BE845220A - Procede de mesure de la conductivite d'une lamelle sans contact avec celle-ci - Google Patents

Procede de mesure de la conductivite d'une lamelle sans contact avec celle-ci

Info

Publication number
BE845220A
BE845220A BE169834A BE169834A BE845220A BE 845220 A BE845220 A BE 845220A BE 169834 A BE169834 A BE 169834A BE 169834 A BE169834 A BE 169834A BE 845220 A BE845220 A BE 845220A
Authority
BE
Belgium
Prior art keywords
conductivity
strip
measuring
contact
Prior art date
Application number
BE169834A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE845220A publication Critical patent/BE845220A/fr

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/023—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance where the material is placed in the field of a coil
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
    • G01R27/26—Measuring inductance or capacitance; Measuring quality factor, e.g. by using the resonance method; Measuring loss factor; Measuring dielectric constants ; Measuring impedance or related variables

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Health & Medical Sciences (AREA)
  • Electrochemistry (AREA)
  • Pathology (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Or Analyzing Materials By The Use Of Magnetic Means (AREA)
BE169834A 1975-08-21 1976-08-16 Procede de mesure de la conductivite d'une lamelle sans contact avec celle-ci BE845220A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/606,365 US4000458A (en) 1975-08-21 1975-08-21 Method for the noncontacting measurement of the electrical conductivity of a lamella

Publications (1)

Publication Number Publication Date
BE845220A true BE845220A (fr) 1976-12-16

Family

ID=24427675

Family Applications (1)

Application Number Title Priority Date Filing Date
BE169834A BE845220A (fr) 1975-08-21 1976-08-16 Procede de mesure de la conductivite d'une lamelle sans contact avec celle-ci

Country Status (11)

Country Link
US (1) US4000458A (fr)
JP (1) JPS5319874A (fr)
BE (1) BE845220A (fr)
CA (1) CA1057823A (fr)
DE (1) DE2636999C3 (fr)
ES (1) ES450860A1 (fr)
FR (1) FR2321702A1 (fr)
GB (1) GB1552948A (fr)
IT (1) IT1071415B (fr)
NL (1) NL168051B (fr)
SE (1) SE410901B (fr)

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DE3815011A1 (de) * 1988-04-30 1989-11-16 Leybold Ag Einrichtung zum zerstoerungsfreien messen des ohmschen widerstands duenner schichten
DE3815009A1 (de) * 1988-04-30 1989-11-09 Leybold Ag Einrichtung und verfahren zum zerstoerungsfreien messen des ohmschen widerstands duenner schichten nach dem wirbelstrom-prinzip
DE3815010A1 (de) * 1988-04-30 1989-11-09 Leybold Ag Schaltungsanordnung fuer den kombinierten einsatz einer induktiven und einer kapazitiven einrichtung fuer die zerstoerungsfreie messung des ohmschen wiederstands duenner schichten
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US5552704A (en) * 1993-06-25 1996-09-03 Tencor Instruments Eddy current test method and apparatus for measuring conductance by determining intersection of lift-off and selected curves
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US7069101B1 (en) 1999-07-29 2006-06-27 Applied Materials, Inc. Computer integrated manufacturing techniques
US6640151B1 (en) 1999-12-22 2003-10-28 Applied Materials, Inc. Multi-tool control system, method and medium
US6708074B1 (en) 2000-08-11 2004-03-16 Applied Materials, Inc. Generic interface builder
US7188142B2 (en) 2000-11-30 2007-03-06 Applied Materials, Inc. Dynamic subject information generation in message services of distributed object systems in a semiconductor assembly line facility
US6913938B2 (en) 2001-06-19 2005-07-05 Applied Materials, Inc. Feedback control of plasma-enhanced chemical vapor deposition processes
US7698012B2 (en) 2001-06-19 2010-04-13 Applied Materials, Inc. Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing
US7047099B2 (en) 2001-06-19 2006-05-16 Applied Materials Inc. Integrating tool, module, and fab level control
US7101799B2 (en) 2001-06-19 2006-09-05 Applied Materials, Inc. Feedforward and feedback control for conditioning of chemical mechanical polishing pad
US7201936B2 (en) 2001-06-19 2007-04-10 Applied Materials, Inc. Method of feedback control of sub-atmospheric chemical vapor deposition processes
US7160739B2 (en) 2001-06-19 2007-01-09 Applied Materials, Inc. Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles
US6910947B2 (en) 2001-06-19 2005-06-28 Applied Materials, Inc. Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life
US7337019B2 (en) 2001-07-16 2008-02-26 Applied Materials, Inc. Integration of fault detection with run-to-run control
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US7225047B2 (en) 2002-03-19 2007-05-29 Applied Materials, Inc. Method, system and medium for controlling semiconductor wafer processes using critical dimension measurements
US20030199112A1 (en) 2002-03-22 2003-10-23 Applied Materials, Inc. Copper wiring module control
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CN1720490B (zh) 2002-11-15 2010-12-08 应用材料有限公司 用于控制具有多变量输入参数的制造工艺的方法和系统
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US7112960B2 (en) * 2003-07-31 2006-09-26 Applied Materials, Inc. Eddy current system for in-situ profile measurement
US7354332B2 (en) 2003-08-04 2008-04-08 Applied Materials, Inc. Technique for process-qualifying a semiconductor manufacturing tool using metrology data
US7005851B2 (en) * 2003-09-30 2006-02-28 General Electric Company Methods and apparatus for inspection utilizing pulsed eddy current
US7356377B2 (en) 2004-01-29 2008-04-08 Applied Materials, Inc. System, method, and medium for monitoring performance of an advanced process control system
US7096085B2 (en) 2004-05-28 2006-08-22 Applied Materials Process control by distinguishing a white noise component of a process variance
US6961626B1 (en) 2004-05-28 2005-11-01 Applied Materials, Inc Dynamic offset and feedback threshold
DE102006056174A1 (de) * 2006-11-27 2008-05-29 Endress + Hauser Conducta Gesellschaft für Mess- und Regeltechnik mbH + Co. KG Induktiver Leitfähigkeitssensor
US7898280B2 (en) * 2008-09-08 2011-03-01 Emil Kamieniecki Electrical characterization of semiconductor materials
WO2010056769A2 (fr) * 2008-11-14 2010-05-20 Applied Materials, Inc. Capteur à courants de foucault avec résolution de bord améliorée
US20110169520A1 (en) * 2010-01-14 2011-07-14 Mks Instruments, Inc. Apparatus for measuring minority carrier lifetime and method for using the same
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US20110189856A1 (en) * 2010-01-29 2011-08-04 Kun Xu High Sensitivity Real Time Profile Control Eddy Current Monitoring System
US9023667B2 (en) 2011-04-27 2015-05-05 Applied Materials, Inc. High sensitivity eddy current monitoring system
DE102012207341A1 (de) * 2012-05-03 2013-11-07 Rohde & Schwarz Gmbh & Co. Kg Ultrabreitbandige Messbrücke
US9335151B2 (en) 2012-10-26 2016-05-10 Applied Materials, Inc. Film measurement
US10234261B2 (en) 2013-06-12 2019-03-19 Applied Materials, Inc. Fast and continuous eddy-current metrology of a conductive film
US9754846B2 (en) 2014-06-23 2017-09-05 Applied Materials, Inc. Inductive monitoring of conductive trench depth
US9911664B2 (en) 2014-06-23 2018-03-06 Applied Materials, Inc. Substrate features for inductive monitoring of conductive trench depth
TW201822953A (zh) 2016-09-16 2018-07-01 美商應用材料股份有限公司 基於溝槽深度的電磁感應監控進行的過拋光
KR102446870B1 (ko) * 2016-10-21 2022-09-26 어플라이드 머티어리얼스, 인코포레이티드 인-시튜 전자기 유도 모니터링 시스템을 위한 코어 구성
WO2018080764A1 (fr) 2016-10-28 2018-05-03 Applied Materials, Inc. Configuration de noyau à montants alternés pour système de surveillance d'induction électromagnétique in situ
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CN114113789B (zh) * 2021-11-25 2023-07-21 天津大学 一种高频下测量金属薄膜电导率的装置及方法
CN114791447B (zh) * 2022-05-05 2024-01-12 杭州汇健科技有限公司 一种多通道气体传感器

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US3234461A (en) * 1960-12-05 1966-02-08 Texas Instruments Inc Resistivity-measuring device including solid inductive sensor
US3152303A (en) * 1962-06-11 1964-10-06 United Aircraft Corp Electrodeless radio frequency conductivity probe for fluids
US3544893A (en) * 1968-08-05 1970-12-01 Anatoly Ivanovich Savin Apparatus for noncontact measurement of semiconductor resistivity including a toroidal inductive coil with a gap
US3646436A (en) * 1969-12-22 1972-02-29 Gte Laboratories Inc Apparatus and method for measuring electrical resistance employing constant output voltage technique
DE2115437C3 (de) * 1971-03-30 1978-04-27 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur berührungslosen Leitfähigkeitsmessung
JPS5228388B2 (fr) * 1971-12-16 1977-07-26

Also Published As

Publication number Publication date
FR2321702B1 (fr) 1981-09-18
ES450860A1 (es) 1977-08-16
US4000458A (en) 1976-12-28
FR2321702A1 (fr) 1977-03-18
SE7608925L (sv) 1977-02-22
IT1071415B (it) 1985-04-10
CA1057823A (fr) 1979-07-03
SE410901B (sv) 1979-11-12
DE2636999C3 (de) 1982-03-18
NL7609128A (nl) 1977-02-23
DE2636999B2 (de) 1978-03-30
JPS5520550B2 (fr) 1980-06-03
DE2636999A1 (de) 1977-03-17
GB1552948A (en) 1979-09-19
JPS5319874A (en) 1978-02-23
NL168051B (nl) 1981-09-16

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: WESTERN ELECTRIC CY INC.

Effective date: 19860831