BE757512A - Agent pour la realisation de configurations dans de minces couches en dioxyde de silicium par decapage selectif et son procede de preparation - Google Patents

Agent pour la realisation de configurations dans de minces couches en dioxyde de silicium par decapage selectif et son procede de preparation

Info

Publication number
BE757512A
BE757512A BE70@@@@@@@@A BE757512DA BE757512A BE 757512 A BE757512 A BE 757512A BE 757512D A BE757512D A BE 757512DA BE 757512 A BE757512 A BE 757512A
Authority
BE
Belgium
Prior art keywords
realization
configurations
agent
silicon dioxide
preparation process
Prior art date
Application number
BE70@@@@@@@@A
Other languages
English (en)
French (fr)
Inventor
Patentverwaltung G M B Philips
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of BE757512A publication Critical patent/BE757512A/xx

Links

Classifications

    • H10P50/283—
BE70@@@@@@@@A 1969-10-15 1970-10-14 Agent pour la realisation de configurations dans de minces couches en dioxyde de silicium par decapage selectif et son procede de preparation BE757512A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691951968 DE1951968A1 (de) 1969-10-15 1969-10-15 AEtzloesung zur selektiven Musterzeugung in duennen Siliziumdioxydschichten

Publications (1)

Publication Number Publication Date
BE757512A true BE757512A (fr) 1971-04-14

Family

ID=5748277

Family Applications (1)

Application Number Title Priority Date Filing Date
BE70@@@@@@@@A BE757512A (fr) 1969-10-15 1970-10-14 Agent pour la realisation de configurations dans de minces couches en dioxyde de silicium par decapage selectif et son procede de preparation

Country Status (8)

Country Link
US (1) US3671437A (enExample)
JP (1) JPS5013113B1 (enExample)
BE (1) BE757512A (enExample)
DE (1) DE1951968A1 (enExample)
FR (1) FR2064339B1 (enExample)
GB (1) GB1320560A (enExample)
NL (1) NL7014891A (enExample)
SE (1) SE357214B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1423448A (en) * 1973-07-18 1976-02-04 Plessey Co Ltd Method of selectively etching silicon nitride
US3920471A (en) * 1974-10-10 1975-11-18 Teletype Corp Prevention of aluminum etching during silox photoshaping
US4022424A (en) * 1975-09-29 1977-05-10 General Electric Company Shaft bearing and seals for butterfly valves
US4548791A (en) * 1983-09-30 1985-10-22 American Chemical & Refining Company, Inc. Thallium-containing composition for stripping palladium
US5277835A (en) * 1989-06-26 1994-01-11 Hashimoto Chemical Industries Co., Ltd. Surface treatment agent for fine surface treatment
US5695661A (en) 1995-06-07 1997-12-09 Micron Display Technology, Inc. Silicon dioxide etch process which protects metal
US5876879A (en) * 1997-05-29 1999-03-02 International Business Machines Corporation Oxide layer patterned by vapor phase etching
US6074951A (en) * 1997-05-29 2000-06-13 International Business Machines Corporation Vapor phase etching of oxide masked by resist or masking material
US5838055A (en) * 1997-05-29 1998-11-17 International Business Machines Corporation Trench sidewall patterned by vapor phase etching
JP3678212B2 (ja) * 2002-05-20 2005-08-03 ウシオ電機株式会社 超高圧水銀ランプ
US8226840B2 (en) 2008-05-02 2012-07-24 Micron Technology, Inc. Methods of removing silicon dioxide
AU2021250464A1 (en) * 2020-03-31 2022-11-17 The University Of Sydney Aligned fibres and a method of making the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1002026A (fr) * 1946-07-16 1952-03-03 Standard Francaise Petroles Procédé d'inhibition de l'action corrosive des acides halogencs et notamment de l'acide chlorhydrique vis-à-vis des métaux
US3474021A (en) * 1966-01-12 1969-10-21 Ibm Method of forming openings using sequential sputtering and chemical etching

Also Published As

Publication number Publication date
FR2064339B1 (enExample) 1977-01-21
NL7014891A (enExample) 1971-04-19
SE357214B (enExample) 1973-06-18
DE1951968A1 (de) 1971-04-22
JPS5013113B1 (enExample) 1975-05-16
FR2064339A1 (enExample) 1971-07-23
GB1320560A (en) 1973-06-13
US3671437A (en) 1972-06-20

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