BR112017018197A2 - método e aparelho para fabricar um nanoporo em uma localização particular em uma membrana e método de aumentar tamanho de um nanoporo em uma membrana - Google Patents

método e aparelho para fabricar um nanoporo em uma localização particular em uma membrana e método de aumentar tamanho de um nanoporo em uma membrana

Info

Publication number
BR112017018197A2
BR112017018197A2 BR112017018197A BR112017018197A BR112017018197A2 BR 112017018197 A2 BR112017018197 A2 BR 112017018197A2 BR 112017018197 A BR112017018197 A BR 112017018197A BR 112017018197 A BR112017018197 A BR 112017018197A BR 112017018197 A2 BR112017018197 A2 BR 112017018197A2
Authority
BR
Brazil
Prior art keywords
membrane
nanopore
electrical
particular location
fabricating
Prior art date
Application number
BR112017018197A
Other languages
English (en)
Inventor
Bustamante Jose
briggs Kyle
Tabard- Cossa Vincent
Original Assignee
The University Of Ottawa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by The University Of Ottawa filed Critical The University Of Ottawa
Publication of BR112017018197A2 publication Critical patent/BR112017018197A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
    • B01D65/02—Membrane cleaning or sterilisation ; Membrane regeneration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0002—Organic membrane manufacture
    • B01D67/0023—Organic membrane manufacture by inducing porosity into non porous precursor membranes
    • B01D67/0032—Organic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039—Inorganic membrane manufacture
    • B01D67/0053—Inorganic membrane manufacture by inducing porosity into non porous precursor membranes
    • B01D67/006—Inorganic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/021—Carbon
    • B01D71/0211—Graphene or derivates thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/0215—Silicon carbide; Silicon nitride; Silicon oxycarbide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • B23K26/382—Removing material by boring or cutting by boring
    • B23K26/384—Removing material by boring or cutting by boring of specially shaped holes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/40—Removing material taking account of the properties of the material involved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B1/00—Devices without movable or flexible elements, e.g. microcapillary devices
    • B81B1/002—Holes characterised by their shape, in either longitudinal or sectional plane
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2321/00—Details relating to membrane cleaning, regeneration, sterilization or to the prevention of fouling
    • B01D2321/22—Electrical effects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2323/00—Details relating to membrane preparation
    • B01D2323/34—Use of radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2323/00—Details relating to membrane preparation
    • B01D2323/35—Use of magnetic or electrical fields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2325/00—Details relating to properties of membranes
    • B01D2325/02—Details relating to pores or porosity of the membranes
    • B01D2325/0283—Pore size
    • B01D2325/02832—1-10 nm
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2325/00—Details relating to properties of membranes
    • B01D2325/26—Electrical properties

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Laser Beam Processing (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)

Abstract

um método para fabricar um nanoporo em uma localização particular em uma membrana inclui controlar uma rigidez dielétrica da membrana em uma localização particular sobre a membrana enquanto aplica um dentre um potencial elétrico ou uma corrente elétrica na membrana, monitorar uma propriedade elétrica através da membrana enquanto um dentre o potencial elétrico ou a corrente elétrica está sendo aplicado através da membrana, detectar uma mudança abrupta na propriedade elétrica através da membrana enquanto um dentre o potencial elétrico ou a corrente elétrica está sendo aplicado através da membrana; e remover o potencial elétrico ou a corrente elétrica da membrana em resposta à detecção da mudança abrupta na propriedade elétrica.
BR112017018197A 2015-02-24 2016-02-24 método e aparelho para fabricar um nanoporo em uma localização particular em uma membrana e método de aumentar tamanho de um nanoporo em uma membrana BR112017018197A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201562120054P 2015-02-24 2015-02-24
PCT/IB2016/051017 WO2016135656A1 (en) 2015-02-24 2016-02-24 Localizing nanopore fabrication on a membrane by laser illumination during controlled breakdown

Publications (1)

Publication Number Publication Date
BR112017018197A2 true BR112017018197A2 (pt) 2018-04-10

Family

ID=56788090

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112017018197A BR112017018197A2 (pt) 2015-02-24 2016-02-24 método e aparelho para fabricar um nanoporo em uma localização particular em uma membrana e método de aumentar tamanho de um nanoporo em uma membrana

Country Status (12)

Country Link
US (1) US10753009B2 (pt)
EP (1) EP3261753B1 (pt)
JP (1) JP7071825B2 (pt)
KR (1) KR102444998B1 (pt)
CN (1) CN107530638B (pt)
AU (1) AU2016224950B2 (pt)
BR (1) BR112017018197A2 (pt)
CA (1) CA2976313C (pt)
ES (1) ES2804175T3 (pt)
MX (1) MX2017010824A (pt)
SG (1) SG11201706587TA (pt)
WO (1) WO2016135656A1 (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018183867A1 (en) 2017-03-31 2018-10-04 Nielson Scientific, Llc Three-dimensional semiconductor fabrication
CA3053587A1 (en) * 2017-05-17 2018-11-22 The Royal Institution For The Advancement Of Learning / Mcgill University Method and apparatus for making a nanopore in a membrane using an electric field applied via a conductive tip
WO2019191490A1 (en) * 2018-03-29 2019-10-03 Northeastern University Nanoscale etching of light absorbing materials using light and an electron donor solvent
US11313857B2 (en) 2018-04-06 2022-04-26 Northeastern University System and method for identifying and quantifying species with nanopores, using complexes of nanoparticles with carrier particles
US11454624B2 (en) 2018-09-28 2022-09-27 Ofer Wilner Nanopore technologies
CN109632899B (zh) * 2018-11-02 2021-03-30 广东工业大学 一种精确可控的纳米孔制造方法
WO2020194303A1 (en) * 2019-03-25 2020-10-01 Technion Research & Development Foundation Limited Nanopore fabrication
CN110120248B (zh) * 2019-04-08 2020-12-25 中国科学院合肥物质科学研究院 模拟纳米晶金属累积离位损伤的方法
US11703476B2 (en) 2019-10-28 2023-07-18 Northeastern University Method and apparatus for sensing a molecule
WO2021260587A1 (en) * 2020-06-23 2021-12-30 The University Of Ottawa Improved techniques for nanopore enlargement and formation
JP7440375B2 (ja) 2020-08-19 2024-02-28 株式会社日立製作所 孔形成方法及び孔形成装置
JP7543174B2 (ja) 2021-03-03 2024-09-02 株式会社日立製作所 ポア形成方法、およびポア形成装置

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JPH0674899A (ja) * 1992-08-31 1994-03-18 Matsushita Electric Ind Co Ltd 試料表面の測定方法と装置及び試料表面の微細加工方法と装置
JP2004148458A (ja) * 2002-10-31 2004-05-27 Sony Corp 微細加工装置および微細加工方法
US7846738B2 (en) * 2003-08-15 2010-12-07 President And Fellows Of Harvard College Study of polymer molecules and conformations with a nanopore
EP1721657A1 (en) * 2005-05-13 2006-11-15 SONY DEUTSCHLAND GmbH A method of fabricating a polymeric membrane having at least one pore
US8110410B2 (en) * 2009-06-29 2012-02-07 International Business Machines Corporation Nanofludic field effect transistor based on surface charge modulated nanochannel
JP5612695B2 (ja) * 2009-09-18 2014-10-22 プレジデント アンド フェローズ オブ ハーバード カレッジ 高感度分子検出及び分析を可能にする、ナノポアを有するベアの単層グラフェン膜
KR20130007557A (ko) * 2010-01-27 2013-01-18 예일 유니버시티 ＧａＮ 소자의 전도도 기반 선택적 에칭 및 그의 응용
US9422154B2 (en) 2010-11-02 2016-08-23 International Business Machines Corporation Feedback control of dimensions in nanopore and nanofluidic devices
EP2564999A1 (en) * 2011-08-31 2013-03-06 Asahi Glass Company, Limited A method of generating a high quality hole or recess or well in a substrate
KR102065754B1 (ko) 2012-05-07 2020-02-11 유니버시티 오브 오타와 높은 전기장을 이용한 나노포어의 형성 방법
WO2014153047A1 (en) * 2013-03-14 2014-09-25 The Trustees Of Boston University Optoelectronic control of solid-state nanopores
CN105408241B (zh) * 2013-03-15 2019-01-11 哈佛大学校长及研究员协会 通过超短电脉冲在原子级薄膜中产生纳米孔
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Also Published As

Publication number Publication date
MX2017010824A (es) 2018-05-28
ES2804175T3 (es) 2021-02-04
SG11201706587TA (en) 2017-09-28
CA2976313A1 (en) 2016-09-01
KR102444998B1 (ko) 2022-09-19
EP3261753A4 (en) 2018-10-10
AU2016224950B2 (en) 2021-01-28
AU2016224950A1 (en) 2017-09-14
CN107530638B (zh) 2021-03-09
KR20170119704A (ko) 2017-10-27
EP3261753A1 (en) 2018-01-03
EP3261753B1 (en) 2020-04-08
WO2016135656A1 (en) 2016-09-01
US20180043310A1 (en) 2018-02-15
CN107530638A (zh) 2018-01-02
US10753009B2 (en) 2020-08-25
JP2018513774A (ja) 2018-05-31
CA2976313C (en) 2024-01-16
JP7071825B2 (ja) 2022-05-19

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Legal Events

Date Code Title Description
B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]