BR0210684A - Electrolysis cell to restore metal ion concentration in electrodeposition processes - Google Patents
Electrolysis cell to restore metal ion concentration in electrodeposition processesInfo
- Publication number
- BR0210684A BR0210684A BR0210684-1A BR0210684A BR0210684A BR 0210684 A BR0210684 A BR 0210684A BR 0210684 A BR0210684 A BR 0210684A BR 0210684 A BR0210684 A BR 0210684A
- Authority
- BR
- Brazil
- Prior art keywords
- cell
- metals
- electrolysis cell
- electrodeposition processes
- electrodeposition
- Prior art date
Links
- 238000004070 electrodeposition Methods 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 4
- 238000005868 electrolysis reaction Methods 0.000 title abstract 3
- 229910021645 metal ion Inorganic materials 0.000 title 1
- 239000002184 metal Substances 0.000 abstract 5
- 229910052751 metal Inorganic materials 0.000 abstract 5
- 150000002739 metals Chemical class 0.000 abstract 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- 238000005341 cation exchange Methods 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
- 238000004090 dissolution Methods 0.000 abstract 1
- 239000012528 membrane Substances 0.000 abstract 1
- 150000001455 metallic ions Chemical class 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- -1 tin Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/22—Regeneration of process solutions by ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Abstract
"CéLULA DE ELETRóLISE PARA RESTAURAR A CONCENTRAçãO DE ìONS METáLICOS EM PROCESSOS DE ELETRODEPOSIçãO". A presente invenção refere-se a uma célula de eletrólise na qual a dissolução anódica de metais é realizada, em particular de metais caracterizados por meio de um potencial de oxidação relativamente elevado, tais como cobre ou metais com elevado sobrepotencial de hidrogênio, por exemplo, estanho, com a intenção de restaurar ambos, a concentração dos ditos metais e o pH em banhos galvânicos utilizados em processos de eletrodeposição com anodos insolúveis. A célula da invenção compreende um compartimento anódico no qual o metal a ser dissolvido atua como um anodo consumível, e um compartimento catódico que contém um catodo para o desprendimento de hidrogênio, separados por uma membrana de troca de cátions. O acoplamento da célula da invenção com a célula de eletrodeposição permite uma grande e forte simplificação do processo global, e uma sensível redução nos custos relevantes."Electrolysis cell to restore the concentration of metallic ions in electrodeposition processes". The present invention relates to an electrolysis cell in which anodic dissolution of metals is carried out, in particular of metals characterized by relatively high oxidation potential, such as copper or high hydrogen overpotential metals, e.g. tin, with the intention of restoring both the concentration of these metals and the pH in galvanic baths used in electrodeposition processes with insoluble anodes. The cell of the invention comprises an anode compartment in which the metal to be dissolved acts as a consumable anode, and a cathode compartment containing a hydrogen release cathode separated by a cation exchange membrane. The coupling of the cell of the invention with the electrodeposition cell enables a large and strong simplification of the overall process and a significant reduction in the relevant costs.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT2001MI001374A ITMI20011374A1 (en) | 2001-06-29 | 2001-06-29 | ELECTROLYSIS CELL FOR THE RESTORATION OF THE CONCENTRATION OF METAL IONS IN ELECTRODEPOSITION PROCESSES |
| PCT/EP2002/007182 WO2003002784A2 (en) | 2001-06-29 | 2002-06-28 | Electrolysis cell for restoring the concentration of metal ions in electroplating processes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BR0210684A true BR0210684A (en) | 2005-07-12 |
| BRPI0210684B1 BRPI0210684B1 (en) | 2016-04-19 |
Family
ID=11447962
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0210684A BRPI0210684B1 (en) | 2001-06-29 | 2002-06-28 | cell for enrichment by anodic metal dissolution, metal electroplating apparatus and electroplating process. |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US7264704B2 (en) |
| EP (1) | EP1458905B8 (en) |
| JP (2) | JP2004536222A (en) |
| KR (1) | KR100954069B1 (en) |
| AT (1) | ATE415505T1 (en) |
| AU (1) | AU2002352504A1 (en) |
| BR (1) | BRPI0210684B1 (en) |
| CA (1) | CA2449512C (en) |
| DE (1) | DE60230061D1 (en) |
| IT (1) | ITMI20011374A1 (en) |
| MY (1) | MY142795A (en) |
| RU (1) | RU2302481C2 (en) |
| TW (1) | TW574428B (en) |
| WO (1) | WO2003002784A2 (en) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030052054A1 (en) * | 2001-09-20 | 2003-03-20 | Pearl Steven R. | Filtration module |
| US20040226875A1 (en) * | 2003-05-15 | 2004-11-18 | Andrew Bartlett | Filtration module |
| ITTO20070704A1 (en) * | 2007-10-05 | 2009-04-06 | Create New Technology S R L | SYSTEM AND METHOD OF PLATING METAL ALLOYS BY GALVANIC TECHNOLOGY |
| US20100239467A1 (en) | 2008-06-17 | 2010-09-23 | Brent Constantz | Methods and systems for utilizing waste sources of metal oxides |
| CA2700768C (en) | 2008-07-16 | 2014-09-09 | Calera Corporation | Co2 utilization in electrochemical systems |
| US8869477B2 (en) | 2008-09-30 | 2014-10-28 | Calera Corporation | Formed building materials |
| CA2700770C (en) | 2008-09-30 | 2013-09-03 | Calera Corporation | Co2-sequestering formed building materials |
| US7815880B2 (en) | 2008-09-30 | 2010-10-19 | Calera Corporation | Reduced-carbon footprint concrete compositions |
| US20110036728A1 (en) * | 2008-12-23 | 2011-02-17 | Calera Corporation | Low-energy electrochemical proton transfer system and method |
| WO2010093716A1 (en) | 2009-02-10 | 2010-08-19 | Calera Corporation | Low-voltage alkaline production using hydrogen and electrocatlytic electrodes |
| KR100928666B1 (en) * | 2009-02-17 | 2009-11-27 | 주식회사 한스머신 | Wafer defect analyzing device and ion abstraction device for the same and analyzing method using the same |
| JP2012519076A (en) | 2009-03-02 | 2012-08-23 | カレラ コーポレイション | Gas flow complex contaminant control system and method |
| US10472730B2 (en) * | 2009-10-12 | 2019-11-12 | Novellus Systems, Inc. | Electrolyte concentration control system for high rate electroplating |
| CN101935862A (en) * | 2010-08-17 | 2011-01-05 | 苏州铨笠电镀挂具有限公司 | Cation generating device |
| CN101962796A (en) * | 2010-08-17 | 2011-02-02 | 苏州铨笠电镀挂具有限公司 | Method for sustainably complementing metallic cations in plating solution |
| US8512541B2 (en) * | 2010-11-16 | 2013-08-20 | Trevor Pearson | Electrolytic dissolution of chromium from chromium electrodes |
| US9017528B2 (en) | 2011-04-14 | 2015-04-28 | Tel Nexx, Inc. | Electro chemical deposition and replenishment apparatus |
| US9005409B2 (en) | 2011-04-14 | 2015-04-14 | Tel Nexx, Inc. | Electro chemical deposition and replenishment apparatus |
| US11000545B2 (en) | 2013-03-15 | 2021-05-11 | Cda Research Group, Inc. | Copper ion compositions and methods of treatment for conditions caused by coronavirus and influenza |
| US10398733B2 (en) | 2013-03-15 | 2019-09-03 | Cda Research Group, Inc. | Topical copper ion treatments and methods of treatment using topical copper ion treatments in the dermatological areas of the body |
| JP6139379B2 (en) * | 2013-10-31 | 2017-05-31 | 株式会社荏原製作所 | Sn alloy plating apparatus and Sn alloy plating method |
| US9303329B2 (en) | 2013-11-11 | 2016-04-05 | Tel Nexx, Inc. | Electrochemical deposition apparatus with remote catholyte fluid management |
| CN103616275B (en) * | 2013-12-09 | 2016-01-20 | 嘉兴市产品质量监督检验所 | A kind of trace metal ion electricity enriched sample disposal route and device thereof |
| US10011919B2 (en) * | 2015-05-29 | 2018-07-03 | Lam Research Corporation | Electrolyte delivery and generation equipment |
| US10692735B2 (en) | 2017-07-28 | 2020-06-23 | Lam Research Corporation | Electro-oxidative metal removal in through mask interconnect fabrication |
| WO2019144109A2 (en) | 2018-01-22 | 2019-07-25 | Alpha-En Corporation | System and process for producing lithium |
| US11193184B2 (en) * | 2019-02-22 | 2021-12-07 | Cda Research Group, Inc. | System for use in producing a metal ion suspension and process of using same |
| US11339483B1 (en) | 2021-04-05 | 2022-05-24 | Alchemr, Inc. | Water electrolyzers employing anion exchange membranes |
| CA3141101C (en) | 2021-08-23 | 2023-10-17 | Unison Industries, Llc | Electroforming system and method |
| WO2024078627A1 (en) * | 2022-10-14 | 2024-04-18 | 叶涛 | Electrolytic copper dissolution-integrated insoluble anode copper plating process optimization method and apparatus |
| WO2024151816A1 (en) * | 2023-01-12 | 2024-07-18 | Aqua Metals Inc. | Anodic dissolution system for nickel and cobalt metals |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60121299A (en) | 1983-12-01 | 1985-06-28 | Tokuyama Soda Co Ltd | Nickel plating method |
| NL8602730A (en) | 1986-10-30 | 1988-05-16 | Hoogovens Groep Bv | METHOD FOR ELECTROLYTIC TINNING TIN USING AN INSOLUBLE ANODE. |
| US5082538A (en) * | 1991-01-09 | 1992-01-21 | Eltech Systems Corporation | Process for replenishing metals in aqueous electrolyte solutions |
| DE19539865A1 (en) * | 1995-10-26 | 1997-04-30 | Lea Ronal Gmbh | Continuous electroplating system |
| JPH11172496A (en) * | 1997-12-04 | 1999-06-29 | Furukawa Electric Co Ltd:The | Formation of plating solution and plating solution forming tank |
| JPH11209899A (en) | 1998-01-28 | 1999-08-03 | Furukawa Electric Co Ltd:The | Formation of plating solution |
| IT1318545B1 (en) * | 2000-05-31 | 2003-08-27 | De Nora Elettrodi Spa | ELECTROLYSIS CELL FOR THE RESTORATION OF THE CONCENTRATION OF IONIMETALLIC IN ELECTRODEPOSITION PROCESSES. |
-
2001
- 2001-06-29 IT IT2001MI001374A patent/ITMI20011374A1/en unknown
-
2002
- 2002-06-06 MY MYPI20022110A patent/MY142795A/en unknown
- 2002-06-28 CA CA002449512A patent/CA2449512C/en not_active Expired - Fee Related
- 2002-06-28 US US10/482,089 patent/US7264704B2/en not_active Expired - Lifetime
- 2002-06-28 WO PCT/EP2002/007182 patent/WO2003002784A2/en active Application Filing
- 2002-06-28 JP JP2003508745A patent/JP2004536222A/en active Pending
- 2002-06-28 TW TW91114254A patent/TW574428B/en not_active IP Right Cessation
- 2002-06-28 DE DE60230061T patent/DE60230061D1/en not_active Expired - Lifetime
- 2002-06-28 AT AT02751092T patent/ATE415505T1/en not_active IP Right Cessation
- 2002-06-28 RU RU2004102511/15A patent/RU2302481C2/en not_active IP Right Cessation
- 2002-06-28 KR KR1020037017138A patent/KR100954069B1/en not_active IP Right Cessation
- 2002-06-28 AU AU2002352504A patent/AU2002352504A1/en not_active Abandoned
- 2002-06-28 EP EP02751092A patent/EP1458905B8/en not_active Expired - Lifetime
- 2002-06-28 BR BRPI0210684A patent/BRPI0210684B1/en not_active IP Right Cessation
-
2007
- 2007-10-22 JP JP2007273446A patent/JP4422751B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP4422751B2 (en) | 2010-02-24 |
| JP2004536222A (en) | 2004-12-02 |
| MY142795A (en) | 2010-12-31 |
| US20040182694A1 (en) | 2004-09-23 |
| TW574428B (en) | 2004-02-01 |
| US7264704B2 (en) | 2007-09-04 |
| WO2003002784A3 (en) | 2004-07-01 |
| DE60230061D1 (en) | 2009-01-08 |
| EP1458905B8 (en) | 2009-03-25 |
| RU2302481C2 (en) | 2007-07-10 |
| ITMI20011374A1 (en) | 2002-12-29 |
| EP1458905A2 (en) | 2004-09-22 |
| KR100954069B1 (en) | 2010-04-23 |
| ITMI20011374A0 (en) | 2001-06-29 |
| AU2002352504A1 (en) | 2003-03-03 |
| WO2003002784A2 (en) | 2003-01-09 |
| ATE415505T1 (en) | 2008-12-15 |
| RU2004102511A (en) | 2005-04-10 |
| EP1458905B1 (en) | 2008-11-26 |
| CA2449512A1 (en) | 2003-01-09 |
| KR20040010786A (en) | 2004-01-31 |
| CA2449512C (en) | 2010-02-02 |
| JP2008069458A (en) | 2008-03-27 |
| BRPI0210684B1 (en) | 2016-04-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
| B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 13/11/2012, MEDIANTE O RECOLHIMENTO DA TAXA QUINQUENAL DE MANUTENCAO (ARTIGOS 119 E 120 DA LPI) E OBSERVADAS AS DEMAIS CONDICOES LEGAIS. |
|
| B25A | Requested transfer of rights approved | ||
| B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 19/04/2016, OBSERVADAS AS CONDICOES LEGAIS. |
|
| B16B | Notification of grant cancelled [chapter 16.2 patent gazette] |
Free format text: REFERENTE A RPI 2363 DE 19/04/2016, POR TER SIDO INDEVIDO. |
|
| B21F | Lapse acc. art. 78, item iv - on non-payment of the annual fees in time | ||
| B24J | Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12) |