BE728339A - - Google Patents

Info

Publication number
BE728339A
BE728339A BE728339DA BE728339A BE 728339 A BE728339 A BE 728339A BE 728339D A BE728339D A BE 728339DA BE 728339 A BE728339 A BE 728339A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE728339A publication Critical patent/BE728339A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE728339D 1968-02-14 1969-02-13 BE728339A (xx)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70532368A 1968-02-14 1968-02-14
US77512368A 1968-11-12 1968-11-12

Publications (1)

Publication Number Publication Date
BE728339A true BE728339A (xx) 1969-08-13

Family

ID=27107482

Family Applications (1)

Application Number Title Priority Date Filing Date
BE728339D BE728339A (xx) 1968-02-14 1969-02-13

Country Status (7)

Country Link
US (1) US3615435A (xx)
JP (1) JPS4910689B1 (xx)
BE (1) BE728339A (xx)
DE (1) DE1906668C3 (xx)
FR (1) FR2001913A1 (xx)
GB (1) GB1242193A (xx)
SE (1) SE364123B (xx)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3770438A (en) * 1971-12-09 1973-11-06 J Celeste Photopolymerizable transfer elements
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
US4002478A (en) * 1973-03-15 1977-01-11 Kansai Paint Company, Ltd. Method for forming relief pattern
JPS6032173B2 (ja) * 1974-12-28 1985-07-26 富士写真フイルム株式会社 画像形成法
US4356251A (en) * 1975-06-03 1982-10-26 E. I. Du Pont De Nemours And Company Multilayer photosensitive element with solvent-soluble layer
US4191572A (en) * 1975-06-03 1980-03-04 E. I. Du Pont De Nemours And Company Process for image reproduction using multilayer photosensitive element with solvent-soluble layer
DE2623926C3 (de) * 1975-06-03 1981-10-29 E.I. du Pont de Nemours and Co., 19898 Wilmington, Del. Photographisches Aufzeichnungsmaterial und Bildreproduktionsverfahren
US4081282A (en) * 1975-11-03 1978-03-28 Seal Incorporated Dry transfer image systems with non-light sensitive frangible layer
US4055424A (en) * 1976-05-07 1977-10-25 Xerox Corporation Novel microfilm and process for preparation
DE2658422C2 (de) * 1976-12-23 1986-05-22 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Negativ-Trockenresistfilms
US4123272A (en) * 1977-05-17 1978-10-31 E. I. Du Pont De Nemours And Company Double-negative positive-working photohardenable elements
DE2854010A1 (de) * 1977-12-21 1979-07-05 Letraset International Ltd Verfahren zur herstellung von schildern
BE878405A (fr) * 1978-08-24 1979-12-17 Letraset Internat Ltd Materiels photosensibles
GB2039070B (en) * 1978-12-12 1983-05-11 Du Pont Process for preparing high opacity coloured images
US4262071A (en) * 1979-08-20 1981-04-14 Minnesota Mining And Manufacturing Company Optical enhancement of color proofing images
US4336113A (en) * 1981-06-26 1982-06-22 American Hoechst Corporation Electrolytic graining of aluminum with hydrogen peroxide and nitric or hydrochloric acid
US4458003A (en) * 1982-06-07 1984-07-03 Esselte Pendaflex Corp. Photosensitive materials for use in making dry transfers
JPS5997140A (ja) * 1982-11-26 1984-06-04 Fuji Photo Film Co Ltd カラ−プル−フイングシ−トの製法
US4952478A (en) * 1986-12-02 1990-08-28 Canon Kabushiki Kaisha Transfer recording medium comprising a layer changing its transferability when provided with light and heat
CN1042016A (zh) * 1988-10-17 1990-05-09 米德公司 有开口多孔基体的成象片及其使用方法
US4912014A (en) * 1988-10-17 1990-03-27 The Mead Corporation Imaging sheet having an open porous matrix containing a photohardenable composition, and a method for use of such a sheet
US5266427A (en) * 1988-10-18 1993-11-30 Nippondenso Co., Ltd. Display board and method for producing the same
EP0413863A1 (en) * 1989-08-24 1991-02-27 Toyo Ink Manufacturing Co., Ltd. Image-forming process and image-forming material
NZ237919A (en) * 1990-04-26 1994-09-27 Grace W R & Co Photocurable element comprising photocurable base layer and a photocurable printing layer which comprises two incompatible elastomeric polymers and a photopolymerisable monomer, base layer comprising elastomer, monomer and photoinitiator; relief printing plates
US5087549A (en) * 1990-10-19 1992-02-11 E. I. Du Pont De Nemours And Company Image reproduction process using a peel-apart photosensitive element
EP0522616B1 (en) * 1991-07-12 1995-10-04 Agfa-Gevaert N.V. Method for producing images using a photopolymerizable composition
US5409798A (en) * 1991-08-30 1995-04-25 Canon Kabushiki Kaisha Plate blank, process for producing printing plate from plate blank, and printing method and apparatus using plate
US5258263A (en) * 1991-09-10 1993-11-02 Polaroid Corporation Printing plate and methods of making and use same
US5545506A (en) * 1992-01-28 1996-08-13 Hoechst Celanese Corporation Method of producing an image using a negative working, peel developable, single sheet color proofing system
DE4311949A1 (de) * 1993-04-10 1994-10-13 Hoechst Ag Photopolymerisierbares Material und Verfahren zur Herstellung eines farbigen Bildes
US5352326A (en) * 1993-05-28 1994-10-04 International Business Machines Corporation Process for manufacturing metalized ceramic substrates
WO1996010214A1 (en) * 1994-09-27 1996-04-04 Agfa-Gevaert Naamloze Vennootschap Negative working overlay colour proofing system
WO1996010215A1 (en) * 1994-09-27 1996-04-04 Agfa-Gevaert Naamloze Vennootschap Negative working surprint colour proofing system
WO1996010216A1 (en) * 1994-09-27 1996-04-04 Agfa-Gevaert Naamloze Vennootschap Negative or positive working surprint colour proofing system
US5856064A (en) * 1996-09-10 1999-01-05 Minnesota Mining And Manufacturing Company Dry peel-apart imaging or proofing system
US20040062896A1 (en) * 2002-09-26 2004-04-01 Picone Terrence F. Fractionally-releasable bonding layer for use in photo-sensitive laminate films
US20090004419A1 (en) * 2007-06-29 2009-01-01 Cok Ronald S Multi-layer masking film

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL245513A (xx) * 1959-01-23
NL287134A (xx) * 1959-08-05
NL132290C (xx) * 1959-09-11
NL273285A (xx) * 1961-01-09
US3353955A (en) * 1964-06-16 1967-11-21 Du Pont Stratum transfer process based on adhesive properties of photopolymerizable layer
DE1285876B (de) * 1964-06-16 1968-12-19 Du Pont Fotopolymerisierbares Aufzeichnungsmaterial

Also Published As

Publication number Publication date
GB1242193A (en) 1971-08-11
DE1906668C3 (de) 1981-09-03
SE364123B (xx) 1974-02-11
JPS4910689B1 (xx) 1974-03-12
US3615435A (en) 1971-10-26
DE1906668B2 (de) 1973-11-29
DE1906668A1 (de) 1970-10-29
FR2001913A1 (xx) 1969-10-03

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Legal Events

Date Code Title Description
RE20 Patent expired

Owner name: E.I. DU PONT DE NEMOURS AND CY

Effective date: 19890213