BE695396A - - Google Patents

Info

Publication number
BE695396A
BE695396A BE695396DA BE695396A BE 695396 A BE695396 A BE 695396A BE 695396D A BE695396D A BE 695396DA BE 695396 A BE695396 A BE 695396A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE695396A publication Critical patent/BE695396A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
BE695396D 1966-03-14 1967-03-13 BE695396A (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US53381766A 1966-03-14 1966-03-14

Publications (1)

Publication Number Publication Date
BE695396A true BE695396A (en:Method) 1967-09-13

Family

ID=24127559

Family Applications (1)

Application Number Title Priority Date Filing Date
BE695396D BE695396A (en:Method) 1966-03-14 1967-03-13

Country Status (5)

Country Link
US (1) US3448089A (en:Method)
JP (2) JPS5137316B1 (en:Method)
BE (1) BE695396A (en:Method)
DE (1) DE1745226C3 (en:Method)
GB (1) GB1153833A (en:Method)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2166551A1 (de) * 1970-12-26 1974-07-11 Asahi Chemical Ind Additionspolymerisierbare polymere verbindung und verfahren zu ihrer herstellung
DE2164518C3 (de) 1970-12-26 1976-04-29 Asahi Kasei Kogyo KJC., Osaka (Japan) Photopolymerisierbare Masse und deren Verwendung zur Herstellung von photopolymerisierbaren Schichtkörpern

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3530100A (en) * 1966-09-26 1970-09-22 Ppg Industries Inc Crosslinking polymers
US3542587A (en) * 1968-07-01 1970-11-24 Ford Motor Co Radiation curable paint containing a vinyl ester binder resin having pendant diester groups
BE757386A (fr) * 1969-10-13 1971-04-13 Du Pont Procede de transfert double pour images photodurcissables
US3953408A (en) * 1970-12-26 1976-04-27 Asahi Kasei Kogyo Kabushiki Kaisha Addition polymerizable polymeric compounds
DE2125909A1 (de) * 1971-05-25 1972-12-14 Bayer Ag Durch Photopolymerisation vernetzbare Polymere
US3770491A (en) * 1971-11-08 1973-11-06 Basf Ag System hardenable by ionizing radiation
IT977259B (it) * 1972-02-09 1974-09-10 Minnesota Mining & Mfg Polimero fotoreticolabile com posizione contenente tale polimero e procedimento per rivestire super fici con detta composizione
DE2249446C3 (de) * 1972-10-09 1979-02-15 Basf Farben + Fasern Ag, 2000 Hamburg Verwendung eines durch ionisierende Strahlung härtbaren Überzugsmittels zur Beschichtung von Oberflächen
JPS5226259B2 (en:Method) * 1973-02-10 1977-07-13
US3925330A (en) * 1974-01-07 1975-12-09 Goodrich Co B F Castable compositions containing unsaturated liquid vinylidene-terminated polymers
JPS5574310A (en) * 1978-11-10 1980-06-04 Furukawa Electric Co Ltd Fireeproof trough
US4378411A (en) * 1980-01-02 1983-03-29 Minnesota Mining And Manufacturing Company Radiation-curable polymers
US4304705A (en) * 1980-01-02 1981-12-08 Minnesota Mining And Manufacturing Company Radiation-curable polymers containing pendant unsaturated peptide groups derived from azlactone polymers
US4427835A (en) * 1981-08-07 1984-01-24 The Procter & Gamble Company Agents for preparing cross-linked polymers and paint and plastic compositions containing those agents
GB2109392B (en) * 1981-11-03 1985-06-26 Sericol Group Ltd Photopolymerisable materials for use in producing screen printing stencils
US4431685A (en) * 1982-07-02 1984-02-14 International Business Machines Corporation Decreasing plated metal defects
JPS5971048A (ja) * 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
US4980410A (en) * 1985-05-10 1990-12-25 E. I. Du Pont De Nemours And Company Acrylic copolymer composition and adhesive coatings therefrom
US4975484A (en) * 1985-05-10 1990-12-04 E. I. Du Pont De Nemours And Company Acrylic copolymer composition and adhesive coatings therefrom
DE3602472A1 (de) * 1986-01-28 1987-07-30 Basf Ag Polymeranalog modifizierte polymerisate
JPH0756012B2 (ja) * 1986-04-18 1995-06-14 関西ペイント株式会社 塗料組成物およびプラスチツク部材の塗装法
AU618772B2 (en) * 1987-12-30 1992-01-09 Minnesota Mining And Manufacturing Company Photocurable ionomer cement systems
US4956265A (en) * 1988-02-03 1990-09-11 Minnesota Mining And Manufacturing Company Radiation crosslinkable compositions
US4914165A (en) * 1988-02-03 1990-04-03 Minnesota Mining And Manufacturing Company Radiation crosslinkable compositions
US5723261A (en) * 1989-11-30 1998-03-03 Tamura Kaken Co., Ltd. Photopolymerizable composition
US5002982A (en) * 1990-02-26 1991-03-26 Gencorp Inc. Paper felts or mats
US5235015A (en) * 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
US5227413A (en) * 1992-02-27 1993-07-13 Minnesota Mining And Manufacturing Company Cements from β-dicarbonyl polymers
US6391940B1 (en) 1993-04-19 2002-05-21 Dentsply Research & Development Corp. Method and composition for adhering to metal dental structure
US6500879B1 (en) * 1993-04-19 2002-12-31 Dentsply Research & Development Corp. Dental composition and method
US5514522A (en) * 1993-11-01 1996-05-07 Polaroid Corporation Synthesis of photoreactive polymeric binders
US5576146A (en) * 1995-01-17 1996-11-19 Imation Corp. Photosensitive polymer-containing systems with increased shelf-lives
US5925497A (en) * 1995-04-27 1999-07-20 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
JPH11504435A (ja) * 1995-04-27 1999-04-20 ミネソタ・マイニング・アンド・マニュファクチャリング・カンパニー ネガ型処理不要印刷版
US5985990A (en) * 1995-12-29 1999-11-16 3M Innovative Properties Company Use of pendant free-radically polymerizable moieties with polar polymers to prepare hydrophilic pressure sensitive adhesive compositions
EP0869979B1 (en) * 1995-12-29 2000-11-08 Minnesota Mining And Manufacturing Company Use of pendant free-radically polymerizable moieties with polar polymers to prepare hydrophilic pressure sensitive adhesive compositions
US6045973A (en) * 1998-12-11 2000-04-04 Morton International, Inc. Photoimageable compositions having improved chemical resistance and stripping ability
IL133218A0 (en) * 1998-12-11 2001-03-19 Shipley Co Llc Photoimageable compositions having improved chemical resistance and stripping ability
JP4248137B2 (ja) * 2000-11-22 2009-04-02 富士フイルム株式会社 ネガ型感光性平版印刷版
CA2552905A1 (en) * 2004-01-26 2005-08-04 Nippon Kayaku Kabushiki Kaisha Photosensitive resin composition and cured product thereof
JP4514049B2 (ja) * 2005-08-01 2010-07-28 日本化薬株式会社 感光性樹脂組成物並びにその硬化物
CN101454277B (zh) * 2006-05-17 2014-02-19 美洲染料资源公司 用于平版印刷版涂料的材料、含这些材料的平版印刷版和涂料以及制备方法和用途
EP2105451B1 (en) * 2006-10-23 2012-02-15 FUJIFILM Corporation Nitrile group-containing polymer and method of synthesizing the same, composition containing nitrile group-containing polymer, and laminate
CN103588930B (zh) * 2006-10-23 2017-04-26 富士胶片株式会社 含有腈基的聚合物及其合成方法、使用含有腈基的聚合物的组合物及层压体
CN103038705B (zh) 2010-05-03 2016-04-20 巴斯夫欧洲公司 用于低温应用的滤色片
CN110083010A (zh) * 2011-08-10 2019-08-02 日立化成株式会社 感光性树脂组合物、感光性薄膜、永久抗蚀剂以及永久抗蚀剂的制造方法
US9085705B2 (en) * 2012-03-28 2015-07-21 Toray Industries, Inc. Photosensitive conductive paste and method of producing conductive pattern
BR102019009813A2 (pt) * 2018-06-05 2019-12-10 Dow Global Technologies Llc composição de revestimento curável por uv

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3317453A (en) * 1964-02-03 1967-05-02 Monsanto Co Copolymers of vinyl acetate, acrylic acid, and glycidal methacrylate and crosslinkedproducts thereof
US3366706A (en) * 1965-02-01 1968-01-30 Du Pont Derivatives of carboxyl-containing copolymers formed by the reaction of the pendent carboxyl groups with glycidyl esters and dicarboxlyic anhydrides

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2166551A1 (de) * 1970-12-26 1974-07-11 Asahi Chemical Ind Additionspolymerisierbare polymere verbindung und verfahren zu ihrer herstellung
DE2164518C3 (de) 1970-12-26 1976-04-29 Asahi Kasei Kogyo KJC., Osaka (Japan) Photopolymerisierbare Masse und deren Verwendung zur Herstellung von photopolymerisierbaren Schichtkörpern

Also Published As

Publication number Publication date
DE1745226B2 (de) 1978-09-21
JPS5137316B1 (en:Method) 1976-10-14
DE1745226A1 (de) 1972-03-30
JPS5223384B1 (en:Method) 1977-06-23
GB1153833A (en) 1969-05-29
US3448089A (en) 1969-06-03
DE1745226C3 (de) 1979-05-17

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