FR2328281A1 - Procede pour l'irradiation corpusculaire d'une preparation - Google Patents

Procede pour l'irradiation corpusculaire d'une preparation

Info

Publication number
FR2328281A1
FR2328281A1 FR7626502A FR7626502A FR2328281A1 FR 2328281 A1 FR2328281 A1 FR 2328281A1 FR 7626502 A FR7626502 A FR 7626502A FR 7626502 A FR7626502 A FR 7626502A FR 2328281 A1 FR2328281 A1 FR 2328281A1
Authority
FR
France
Prior art keywords
preparation
corpuscular
irradiation
corpuscular irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7626502A
Other languages
English (en)
Other versions
FR2328281B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2328281A1 publication Critical patent/FR2328281A1/fr
Application granted granted Critical
Publication of FR2328281B1 publication Critical patent/FR2328281B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
FR7626502A 1975-10-17 1976-09-02 Procede pour l'irradiation corpusculaire d'une preparation Granted FR2328281A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2547079A DE2547079C3 (de) 1975-10-17 1975-10-17 Verfahren zur Korpuskularbestrahlung eines Präparats

Publications (2)

Publication Number Publication Date
FR2328281A1 true FR2328281A1 (fr) 1977-05-13
FR2328281B1 FR2328281B1 (fr) 1980-08-22

Family

ID=5959673

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7626502A Granted FR2328281A1 (fr) 1975-10-17 1976-09-02 Procede pour l'irradiation corpusculaire d'une preparation

Country Status (6)

Country Link
US (1) US4136285A (fr)
JP (1) JPS5250289A (fr)
DE (1) DE2547079C3 (fr)
FR (1) FR2328281A1 (fr)
GB (1) GB1567635A (fr)
NL (1) NL7611269A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0001042A1 (fr) * 1977-09-02 1979-03-21 International Business Machines Corporation Procédé et dispositif pour l'exposition par projection d'ombre de rayons corpusculaires
DE2918535A1 (de) * 1978-05-08 1979-11-15 Rockwell International Corp Verfahren und vorrichtung zur elektronenlithographie
WO1987005438A1 (fr) * 1986-03-07 1987-09-11 Hughes Aircraft Company Procede et systeme de lithographie par faisceau ionique masque

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
DE2837590A1 (de) * 1978-08-29 1980-03-13 Ibm Deutschland Verfahren zur schattenwurfbelichtung
DE2841124C2 (de) * 1978-09-21 1984-09-13 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen von elektronischen Halbleiterbauelementen durch Röntgen-Lithographie
DE3138744A1 (de) * 1981-09-29 1983-04-07 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von halbleitervorrichtungen
EP0122563B1 (fr) * 1983-04-14 1988-03-30 Siemens Aktiengesellschaft Procédé de reproduction de couches à barrières électriques (jonctions pn) dans des semi-conducteurs par élaboration de signaux induits des rayons corpusculaires dans un microscope corpusculaire à balayage
DE3410885A1 (de) * 1984-03-24 1985-10-03 Ibm Deutschland Gmbh, 7000 Stuttgart Fehlerkorrigierte korpuskularstrahllithographie
NL8702570A (nl) * 1987-10-29 1989-05-16 Philips Nv Geladen deeltjes bundel apparaat.
EP0732624B1 (fr) * 1995-03-17 2001-10-10 Ebara Corporation Méthode de fabrication utilisant un faisceau d'énergie
AT406100B (de) * 1996-08-08 2000-02-25 Thallner Erich Kontaktbelichtungsverfahren zur herstellung von halbleiterbausteinen
US7423269B1 (en) * 2005-02-26 2008-09-09 Kla-Tencor Technologies Corporation Automated feature analysis with off-axis tilting
EP3016130A1 (fr) * 2014-10-28 2016-05-04 Fei Company Trajet de balayage composite dans un microscope à particules chargées

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3770934A (en) * 1971-10-29 1973-11-06 Machlett Lab Inc Electron beam heating apparatus
US3914608A (en) * 1973-12-19 1975-10-21 Westinghouse Electric Corp Rapid exposure of micropatterns with a scanning electron microscope
DE2446789A1 (de) * 1974-09-27 1976-09-02 Siemens Ag Korpuskularstrahloptisches geraet zur korpuskelbestrahlung eines praeparats
US3924136A (en) * 1975-02-18 1975-12-02 Stanford Research Inst Charged particle apodized pattern imaging and exposure system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0001042A1 (fr) * 1977-09-02 1979-03-21 International Business Machines Corporation Procédé et dispositif pour l'exposition par projection d'ombre de rayons corpusculaires
DE2918535A1 (de) * 1978-05-08 1979-11-15 Rockwell International Corp Verfahren und vorrichtung zur elektronenlithographie
WO1987005438A1 (fr) * 1986-03-07 1987-09-11 Hughes Aircraft Company Procede et systeme de lithographie par faisceau ionique masque
US4757208A (en) * 1986-03-07 1988-07-12 Hughes Aircraft Company Masked ion beam lithography system and method

Also Published As

Publication number Publication date
DE2547079A1 (de) 1977-04-21
US4136285A (en) 1979-01-23
FR2328281B1 (fr) 1980-08-22
GB1567635A (en) 1980-05-21
JPS5250289A (en) 1977-04-22
DE2547079C3 (de) 1979-12-06
NL7611269A (nl) 1977-04-19
DE2547079B2 (de) 1979-04-12

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Legal Events

Date Code Title Description
ST Notification of lapse