BE721965A - - Google Patents
Info
- Publication number
- BE721965A BE721965A BE721965DA BE721965A BE 721965 A BE721965 A BE 721965A BE 721965D A BE721965D A BE 721965DA BE 721965 A BE721965 A BE 721965A
- Authority
- BE
- Belgium
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/547—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on sulfides or selenides or tellurides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/002—Making metallic powder or suspensions thereof amorphous or microcrystalline
- B22F9/008—Rapid solidification processing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/5805—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on borides
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C28/00—Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C32/00—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
- G03G5/08207—Selenium-based
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
- G03G5/08285—Carbon-based
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/158—Sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/169—Vacuum deposition, e.g. including molecular beam epitaxy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/825—Apparatus per se, device per se, or process of making or operating same
- Y10S505/848—Radiant energy application
- Y10S505/849—Infrared responsive electric signaling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/31938—Polymer of monoethylenically unsaturated hydrocarbon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Ceramic Engineering (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Structural Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photoreceptors In Electrophotography (AREA)
- Light Receiving Elements (AREA)
- Led Devices (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US55021566A | 1966-05-16 | 1966-05-16 | |
US67426767A | 1967-10-10 | 1967-10-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE721965A true BE721965A (fr) | 1969-04-08 |
Family
ID=27069371
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE721965D BE721965A (fr) | 1966-05-16 | 1968-10-07 |
Country Status (7)
Country | Link |
---|---|
US (5) | US3627573A (fr) |
BE (1) | BE721965A (fr) |
CH (1) | CH517359A (fr) |
DE (1) | DE1801636A1 (fr) |
FR (1) | FR95985E (fr) |
GB (2) | GB1251630A (fr) |
NL (1) | NL6814501A (fr) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR95985E (fr) * | 1966-05-16 | 1972-05-19 | Rank Xerox Ltd | Semi-conducteurs vitreux et leur procédé de fabrication sous forme de pellicules minces. |
LU52765A1 (fr) * | 1967-01-06 | 1968-08-06 | ||
US3941591A (en) * | 1969-01-22 | 1976-03-02 | Canon Kabushiki Kaisha | Electrophotographic photoconductive member employing a chalcogen alloy and a crystallization inhibiting element |
US4122232A (en) * | 1975-04-21 | 1978-10-24 | Engelhard Minerals & Chemicals Corporation | Air firable base metal conductors |
US4015029A (en) * | 1975-06-27 | 1977-03-29 | Xerox Corporation | Selenium and selenium alloy evaporation technique |
US4652794A (en) * | 1982-12-10 | 1987-03-24 | National Research Development Corporation | Electroluminescent device having a resistive backing layer |
JPS60118651A (ja) * | 1983-11-28 | 1985-06-26 | Hitachi Ltd | 赤外光フアイバ用ガラス材料 |
US5162054A (en) * | 1989-09-07 | 1992-11-10 | Hoya Corporation | Process for producing multi-component glass doped with microparticles |
JPH0397638A (ja) * | 1989-09-07 | 1991-04-23 | Hoya Corp | 微粒子分散多成分ガラスおよびその製造方法 |
US7194197B1 (en) | 2000-03-16 | 2007-03-20 | Global Solar Energy, Inc. | Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer |
US7515332B2 (en) * | 2004-02-18 | 2009-04-07 | Nippon Sheet Glass Company, Limited | Glass composition that emits fluorescence in infrared wavelength region and method of amplifying signal light using the same |
JP4252918B2 (ja) * | 2004-03-24 | 2009-04-08 | 富士フイルム株式会社 | 放射線撮像パネルを構成する光導電層の製造方法 |
JP2009503251A (ja) * | 2005-07-27 | 2009-01-29 | アプライド マテリアルズ ゲーエムベーハー ウント ツェーオー カーゲー | エバポレータと、蒸発ボートを掴持および位置決めするデバイスとを備える真空処置プラント |
US20090255467A1 (en) | 2008-04-15 | 2009-10-15 | Global Solar Energy, Inc. | Apparatus and methods for manufacturing thin-film solar cells |
GB0911134D0 (en) | 2009-06-26 | 2009-08-12 | Univ Surrey | Optoelectronic devices |
US9129775B2 (en) * | 2009-07-15 | 2015-09-08 | Hitachi High-Technologies Corporation | Specimen potential measuring method, and charged particle beam device |
WO2011082179A1 (fr) * | 2009-12-28 | 2011-07-07 | Global Solar Energy, Inc. | Appareil et procédés de mélange et de déposition de compositions photovoltaïques en film mince |
CN108423643A (zh) * | 2018-04-17 | 2018-08-21 | 福州大学 | 一种通过控制气体流量在云母衬底上制备硒化铋纳米片的方法 |
CN108467018A (zh) * | 2018-04-17 | 2018-08-31 | 福州大学 | 一种在云母衬底上制备硒化铋纳米片的方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2759861A (en) * | 1954-09-22 | 1956-08-21 | Bell Telephone Labor Inc | Process of making photoconductive compounds |
US2788381A (en) * | 1955-07-26 | 1957-04-09 | Hughes Aircraft Co | Fused-junction semiconductor photocells |
US2868736A (en) * | 1955-10-18 | 1959-01-13 | Tung Sol Electric Inc | Preparation of photosensitive crystals |
NL103088C (fr) * | 1957-06-08 | |||
BE568418A (fr) * | 1957-06-08 | |||
US3077386A (en) * | 1958-01-02 | 1963-02-12 | Xerox Corp | Process for treating selenium |
US3041166A (en) * | 1958-02-12 | 1962-06-26 | Xerox Corp | Xerographic plate and method |
US2962376A (en) * | 1958-05-14 | 1960-11-29 | Haloid Xerox Inc | Xerographic member |
US3065112A (en) * | 1958-06-24 | 1962-11-20 | Union Carbide Corp | Process for the production of large semiconductor crystals |
US2946682A (en) * | 1958-12-12 | 1960-07-26 | Rca Corp | Electrostatic printing |
GB932730A (fr) * | 1958-12-18 | |||
US3345161A (en) * | 1963-03-13 | 1967-10-03 | Gen Aniline & Film Corp | Photoconductive material and process for its preparation |
DE1250737B (fr) * | 1963-07-08 | |||
US3361591A (en) * | 1964-04-15 | 1968-01-02 | Hughes Aircraft Co | Production of thin films of cadmium sulfide, cadmium telluride or cadmium selenide |
GB1160895A (en) * | 1965-08-25 | 1969-08-06 | Rank Xerox Ltd | Coating Surfaces by Vapour Deposition |
FR95985E (fr) * | 1966-05-16 | 1972-05-19 | Rank Xerox Ltd | Semi-conducteurs vitreux et leur procédé de fabrication sous forme de pellicules minces. |
US3490903A (en) * | 1966-07-20 | 1970-01-20 | Xerox Corp | Alloys of antimony and selenium used in photoconductive elements |
US3466191A (en) * | 1966-11-07 | 1969-09-09 | Us Army | Method of vacuum deposition of piezoelectric films of cadmium sulfide |
US3464820A (en) * | 1968-06-03 | 1969-09-02 | Fairchild Camera Instr Co | Electrophotographic engraving plate |
US3632439A (en) * | 1969-04-25 | 1972-01-04 | Westinghouse Electric Corp | Method of forming thin insulating films particularly for piezoelectric transducer |
-
0
- FR FR95985D patent/FR95985E/fr not_active Expired
-
1967
- 1967-10-10 US US3627573D patent/US3627573A/en not_active Expired - Lifetime
-
1968
- 1968-10-07 GB GB1251630D patent/GB1251630A/en not_active Expired
- 1968-10-07 GB GB1250176D patent/GB1250176A/en not_active Expired
- 1968-10-07 CH CH1495668A patent/CH517359A/de unknown
- 1968-10-07 DE DE19681801636 patent/DE1801636A1/de active Pending
- 1968-10-07 BE BE721965D patent/BE721965A/xx unknown
- 1968-10-10 NL NL6814501A patent/NL6814501A/xx unknown
-
1973
- 1973-01-05 US US32119473 patent/US3884688A/en not_active Expired - Lifetime
- 1973-06-18 US US37109673 patent/US3874917A/en not_active Expired - Lifetime
- 1973-07-23 US US38164373 patent/US3887368A/en not_active Expired - Lifetime
-
1974
- 1974-05-06 US US46703774 patent/US3909458A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US3909458A (en) | 1975-09-30 |
DE1801636A1 (de) | 1969-08-07 |
US3887368A (en) | 1975-06-03 |
CH517359A (de) | 1971-12-31 |
GB1251630A (fr) | 1971-10-27 |
US3874917A (en) | 1975-04-01 |
GB1250176A (fr) | 1971-10-20 |
FR95985E (fr) | 1972-05-19 |
NL6814501A (fr) | 1969-04-14 |
US3627573A (en) | 1971-12-14 |
US3884688A (en) | 1975-05-20 |