number Publication date
CN107851483A (zh) 2018-03-27
US20180148826A1 (en) 2018-05-31
KR20180033129A (ko) 2018-04-02
WO2016187294A1 (en) 2016-11-24
EP3308383A1 (en) 2018-04-18

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal acc. article 33 of ipl - extension of time limit for request of examination expired