BR0315685A - Método litográfico para formar insertos de molde e moldes - Google Patents

Método litográfico para formar insertos de molde e moldes

Info

Publication number
BR0315685A
BR0315685A BR0315685-0A BR0315685A BR0315685A BR 0315685 A BR0315685 A BR 0315685A BR 0315685 A BR0315685 A BR 0315685A BR 0315685 A BR0315685 A BR 0315685A
Authority
BR
Brazil
Prior art keywords
molds
mold inserts
lithographic method
forming mold
inserts
Prior art date
Application number
BR0315685-0A
Other languages
English (en)
Portuguese (pt)
Inventor
John Harchanko
Rodney Clark
Takahisa Minamitani
Gregory J Hofmann
Thomas R Rooney
Original Assignee
Johnson & Johnson Vision Care
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Johnson & Johnson Vision Care filed Critical Johnson & Johnson Vision Care
Publication of BR0315685A publication Critical patent/BR0315685A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00432—Auxiliary operations, e.g. machines for filling the moulds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
BR0315685-0A 2002-10-28 2003-10-03 Método litográfico para formar insertos de molde e moldes BR0315685A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US42174802P 2002-10-28 2002-10-28
PCT/US2003/031450 WO2004039554A2 (fr) 2002-10-28 2003-10-03 Procede lithographique de formation d'inserts de moules et des moules correspondants

Publications (1)

Publication Number Publication Date
BR0315685A true BR0315685A (pt) 2005-09-06

Family

ID=32230262

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0315685-0A BR0315685A (pt) 2002-10-28 2003-10-03 Método litográfico para formar insertos de molde e moldes

Country Status (10)

Country Link
EP (1) EP1556739A2 (fr)
JP (1) JP4652055B2 (fr)
KR (1) KR20050074973A (fr)
CN (1) CN1708727A (fr)
AR (1) AR041847A1 (fr)
AU (1) AU2003282671B8 (fr)
BR (1) BR0315685A (fr)
CA (1) CA2502239A1 (fr)
TW (1) TWI315698B (fr)
WO (1) WO2004039554A2 (fr)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005005121A2 (fr) * 2003-07-11 2005-01-20 Koninklijke Philips Electronics N.V. Procede de fabrication d'un moule pour produire une surface optique, procede de production de lentilles de contact et dispositif utilise selon ces procedes
SE0402769D0 (sv) 2004-11-12 2004-11-12 Amo Groningen Bv Method of selecting intraocular lenses
KR101137845B1 (ko) 2005-06-24 2012-04-20 엘지디스플레이 주식회사 소프트 몰드의 제조방법
US20070257387A1 (en) * 2006-05-05 2007-11-08 Hofmann Gregory J Package mold combination
CN1916768A (zh) 2006-09-08 2007-02-21 中国科学院光电技术研究所 个性化隐形眼镜定制设备
US7905594B2 (en) 2007-08-21 2011-03-15 Johnson & Johnson Vision Care, Inc. Free form ophthalmic lens
US8317505B2 (en) 2007-08-21 2012-11-27 Johnson & Johnson Vision Care, Inc. Apparatus for formation of an ophthalmic lens precursor and lens
US8318055B2 (en) * 2007-08-21 2012-11-27 Johnson & Johnson Vision Care, Inc. Methods for formation of an ophthalmic lens precursor and lens
US8313828B2 (en) * 2008-08-20 2012-11-20 Johnson & Johnson Vision Care, Inc. Ophthalmic lens precursor and lens
AU2009323770B2 (en) 2008-04-04 2015-05-07 Amo Regional Holdings Systems and methods for determining intraocular lens power
US9417464B2 (en) 2008-08-20 2016-08-16 Johnson & Johnson Vision Care, Inc. Method and apparatus of forming a translating multifocal contact lens having a lower-lid contact surface
CN102307514B (zh) * 2008-12-01 2015-07-22 完美视觉科技（香港）有限公司 人眼屈光矫正的方法和设备
US8240849B2 (en) 2009-03-31 2012-08-14 Johnson & Johnson Vision Care, Inc. Free form lens with refractive index variations
US8807076B2 (en) 2010-03-12 2014-08-19 Johnson & Johnson Vision Care, Inc. Apparatus for vapor phase processing ophthalmic devices
CA2851975A1 (fr) 2011-10-14 2013-04-18 Amo Groningen B.V. Appareil, systeme et procede pour prendre en compte une aberration spherique au niveau du plan de l'iris dans la conception d'une lentille intra-oculaire
BR112014032902A2 (pt) * 2012-06-29 2017-06-27 Johnson & Johnson Vision Care precursor de lente com características para a fabricação de uma lente oftálmica
WO2015151004A1 (fr) * 2014-03-31 2015-10-08 Crt Technology, Inc. Fabrication additive de moules et procédés de fabrication de moules et dispositifs obtenus
US9645412B2 (en) 2014-11-05 2017-05-09 Johnson & Johnson Vision Care Inc. Customized lens device and method
US10359643B2 (en) 2015-12-18 2019-07-23 Johnson & Johnson Vision Care, Inc. Methods for incorporating lens features and lenses having such features
US10197806B2 (en) * 2016-06-07 2019-02-05 Google Llc Fabrication of air gap regions in multicomponent lens systems
CA3075211A1 (fr) 2017-09-11 2019-03-14 Amo Groningen B.V. Lentilles intraoculaires ayant une puissance d'addition personnalisee
US11364696B2 (en) 2020-09-18 2022-06-21 Johnson & Johnson Vision Care, Inc Apparatus for forming an ophthalmic lens

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3658528A (en) * 1969-09-22 1972-04-25 Itek Corp Photochemical figuring of optical elements
JPH0524121A (ja) * 1991-07-23 1993-02-02 Hitachi Ltd 光学部品、光学部品マザー、それらの製造方法、及び関連製品
JP2001150451A (ja) * 1999-11-22 2001-06-05 Canon Inc 成形型およびその製造方法
JP2001235611A (ja) * 2000-02-25 2001-08-31 Shimadzu Corp ホログラフィック・グレーティング
US20020110766A1 (en) * 2001-02-09 2002-08-15 Industrial Technology Research Institute Process method of using excimer laser for forming micro spherical and non-spherical polymeric structure array

Also Published As

Publication number Publication date
CN1708727A (zh) 2005-12-14
WO2004039554A2 (fr) 2004-05-13
AU2003282671A1 (en) 2004-05-25
AU2003282671B8 (en) 2010-05-27
JP2006503738A (ja) 2006-02-02
KR20050074973A (ko) 2005-07-19
JP4652055B2 (ja) 2011-03-16
EP1556739A2 (fr) 2005-07-27
TW200420403A (en) 2004-10-16
WO2004039554A3 (fr) 2004-12-09
AR041847A1 (es) 2005-06-01
AU2003282671B2 (en) 2010-01-28
CA2502239A1 (fr) 2004-05-13
TWI315698B (en) 2009-10-11

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Legal Events

Date Code Title Description
B25A Requested transfer of rights approved

Owner name: JOHNSON AND JOHNSON (US)

Free format text: TRANSFERIDO DE: JOHNSON AND JOHNSON VISION CARE, INC.

B07A Technical examination (opinion): publication of technical examination (opinion) [chapter 7.1 patent gazette]
B08L Patent application lapsed because of non payment of annual fee [chapter 8.12 patent gazette]

Free format text: REFERENTE AO NAO RECOLHIMENTO DAS 9A E 10A ANUIDADES.

B08I Application fees: publication cancelled [chapter 8.9 patent gazette]

Free format text: ANULADA A PUBLICACAO CODIGO 8.12 NA RPI NO 2257 DE 08/04/2014 POR TER SIDO INDEVIDA.

B08F Application fees: application dismissed [chapter 8.6 patent gazette]

Free format text: REFERENTE AS 9A, 10A, 11A, 12A, 13A, 14A, 15A, 16A E 17A ANUIDADES.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2602 DE 17-11-2020 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.