BE831989A - Dispositif pour le depot en phase vapeur sur des substrats, a grand taux de depot - Google Patents

Dispositif pour le depot en phase vapeur sur des substrats, a grand taux de depot

Info

Publication number
BE831989A
BE831989A BE158832A BE158832A BE831989A BE 831989 A BE831989 A BE 831989A BE 158832 A BE158832 A BE 158832A BE 158832 A BE158832 A BE 158832A BE 831989 A BE831989 A BE 831989A
Authority
BE
Belgium
Prior art keywords
deposit
substrates
vapor phase
rate
deposit rate
Prior art date
Application number
BE158832A
Other languages
English (en)
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE831989A publication Critical patent/BE831989A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
BE158832A 1974-07-31 1975-07-31 Dispositif pour le depot en phase vapeur sur des substrats, a grand taux de depot BE831989A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD18020974A DD113247A1 (xx) 1974-07-31 1974-07-31

Publications (1)

Publication Number Publication Date
BE831989A true BE831989A (fr) 1975-11-17

Family

ID=5496751

Family Applications (1)

Application Number Title Priority Date Filing Date
BE158832A BE831989A (fr) 1974-07-31 1975-07-31 Dispositif pour le depot en phase vapeur sur des substrats, a grand taux de depot

Country Status (7)

Country Link
JP (1) JPS5825739B2 (xx)
BE (1) BE831989A (xx)
DD (1) DD113247A1 (xx)
DE (1) DE2527269A1 (xx)
IT (1) IT1036929B (xx)
LU (1) LU73127A1 (xx)
SU (1) SU652237A1 (xx)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4444538C2 (de) * 1994-12-14 2001-02-01 Ardenne Anlagentech Gmbh Einrichtung zur langzeitstabilen Verdampfung von Elementen und Verbindungen für die reaktive Abscheidung auf bewegten Substraten, vorzugsweise breiten Bändern
JP5649431B2 (ja) * 2010-12-16 2015-01-07 株式会社神戸製鋼所 プラズマｃｖｄ装置
DE102021103354A1 (de) 2021-02-12 2022-08-18 VON ARDENNE Asset GmbH & Co. KG Verfahren, Steuervorrichtung und Speichermedium

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1308291A (en) * 1968-12-02 1973-02-21 Parsons & Co Sir Howard G Evaporation sources for depositing thin films
JPS5315837B2 (xx) * 1974-04-16 1978-05-27

Also Published As

Publication number Publication date
IT1036929B (it) 1979-10-30
JPS5149183A (ja) 1976-04-28
LU73127A1 (xx) 1976-04-13
DE2527269A1 (de) 1976-02-12
JPS5825739B2 (ja) 1983-05-30
SU652237A1 (ru) 1979-03-15
DD113247A1 (xx) 1975-05-20

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