BE794343A - Methode de protection d'une partie d'un substrat soumis a l'action d'1n faisceau electronique - Google Patents

Methode de protection d'une partie d'un substrat soumis a l'action d'1n faisceau electronique

Info

Publication number
BE794343A
BE794343A BE794343DA BE794343A BE 794343 A BE794343 A BE 794343A BE 794343D A BE794343D A BE 794343DA BE 794343 A BE794343 A BE 794343A
Authority
BE
Belgium
Prior art keywords
action
protecting part
substrate subject
electronic harness
harness
Prior art date
Application number
Other languages
English (en)
French (fr)
Inventor
L Scala
D F Ciliberti
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE794343A publication Critical patent/BE794343A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293—Organic, e.g. plastic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE794343D 1972-01-21 Methode de protection d'une partie d'un substrat soumis a l'action d'1n faisceau electronique BE794343A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21988172A 1972-01-21 1972-01-21

Publications (1)

Publication Number Publication Date
BE794343A true BE794343A (fr) 1973-07-19

Family

ID=22821140

Family Applications (1)

Application Number Title Priority Date Filing Date
BE794343D BE794343A (fr) 1972-01-21 Methode de protection d'une partie d'un substrat soumis a l'action d'1n faisceau electronique

Country Status (8)

Country Link
US (1) US3794510A (cs)
JP (1) JPS5129017B2 (cs)
BE (1) BE794343A (cs)
DE (1) DE2302667C3 (cs)
FR (1) FR2168593A1 (cs)
GB (1) GB1417726A (cs)
IT (1) IT978291B (cs)
SE (1) SE386210B (cs)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3950569A (en) * 1972-05-05 1976-04-13 W. R. Grace & Co. Method for preparing coatings with solid curable compositions containing styrene-allyl alcohol copolymer based polythiols
US4012536A (en) * 1972-12-14 1977-03-15 Rca Corporation Electron beam recording medium comprising 1-methylvinyl methyl ketone
US4018937A (en) * 1972-12-14 1977-04-19 Rca Corporation Electron beam recording comprising polymer of 1-methylvinyl methyl ketone
US4061799A (en) * 1973-11-05 1977-12-06 Texas Instruments Incorporated Method of patterning styrene diene block copolymer electron beam resists
US3916035A (en) * 1973-11-05 1975-10-28 Texas Instruments Inc Epoxy-polymer electron beam resists
DE2545047C3 (de) * 1975-10-08 1978-09-21 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur Herstellung eines Halbleiterfestwertspeichers
JPS5315153A (en) * 1976-07-27 1978-02-10 Canon Inc Hologram
CS193322B1 (en) * 1977-11-07 1979-10-31 Jaroslav Kalal Electron resisit
JPS5511217A (en) * 1978-07-10 1980-01-26 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method using radiation sensitive high polymer
EP0048291B1 (de) * 1980-09-19 1985-07-03 Ibm Deutschland Gmbh Struktur mit einem eine durchgehende Öffnung aufweisenden Siliciumkörper und Verfahren zu ihrer Herstellung
US4892617A (en) * 1984-08-22 1990-01-09 American Telephone & Telegraph Company, At&T Bell Laboratories Processes involving lithographic materials
JPH0234984A (ja) * 1988-04-13 1990-02-05 Mitsubishi Electric Corp プリント回路基板の製造方法

Also Published As

Publication number Publication date
US3794510A (en) 1974-02-26
SE386210B (sv) 1976-08-02
JPS4883828A (cs) 1973-11-08
DE2302667C3 (de) 1982-01-07
JPS5129017B2 (cs) 1976-08-23
DE2302667B2 (de) 1981-01-22
IT978291B (it) 1974-09-20
FR2168593A1 (cs) 1973-08-31
GB1417726A (en) 1975-12-17
DE2302667A1 (de) 1973-07-26

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