BE723474A - - Google Patents
Info
- Publication number
- BE723474A BE723474A BE723474DA BE723474A BE 723474 A BE723474 A BE 723474A BE 723474D A BE723474D A BE 723474DA BE 723474 A BE723474 A BE 723474A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F38/00—Homopolymers and copolymers of compounds having one or more carbon-to-carbon triple bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK63857A DE1296975B (de) | 1967-11-09 | 1967-11-09 | Lichtempfindliches Gemisch |
| SE08877/68A SE356610B (xx) | 1968-06-28 | 1968-06-28 | |
| DE1797308A DE1797308C3 (de) | 1967-11-09 | 1968-09-11 | Lichtempfindliches Gemisch |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE723474A true BE723474A (xx) | 1969-05-06 |
Family
ID=41416068
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE723474D BE723474A (xx) | 1967-11-09 | 1968-11-06 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3615630A (xx) |
| AT (1) | AT288858B (xx) |
| BE (1) | BE723474A (xx) |
| DE (2) | DE1296975B (xx) |
| FR (1) | FR1591359A (xx) |
| GB (1) | GB1208190A (xx) |
| NL (1) | NL6815475A (xx) |
| SE (1) | SE349406B (xx) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3772011A (en) * | 1971-11-04 | 1973-11-13 | Eastman Kodak Co | Print-out elements and methods using photoconductors and polygnes |
| CA1056189A (en) * | 1974-04-23 | 1979-06-12 | Ernst Leberzammer | Polymeric binders for aqueous processable photopolymer compositions |
| DE2720560A1 (de) * | 1977-05-07 | 1978-11-09 | Basf Ag | Verbesserte photopolymerisierbare massen fuer die herstellung von druckplatten und reliefformen |
| US4610951A (en) * | 1983-06-06 | 1986-09-09 | Dynachem Corporation | Process of using a flexible, fast processing photopolymerizable composition |
| US4539286A (en) * | 1983-06-06 | 1985-09-03 | Dynachem Corporation | Flexible, fast processing, photopolymerizable composition |
| US4708962A (en) * | 1984-12-17 | 1987-11-24 | Harbor Branch Oceanographic Institution, Inc. | Antiviral and antitumor cyclohexadienone compositions |
| DE3930087A1 (de) * | 1989-09-09 | 1991-03-14 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| DE3930086A1 (de) * | 1989-09-09 | 1991-03-21 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| DE4006190A1 (de) * | 1990-02-28 | 1991-08-29 | Hoechst Ag | Negativ arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| JP2002341558A (ja) * | 2001-05-11 | 2002-11-27 | Fuji Photo Film Co Ltd | 平版印刷版の印刷処理方法及び平版印刷版 |
| ES2319117T3 (es) * | 2002-10-24 | 2009-05-04 | Toray Industries, Inc. | Original para plancha de impresion con resina fotosensible, proceso para producir la misma y proceso para producir con esta una plancha de impresion en relieve con resina. |
| KR101222947B1 (ko) * | 2005-06-30 | 2013-01-17 | 엘지디스플레이 주식회사 | 인쇄용 용제, 및 그를 이용한 인쇄용 패턴 조성물 및 패턴 형성방법 |
| JP5299838B2 (ja) * | 2008-03-18 | 2013-09-25 | 川崎化成工業株式会社 | １０−ヒドロキシ−１０−ナフチルメチルアントラセン−９（１０ｈ）−オン化合物及びその光ラジカル重合開始剤としての用途。 |
-
1967
- 1967-11-09 DE DEK63857A patent/DE1296975B/de active Pending
-
1968
- 1968-06-26 SE SE08639/68A patent/SE349406B/xx unknown
- 1968-09-11 DE DE1797308A patent/DE1797308C3/de not_active Expired
- 1968-10-30 NL NL6815475A patent/NL6815475A/xx unknown
- 1968-11-06 AT AT1078568A patent/AT288858B/de not_active IP Right Cessation
- 1968-11-06 US US773971A patent/US3615630A/en not_active Expired - Lifetime
- 1968-11-06 BE BE723474D patent/BE723474A/xx unknown
- 1968-11-08 GB GB52975/68A patent/GB1208190A/en not_active Expired
- 1968-11-08 FR FR1591359D patent/FR1591359A/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE1797308C3 (de) | 1978-07-13 |
| GB1208190A (en) | 1970-10-07 |
| SE349406B (xx) | 1972-09-25 |
| DE1797308B2 (de) | 1977-11-10 |
| AT288858B (de) | 1971-03-25 |
| NL6815475A (xx) | 1969-05-13 |
| DE1797308A1 (de) | 1971-04-29 |
| US3615630A (en) | 1971-10-26 |
| FR1591359A (xx) | 1970-04-27 |
| DE1296975B (de) | 1969-06-04 |