BE787829A - Procede pour regler l'exposition d'un echantillon a un faisceaud'ions - Google Patents
Procede pour regler l'exposition d'un echantillon a un faisceaud'ionsInfo
- Publication number
- BE787829A BE787829A BE787829A BE787829A BE787829A BE 787829 A BE787829 A BE 787829A BE 787829 A BE787829 A BE 787829A BE 787829 A BE787829 A BE 787829A BE 787829 A BE787829 A BE 787829A
- Authority
- BE
- Belgium
- Prior art keywords
- exposure
- sample
- adjusting
- ion beam
- ion
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17446371A | 1971-08-24 | 1971-08-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE787829A true BE787829A (fr) | 1972-12-18 |
Family
ID=22636242
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE787829A BE787829A (fr) | 1971-08-24 | 1972-08-22 | Procede pour regler l'exposition d'un echantillon a un faisceaud'ions |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS4830000A (xx) |
BE (1) | BE787829A (xx) |
CA (1) | CA953823A (xx) |
DE (1) | DE2239284A1 (xx) |
FR (1) | FR2151361A5 (xx) |
GB (1) | GB1378667A (xx) |
IT (1) | IT965998B (xx) |
NL (1) | NL7211326A (xx) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58106823A (ja) * | 1981-12-18 | 1983-06-25 | Toshiba Corp | イオン注入方法 |
JPS6110025A (ja) * | 1984-06-23 | 1986-01-17 | Toagosei Chem Ind Co Ltd | 水溶液の精製法 |
US4929588A (en) * | 1987-12-02 | 1990-05-29 | Lithium Corporation Of America | Sodium removal, from brines |
US4859343A (en) * | 1987-12-02 | 1989-08-22 | Lithium Corporation Of America | Sodium removal from brines |
US5449916A (en) * | 1994-09-09 | 1995-09-12 | Atomic Energy Of Canada Limited | Electron radiation dose tailoring by variable beam pulse generation |
-
1972
- 1972-04-18 CA CA139,929A patent/CA953823A/en not_active Expired
- 1972-08-10 DE DE19722239284 patent/DE2239284A1/de active Pending
- 1972-08-18 IT IT5225072A patent/IT965998B/it active
- 1972-08-18 NL NL7211326A patent/NL7211326A/xx unknown
- 1972-08-21 JP JP8286872A patent/JPS4830000A/ja active Pending
- 1972-08-22 BE BE787829A patent/BE787829A/xx unknown
- 1972-08-23 FR FR7230048A patent/FR2151361A5/fr not_active Expired
- 1972-08-24 GB GB3937872A patent/GB1378667A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
IT965998B (it) | 1974-02-11 |
GB1378667A (en) | 1974-12-27 |
DE2239284A1 (de) | 1973-03-08 |
FR2151361A5 (xx) | 1973-04-13 |
NL7211326A (xx) | 1973-02-27 |
CA953823A (en) | 1974-08-27 |
JPS4830000A (xx) | 1973-04-20 |
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