|
GB807995A
(en)
*
|
1955-09-02 |
1959-01-28 |
Gen Electric Co Ltd |
Improvements in or relating to the production of semiconductor bodies
|
|
US3114865A
(en)
*
|
1956-08-08 |
1963-12-17 |
Bendix Corp |
Semiconductor and unitary connector structure comprising alternately stacked base andemitter leads
|
|
US3145328A
(en)
*
|
1957-04-29 |
1964-08-18 |
Raytheon Co |
Methods of preventing channel formation on semiconductive bodies
|
|
US2989426A
(en)
*
|
1957-06-06 |
1961-06-20 |
Ibm |
Method of transistor manufacture
|
|
NL113333C
(enExample)
*
|
1957-09-19 |
|
|
|
|
US3111611A
(en)
*
|
1957-09-24 |
1963-11-19 |
Ibm |
Graded energy gap semiconductor devices
|
|
US3065392A
(en)
*
|
1958-02-07 |
1962-11-20 |
Rca Corp |
Semiconductor devices
|
|
NL241124A
(enExample)
*
|
1958-07-09 |
|
|
|
|
NL240883A
(enExample)
*
|
1958-07-17 |
|
|
|
|
NL242895A
(enExample)
*
|
1958-09-02 |
|
|
|
|
NL231409A
(enExample)
*
|
1958-09-16 |
1900-01-01 |
|
|
|
US3104991A
(en)
*
|
1958-09-23 |
1963-09-24 |
Raytheon Co |
Method of preparing semiconductor material
|
|
US3054034A
(en)
*
|
1958-10-01 |
1962-09-11 |
Rca Corp |
Semiconductor devices and method of manufacture thereof
|
|
US2992471A
(en)
*
|
1958-11-04 |
1961-07-18 |
Bell Telephone Labor Inc |
Formation of p-n junctions in p-type semiconductors
|
|
US3041213A
(en)
*
|
1958-11-17 |
1962-06-26 |
Texas Instruments Inc |
Diffused junction semiconductor device and method of making
|
|
US2956913A
(en)
*
|
1958-11-20 |
1960-10-18 |
Texas Instruments Inc |
Transistor and method of making same
|
|
US2974073A
(en)
*
|
1958-12-04 |
1961-03-07 |
Rca Corp |
Method of making phosphorus diffused silicon semiconductor devices
|
|
US3001896A
(en)
*
|
1958-12-24 |
1961-09-26 |
Ibm |
Diffusion control in germanium
|
|
NL135006C
(enExample)
*
|
1958-12-24 |
|
|
|
|
NL246032A
(enExample)
*
|
1959-01-27 |
|
|
|
|
DE1132247B
(de)
*
|
1959-01-30 |
1962-06-28 |
Siemens Ag |
Gesteuerte Vierschichtentriode mit vier Halbleiterschichten abwechselnden Leitfaehigkeitstyps
|
|
US3099588A
(en)
*
|
1959-03-11 |
1963-07-30 |
Westinghouse Electric Corp |
Formation of semiconductor transition regions by alloy vaporization and deposition
|
|
NL125412C
(enExample)
*
|
1959-04-15 |
|
|
|
|
US3070466A
(en)
*
|
1959-04-30 |
1962-12-25 |
Ibm |
Diffusion in semiconductor material
|
|
US3146135A
(en)
*
|
1959-05-11 |
1964-08-25 |
Clevite Corp |
Four layer semiconductive device
|
|
US2971139A
(en)
*
|
1959-06-16 |
1961-02-07 |
Fairchild Semiconductor |
Semiconductor switching device
|
|
US3089794A
(en)
*
|
1959-06-30 |
1963-05-14 |
Ibm |
Fabrication of pn junctions by deposition followed by diffusion
|
|
DE1124155B
(de)
*
|
1959-07-04 |
1962-02-22 |
Telefunken Patent |
Verfahren zur Herstellung eines nipin-Transistors
|
|
US3476993A
(en)
*
|
1959-09-08 |
1969-11-04 |
Gen Electric |
Five layer and junction bridging terminal switching device
|
|
US3105177A
(en)
*
|
1959-11-23 |
1963-09-24 |
Bell Telephone Labor Inc |
Semiconductive device utilizing quantum-mechanical tunneling
|
|
DE1166937B
(de)
*
|
1959-12-16 |
1964-04-02 |
Siemens Ag |
Verfahren zum Herstellen von Halbleiterbauelementen
|
|
NL262701A
(enExample)
*
|
1960-03-25 |
|
|
|
|
NL258408A
(enExample)
*
|
1960-06-10 |
|
|
|
|
DE1159096B
(de)
*
|
1960-12-05 |
1963-12-12 |
Fairchild Camera Instr Co |
Vierzonen-Halbleiterbauelement, insbesondere Transistor, zum Schalten mit einem pnpn-Halbleiterkoerper
|
|
NL274818A
(enExample)
*
|
1961-02-20 |
|
|
|
|
NL268355A
(enExample)
*
|
1961-08-17 |
|
|
|
|
US3210225A
(en)
*
|
1961-08-18 |
1965-10-05 |
Texas Instruments Inc |
Method of making transistor
|
|
US3197681A
(en)
*
|
1961-09-29 |
1965-07-27 |
Texas Instruments Inc |
Semiconductor devices with heavily doped region to prevent surface inversion
|
|
US3307088A
(en)
*
|
1962-03-13 |
1967-02-28 |
Fujikawa Kyoichi |
Silver-lead alloy contacts containing dopants for semiconductors
|
|
US3183128A
(en)
*
|
1962-06-11 |
1965-05-11 |
Fairchild Camera Instr Co |
Method of making field-effect transistors
|
|
US3239376A
(en)
*
|
1962-06-29 |
1966-03-08 |
Bell Telephone Labor Inc |
Electrodes to semiconductor wafers
|
|
GB1026489A
(en)
*
|
1963-11-15 |
1966-04-20 |
Standard Telephones Cables Ltd |
Semiconductor device fabrication
|
|
US3421943A
(en)
*
|
1964-02-14 |
1969-01-14 |
Westinghouse Electric Corp |
Solar cell panel having cell edge and base metal electrical connections
|
|
GB1045514A
(en)
*
|
1964-04-22 |
1966-10-12 |
Westinghouse Electric Corp |
Simultaneous double diffusion process
|
|
GB1068392A
(en)
*
|
1965-05-05 |
1967-05-10 |
Lucas Industries Ltd |
Semi-conductor devices
|
|
US3468729A
(en)
*
|
1966-03-21 |
1969-09-23 |
Westinghouse Electric Corp |
Method of making a semiconductor by oxidizing and simultaneous diffusion of impurities having different rates of diffusivity
|
|
US3475235A
(en)
*
|
1966-10-05 |
1969-10-28 |
Westinghouse Electric Corp |
Process for fabricating a semiconductor device
|
|
US3562610A
(en)
*
|
1967-05-25 |
1971-02-09 |
Westinghouse Electric Corp |
Controlled rectifier with improved switching characteristics
|
|
US3521134A
(en)
*
|
1968-11-14 |
1970-07-21 |
Hewlett Packard Co |
Semiconductor connection apparatus
|
|
US3836399A
(en)
*
|
1970-02-16 |
1974-09-17 |
Texas Instruments Inc |
PHOTOVOLTAIC DIODE WITH FIRST IMPURITY OF Cu AND SECOND OF Cd, Zn, OR Hg
|
|
US3943016A
(en)
*
|
1970-12-07 |
1976-03-09 |
General Electric Company |
Gallium-phosphorus simultaneous diffusion process
|