BR0116382A - Tratamento de pré-formas de sìlica com um agente de redução - Google Patents

Tratamento de pré-formas de sìlica com um agente de redução

Info

Publication number
BR0116382A
BR0116382A BR0116382-5A BR0116382A BR0116382A BR 0116382 A BR0116382 A BR 0116382A BR 0116382 A BR0116382 A BR 0116382A BR 0116382 A BR0116382 A BR 0116382A
Authority
BR
Brazil
Prior art keywords
treatment
reducing agent
silica
silica preforms
preforms
Prior art date
Application number
BR0116382-5A
Other languages
English (en)
Inventor
Tiffany Lindstrom James
Claude Eugene Lacy
Hazel Benton Matthews
Chukwuemeka Benneth Onuh
Susan Lee Schiefelbein
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of BR0116382A publication Critical patent/BR0116382A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/04—Re-forming tubes or rods
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Silicon Compounds (AREA)
  • Glass Compositions (AREA)

Abstract

"TRATAMENTO DE PRé-FORMAS DE SìLICA COM UM AGENTE DE REDUçãO". Uma pré-forma de fuligem de sílica (12) é inserida em uma fornalha (30). A pré-forma é, em seguida, tratada com calor e gás monóxido de carbono (32), de modo a reduzir impurezas que possam afetar o produto final.
BR0116382-5A 2000-12-22 2001-11-16 Tratamento de pré-formas de sìlica com um agente de redução BR0116382A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US25806100P 2000-12-22 2000-12-22
PCT/US2001/043889 WO2002051762A1 (en) 2000-12-22 2001-11-16 Treating soot preforms with a reducing agent

Publications (1)

Publication Number Publication Date
BR0116382A true BR0116382A (pt) 2004-02-25

Family

ID=22978936

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0116382-5A BR0116382A (pt) 2000-12-22 2001-11-16 Tratamento de pré-formas de sìlica com um agente de redução

Country Status (7)

Country Link
EP (1) EP1351897A4 (pt)
JP (1) JP4540034B2 (pt)
KR (1) KR100819581B1 (pt)
CN (1) CN1284738C (pt)
BR (1) BR0116382A (pt)
CA (1) CA2432729A1 (pt)
WO (1) WO2002051762A1 (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100343704C (zh) * 2002-12-24 2007-10-17 皮雷利＆C·有限公司 接合损耗低的光纤及其制造方法
US8062986B2 (en) 2007-07-27 2011-11-22 Corning Incorporated Fused silica having low OH, OD levels and method of making
KR101006988B1 (ko) * 2008-06-05 2011-01-12 이선구 간이 욕조
CN102153283B (zh) * 2010-11-16 2013-01-16 浙江工业大学 一种PbSe量子点掺杂光纤材料的制备方法
JP5625037B2 (ja) 2012-03-23 2014-11-12 株式会社フジクラ ガラス母材の製造方法
US9586853B2 (en) * 2014-07-09 2017-03-07 Corning Incorporated Method of making optical fibers in a reducing atmosphere
US9650281B2 (en) * 2014-07-09 2017-05-16 Corning Incorporated Optical fiber with reducing hydrogen sensitivity
JP5995923B2 (ja) * 2014-08-06 2016-09-21 古河電気工業株式会社 光ファイバ母材および光ファイバの製造方法
CN109052972B (zh) * 2018-08-31 2021-07-30 北京涑水科技有限公司 掺铋石英光纤预制棒及其制备方法
CN109970335B (zh) * 2019-03-11 2020-11-17 江苏永鼎股份有限公司 一种大规格低衰减的光纤预制棒及其制备方法
CN110927866B (zh) * 2019-12-17 2021-01-22 华南理工大学 高增益的稀土掺杂锗酸盐玻璃芯复合玻璃光纤及器件
JP7332559B2 (ja) * 2020-09-16 2023-08-23 信越化学工業株式会社 光ファイバ用ガラス母材の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57183331A (en) * 1981-05-06 1982-11-11 Nippon Telegr & Teleph Corp <Ntt> Manufacturing of transparent glass preform
JPS59232928A (ja) 1983-06-13 1984-12-27 Furukawa Electric Co Ltd:The 光フアイバ用多孔質母材の処理方法
JPS63225543A (ja) 1987-03-13 1988-09-20 Furukawa Electric Co Ltd:The 光フアイバ母材の製造方法
JP2612871B2 (ja) * 1987-11-09 1997-05-21 信越化学工業株式会社 グレーデットインデスク型光ファイバープリフォームの製造方法
JPH01160840A (ja) * 1987-12-16 1989-06-23 Sumitomo Electric Ind Ltd 分散シフト光フアイバ用母材及びその製造方法
JPH01164740A (ja) * 1987-12-22 1989-06-28 Sumitomo Electric Ind Ltd 光フアイバ用母材の製造方法
JPH01275442A (ja) * 1988-04-27 1989-11-06 Furukawa Electric Co Ltd:The 光フアイバ母材の製造方法
JPH03109223A (ja) * 1989-09-22 1991-05-09 Asahi Glass Co Ltd 石英ガラスおよびその製造方法
JPH0450130A (ja) * 1990-06-20 1992-02-19 Sumitomo Electric Ind Ltd 光ファイバ用母材の製造方法
JPH08133753A (ja) * 1994-10-31 1996-05-28 Tosoh Corp 光学用合成石英ガラス及びその製造方法並びにその用途
DE69601749T3 (de) * 1995-06-07 2004-04-29 Corning Inc. Verfahren zur thermischen Behandlung und zum Konsolidieren von Vorformen aus Siliciumdioxid zur Verminderung von durch Laser hervorgerufenen optischen Defekten
US6131415A (en) * 1997-06-20 2000-10-17 Lucent Technologies Inc. Method of making a fiber having low loss at 1385 nm by cladding a VAD preform with a D/d<7.5
US6376401B1 (en) * 1998-09-07 2002-04-23 Tosoh Corporation Ultraviolet ray-transparent optical glass material and method of producing same
EP1337483A1 (en) * 2000-09-27 2003-08-27 Corning Incorporated Process for drying porous glass preforms

Also Published As

Publication number Publication date
CA2432729A1 (en) 2002-07-04
WO2002051762A1 (en) 2002-07-04
WO2002051762A9 (en) 2003-05-01
JP4540034B2 (ja) 2010-09-08
KR100819581B1 (ko) 2008-04-04
EP1351897A4 (en) 2005-06-15
JP2004523454A (ja) 2004-08-05
CN1284738C (zh) 2006-11-15
CN1483007A (zh) 2004-03-17
KR20030069191A (ko) 2003-08-25
EP1351897A1 (en) 2003-10-15

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Legal Events

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B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal acc. article 33 of ipl - extension of time limit for request of examination expired