BE854534A - Kopierprocede en daarbij gebruikt materiaal - Google Patents

Kopierprocede en daarbij gebruikt materiaal

Info

Publication number
BE854534A
BE854534A BE1008128A BE1008128A BE854534A BE 854534 A BE854534 A BE 854534A BE 1008128 A BE1008128 A BE 1008128A BE 1008128 A BE1008128 A BE 1008128A BE 854534 A BE854534 A BE 854534A
Authority
BE
Belgium
Prior art keywords
material used
copy procedure
copy
procedure
Prior art date
Application number
BE1008128A
Other languages
English (en)
Dutch (nl)
Original Assignee
Agfa Gevaert Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert Nv filed Critical Agfa Gevaert Nv
Publication of BE854534A publication Critical patent/BE854534A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
BE1008128A 1976-06-02 1977-05-12 Kopierprocede en daarbij gebruikt materiaal BE854534A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB22806/76A GB1566802A (en) 1976-06-02 1976-06-02 Photosensitive imaging material

Publications (1)

Publication Number Publication Date
BE854534A true BE854534A (nl) 1977-11-14

Family

ID=10185356

Family Applications (1)

Application Number Title Priority Date Filing Date
BE1008128A BE854534A (nl) 1976-06-02 1977-05-12 Kopierprocede en daarbij gebruikt materiaal

Country Status (6)

Country Link
JP (1) JPS6024932B2 (un)
BE (1) BE854534A (un)
CA (1) CA1104867A (un)
DE (1) DE2723613A1 (un)
FR (1) FR2353878A1 (un)
GB (1) GB1566802A (un)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4138262A (en) * 1976-09-20 1979-02-06 Energy Conversion Devices, Inc. Imaging film comprising bismuth image-forming layer
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4282309A (en) * 1979-01-24 1981-08-04 Agfa-Gevaert, N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer
JPS58116531A (ja) * 1981-12-29 1983-07-11 Fujitsu Ltd ネガ型レジスト材料
IE56082B1 (en) * 1982-11-01 1991-04-10 Microsi Inc Photobleachable compositions
US4677049A (en) * 1983-09-28 1987-06-30 General Electric Company Spin castable photobleachable layer forming compositions
EP0225464A3 (en) * 1985-12-10 1989-06-07 International Business Machines Corporation Composite resist structures
IE59915B1 (en) * 1986-07-25 1994-04-20 Microsi Inc Contrast enhancement layer compositions, alkylnitrones, and use
EP0280197A3 (en) * 1987-02-23 1990-05-23 Oki Electric Industry Company, Limited Process for forming photoresist pattern
JPH0177132U (un) * 1987-11-11 1989-05-24
FR2935144B1 (fr) * 2008-08-25 2011-12-16 Rhodia Operations Utilisation d'une resine novolaque pour augmenter la resistance aux acides d'une composition polyamide

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1447010C3 (de) * 1963-07-04 1975-05-28 Hoechst Ag, 6000 Frankfurt Vorsensibilisierte Druckplatte zur Herstellung von Flach- und Hochdruckformen und Verfahren zum Herstellen der Druckformen
BE792433A (fr) * 1971-12-08 1973-03-30 Energy Conversion Devices Inc Matiere pour la formation d'images et procede de production d'une imag
BE792434A (fr) * 1971-12-08 1973-03-30 Energy Conversion Devices Inc Matiere formatrice d'images et procede de production d'une image
US3966317A (en) * 1974-04-08 1976-06-29 Energy Conversion Devices, Inc. Dry process production of archival microform records from hard copy
JPS5821257B2 (ja) * 1974-04-25 1983-04-28 富士写真フイルム株式会社 キンゾクガゾウケイセイザイリヨウ

Also Published As

Publication number Publication date
GB1566802A (en) 1980-05-08
JPS6024932B2 (ja) 1985-06-15
CA1104867A (en) 1981-07-14
JPS52148304A (en) 1977-12-09
FR2353878B1 (un) 1981-06-12
FR2353878A1 (fr) 1977-12-30
DE2723613A1 (de) 1977-12-15
DE2723613C2 (un) 1989-11-30

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: AGFA-GEVAERT N.V.

Effective date: 19900531