AU5744796A - Detection of fluids with metal-insulator-semiconductor sensors - Google Patents
Detection of fluids with metal-insulator-semiconductor sensorsInfo
- Publication number
- AU5744796A AU5744796A AU57447/96A AU5744796A AU5744796A AU 5744796 A AU5744796 A AU 5744796A AU 57447/96 A AU57447/96 A AU 57447/96A AU 5744796 A AU5744796 A AU 5744796A AU 5744796 A AU5744796 A AU 5744796A
- Authority
- AU
- Australia
- Prior art keywords
- sensor
- electrode
- alloy
- platinum
- palladium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000012530 fluid Substances 0.000 title claims description 70
- 239000004065 semiconductor Substances 0.000 title claims description 28
- 238000001514 detection method Methods 0.000 title description 14
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 138
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 137
- 239000007789 gas Substances 0.000 claims description 121
- 230000035945 sensitivity Effects 0.000 claims description 76
- 239000000203 mixture Substances 0.000 claims description 61
- 229910001252 Pd alloy Inorganic materials 0.000 claims description 58
- 229910001260 Pt alloy Inorganic materials 0.000 claims description 48
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 36
- 239000005977 Ethylene Substances 0.000 claims description 36
- 230000004044 response Effects 0.000 claims description 36
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 32
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 32
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 32
- 229910052697 platinum Inorganic materials 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 30
- 229910052751 metal Inorganic materials 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 28
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 25
- 229910052739 hydrogen Inorganic materials 0.000 claims description 24
- 239000001257 hydrogen Substances 0.000 claims description 24
- 229910000575 Ir alloy Inorganic materials 0.000 claims description 21
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 21
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 21
- 229910001316 Ag alloy Inorganic materials 0.000 claims description 18
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 18
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 16
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 15
- 229910052741 iridium Inorganic materials 0.000 claims description 11
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 239000000956 alloy Substances 0.000 claims description 9
- 229910045601 alloy Inorganic materials 0.000 claims description 9
- HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical class [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 claims description 8
- 229910000599 Cr alloy Inorganic materials 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 5
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 2
- 239000003921 oil Substances 0.000 description 17
- 229910052763 palladium Inorganic materials 0.000 description 16
- 239000010949 copper Substances 0.000 description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 13
- 229910021124 PdAg Inorganic materials 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- 238000004458 analytical method Methods 0.000 description 11
- 239000012212 insulator Substances 0.000 description 11
- 150000002431 hydrogen Chemical class 0.000 description 9
- 239000002480 mineral oil Substances 0.000 description 9
- 235000010446 mineral oil Nutrition 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 229910052709 silver Inorganic materials 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 8
- 230000008859 change Effects 0.000 description 8
- 239000004332 silver Substances 0.000 description 8
- 238000003491 array Methods 0.000 description 7
- 239000011651 chromium Substances 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 229910052581 Si3N4 Inorganic materials 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 238000004377 microelectronic Methods 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N carbon dioxide Natural products O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 229910002847 PtSn Inorganic materials 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 description 4
- 239000001913 cellulose Substances 0.000 description 4
- 229920002678 cellulose Polymers 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000000446 fuel Substances 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 238000001311 chemical methods and process Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- 230000002452 interceptive effect Effects 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 230000007257 malfunction Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000013626 chemical specie Substances 0.000 description 2
- 239000000788 chromium alloy Substances 0.000 description 2
- KCMBGVYJSCKPHC-UHFFFAOYSA-N chromium palladium Chemical compound [Cr].[Pd] KCMBGVYJSCKPHC-UHFFFAOYSA-N 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 231100001261 hazardous Toxicity 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- FHMDYDAXYDRBGZ-UHFFFAOYSA-N platinum tin Chemical compound [Sn].[Pt] FHMDYDAXYDRBGZ-UHFFFAOYSA-N 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 1
- 229920006384 Airco Polymers 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 102100021943 C-C motif chemokine 2 Human genes 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 235000015842 Hesperis Nutrition 0.000 description 1
- 101000897480 Homo sapiens C-C motif chemokine 2 Proteins 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 235000012633 Iberis amara Nutrition 0.000 description 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000009838 combustion analysis Methods 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- -1 ethylene Chemical class 0.000 description 1
- 229940117927 ethylene oxide Drugs 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000004868 gas analysis Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 230000036039 immunity Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- BSIDXUHWUKTRQL-UHFFFAOYSA-N nickel palladium Chemical compound [Ni].[Pd] BSIDXUHWUKTRQL-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000037361 pathway Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000002277 temperature effect Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
- G01N27/129—Diode type sensors, e.g. gas sensitive Schottky diodes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/26—Oils; Viscous liquids; Paints; Inks
- G01N33/28—Oils, i.e. hydrocarbon liquids
- G01N33/2835—Specific substances contained in the oils or fuels
- G01N33/2841—Gas in oils, e.g. hydrogen in insulating oils
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/22—Hydrogen, per se
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Pathology (AREA)
- Immunology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Electrochemistry (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US442373 | 1995-05-16 | ||
| US08/442,373 US5591321A (en) | 1993-11-02 | 1995-05-16 | Detection of fluids with metal-insulator-semiconductor sensors |
| PCT/US1996/006807 WO1996036869A1 (en) | 1995-05-16 | 1996-05-14 | Detection of fluids with metal-insulator-semiconductor sensors |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU5744796A true AU5744796A (en) | 1996-11-29 |
Family
ID=23756564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU57447/96A Abandoned AU5744796A (en) | 1995-05-16 | 1996-05-14 | Detection of fluids with metal-insulator-semiconductor sensors |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5591321A (cg-RX-API-DMAC7.html) |
| EP (1) | EP0826146A4 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2001509879A (cg-RX-API-DMAC7.html) |
| AU (1) | AU5744796A (cg-RX-API-DMAC7.html) |
| CA (1) | CA2220002C (cg-RX-API-DMAC7.html) |
| WO (1) | WO1996036869A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3752749B2 (ja) * | 1995-11-15 | 2006-03-08 | 株式会社デンソー | 空燃比検出素子 |
| EP0795625A1 (en) * | 1996-03-11 | 1997-09-17 | Tokyo Gas Co., Ltd. | Thin film deposition method and gas sensor made by the method |
| EP0856825B1 (en) * | 1997-01-31 | 2004-11-17 | STMicroelectronics S.r.l. | Process for manufacturing integrated semiconductor devices comprising a chemoresistive gas microsensor |
| US5923421A (en) * | 1997-07-24 | 1999-07-13 | Lockheed Martin Energy Research Corporation | Chemical detection using calorimetric spectroscopy |
| GB9802940D0 (en) * | 1998-02-11 | 1998-04-08 | Cbl Ceramics Ltd | Gas sensor |
| US6298710B1 (en) * | 1998-02-20 | 2001-10-09 | Ford Global Technologies, Inc. | Combustible gas diode sensor |
| DE19828846C2 (de) * | 1998-06-27 | 2001-01-18 | Micronas Gmbh | Verfahren zum Beschichten eines Substrats |
| US6289716B1 (en) | 1998-08-19 | 2001-09-18 | Electric Power Research Institute, Inc. | Method for on-line assessment and indication of transformer conditions |
| US6494617B1 (en) | 1999-04-30 | 2002-12-17 | General Electric Company | Status detection apparatus and method for fluid-filled electrical equipment |
| JP2004508535A (ja) * | 2000-03-17 | 2004-03-18 | ウェイン ステイト ユニヴァーシティ | Mis水素センサー |
| DE10031549C2 (de) * | 2000-06-28 | 2002-10-10 | Daimler Chrysler Ag | Gassensor und Verfahren zur Detektion von Wasserstoff |
| JP4486289B2 (ja) * | 2001-03-30 | 2010-06-23 | 株式会社デンソー | フローセンサ及びその製造方法 |
| KR20050013592A (ko) * | 2002-06-20 | 2005-02-04 | 아이젠인터내셔널인코포레이티드 | 전기화학발광 유동 셀 및 유동 셀 성분 |
| US7530257B2 (en) * | 2002-09-27 | 2009-05-12 | Honeywell International Inc. | Phased micro analyzer VIII |
| US6837118B2 (en) * | 2002-12-05 | 2005-01-04 | Honeywell International Inc. | Health monitor |
| US7254986B2 (en) * | 2002-12-13 | 2007-08-14 | General Electric Company | Sensor device for detection of dissolved hydrocarbon gases in oil filled high-voltage electrical equipment |
| US7053425B2 (en) * | 2003-11-12 | 2006-05-30 | General Electric Company | Gas sensor device |
| EP1931473A2 (en) * | 2005-09-23 | 2008-06-18 | Koninklijke Philips Electronics N.V. | A micro-fluidic device based upon active matrix principles |
| DE102005057214A1 (de) * | 2005-11-29 | 2007-06-14 | Justus-Liebig-Universität Giessen | Erfindung betreffend Gassensoren |
| US7691329B2 (en) * | 2006-11-16 | 2010-04-06 | General Electric Company | Methods for detecting contaminants in a liquid |
| US9606078B2 (en) * | 2007-11-11 | 2017-03-28 | University Of North Florida Board Of Trustees | Nanocrystalline indum tin oxide sensors and arrays |
| WO2009116346A1 (ja) * | 2008-03-19 | 2009-09-24 | 日鉱金属株式会社 | 基材上にバリア兼シード層が形成された電子部材 |
| US20110124113A1 (en) | 2009-11-25 | 2011-05-26 | Abdul-Majeed Azad | Methods and devices for detecting unsaturated compounds |
| DE102010038725A1 (de) * | 2010-07-30 | 2012-02-02 | Robert Bosch Gmbh | Vorrichtung und Verfahren zur Gasdetektion |
| CN103501839A (zh) * | 2010-09-09 | 2014-01-08 | S.E.A.医疗系统公司 | 使用导抗谱的用于静脉药物管理的系统和方法 |
| US9146226B1 (en) | 2011-05-26 | 2015-09-29 | The University Of Toledo | Methods and devices for detecting unsaturated compounds |
| EP2546646B1 (de) * | 2011-07-11 | 2016-11-16 | EMH Energie-Messtechnik GmbH | Analyse von in Transformatoröl gelösten Gasen |
| CN103116089B (zh) * | 2013-01-16 | 2015-02-04 | 湖北省电力公司电力科学研究院 | 消除转换选择器因素的换流变压器状态判断方法 |
| WO2014128615A1 (en) * | 2013-02-22 | 2014-08-28 | Indian Institute Of Science | A cmos chip compatible gas sensor |
| US9188563B2 (en) * | 2013-09-26 | 2015-11-17 | Purdue Research Foundation | Perforated MOS structure for single biomolecule detection |
| JP2018037563A (ja) * | 2016-09-01 | 2018-03-08 | 愛知電機株式会社 | 油入変圧器の内部異常診断方法 |
| JP6925146B2 (ja) * | 2016-09-21 | 2021-08-25 | 大阪瓦斯株式会社 | ガスセンサおよびガス検知装置 |
| US11541737B2 (en) * | 2016-12-28 | 2023-01-03 | Nuvoton Technology Corporation Japan | Gas detection device, gas detection system, fuel cell vehicle, and gas detection method |
| WO2018123674A1 (ja) * | 2016-12-28 | 2018-07-05 | パナソニックIpマネジメント株式会社 | 気体検出装置、気体センサシステム、燃料電池自動車、及び水素検出方法 |
| US11474064B2 (en) | 2018-03-03 | 2022-10-18 | James SAWADA | Sensor and method for detecting combustible gas |
| WO2019226464A1 (en) | 2018-05-22 | 2019-11-28 | Strella Biotechnology Company | Ethylene receptor biosensor |
| WO2020179226A1 (ja) * | 2019-03-07 | 2020-09-10 | パナソニックセミコンダクターソリューションズ株式会社 | 気体センサとその製造方法、および燃料電池自動車 |
| CN109946363A (zh) * | 2019-04-02 | 2019-06-28 | 吉林大学 | 一种基于分等级多孔SnO2/Zn2SnO4敏感电极的C2H2传感器及其制备方法 |
| CN115290953B (zh) * | 2022-06-24 | 2024-05-17 | 杭州格蓝丰科技有限公司 | 一种基于动态二极管的自驱动机械信号传感器及其制备方法 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3438738A (en) * | 1965-06-01 | 1969-04-15 | Johnson Williams Inc | Transformer incipient fault detection |
| US3680359A (en) * | 1968-05-02 | 1972-08-01 | Mc Graw Edison Co | Transformer having incipient fault detector |
| JPS5145770B1 (cg-RX-API-DMAC7.html) * | 1970-08-27 | 1976-12-06 | ||
| US3719564A (en) * | 1971-05-10 | 1973-03-06 | Philip Morris Inc | Method of determining a reducible gas concentration and sensor therefor |
| US3832600A (en) * | 1973-05-17 | 1974-08-27 | Westinghouse Electric Corp | Transformer internal fault detector |
| US4020830A (en) * | 1975-03-12 | 1977-05-03 | The University Of Utah | Selective chemical sensitive FET transducers |
| US4112737A (en) * | 1977-04-27 | 1978-09-12 | Morgan Schaffer Corporation | Transformer fault detection |
| JPS5466194A (en) * | 1977-11-04 | 1979-05-28 | Kuraray Co | Fet sensor |
| US4180771A (en) * | 1977-12-02 | 1979-12-25 | Airco, Inc. | Chemical-sensitive field-effect transistor |
| US4368480A (en) * | 1978-04-05 | 1983-01-11 | Massachusetts Institute Of Technology | Multiplexing of chemically responsive FETs |
| JPS5626250A (en) * | 1979-08-10 | 1981-03-13 | Olympus Optical Co Ltd | Composite chemical sensor |
| NL8001420A (nl) * | 1980-03-10 | 1981-10-01 | Cordis Europ | Voor een elektrochemische meting toepasbare elektrode omvattend samenstel, in het bijzonder een als een isfet uitgevoerd samenstel, en werkwijze ter vervaardiging van het samenstel. |
| US4456522A (en) * | 1981-09-23 | 1984-06-26 | Critikon, Inc. | Support and anchoring mechanism for membranes in selectively responsive field effect devices |
| US4486292A (en) * | 1981-09-23 | 1984-12-04 | Critikon, Inc. | Support and anchoring mechanism for membranes in selectively responsive field effect devices |
| US4411741A (en) * | 1982-01-12 | 1983-10-25 | University Of Utah | Apparatus and method for measuring the concentration of components in fluids |
| US4514263A (en) * | 1982-01-12 | 1985-04-30 | University Of Utah | Apparatus and method for measuring the concentration of components in fluids |
| DE3332745A1 (de) * | 1983-09-10 | 1985-03-28 | Jens 8520 Erlangen Höper | Anordnung zum messen der konzentration eines stoffes |
| US4947505A (en) * | 1985-04-12 | 1990-08-14 | Ryan Plastics Ireland, Ltd. | Apparatus for cleaning a record disc |
| GB8606045D0 (en) * | 1986-03-12 | 1986-04-16 | Emi Plc Thorn | Gas sensitive device |
| US4671852A (en) * | 1986-05-07 | 1987-06-09 | The Standard Oil Company | Method of forming suspended gate, chemically sensitive field-effect transistor |
| US4730479A (en) * | 1986-06-23 | 1988-03-15 | The Standard Oil Company | Temperature and humidity compensation for gas detection apparatus |
| US5055908A (en) * | 1987-07-27 | 1991-10-08 | Texas Instruments Incorporated | Semiconductor circuit having metallization with TiW |
| US4787958A (en) * | 1987-08-28 | 1988-11-29 | Motorola Inc. | Method of chemically etching TiW and/or TiWN |
| US4836012A (en) * | 1988-05-26 | 1989-06-06 | Ametek, Inc. | Gas sensor |
| US4947104A (en) * | 1989-01-19 | 1990-08-07 | Stephen C. Pyke | Device and method for detection of fluid concentration utilizing charge storage in a MIS diode |
| US4953387A (en) * | 1989-07-31 | 1990-09-04 | The Regents Of The University Of Michigan | Ultrathin-film gas detector |
| US5279795A (en) * | 1993-01-04 | 1994-01-18 | The United States Of America As Represented By The United States Department Of Energy | Extended range chemical sensing apparatus |
| US5417821A (en) * | 1993-11-02 | 1995-05-23 | Electric Power Research Institute | Detection of fluids with metal-insulator-semiconductor sensors |
-
1995
- 1995-05-16 US US08/442,373 patent/US5591321A/en not_active Expired - Lifetime
-
1996
- 1996-05-14 EP EP96915751A patent/EP0826146A4/en not_active Withdrawn
- 1996-05-14 CA CA002220002A patent/CA2220002C/en not_active Expired - Fee Related
- 1996-05-14 AU AU57447/96A patent/AU5744796A/en not_active Abandoned
- 1996-05-14 WO PCT/US1996/006807 patent/WO1996036869A1/en not_active Ceased
- 1996-05-14 JP JP53495996A patent/JP2001509879A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US5591321A (en) | 1997-01-07 |
| EP0826146A1 (en) | 1998-03-04 |
| CA2220002C (en) | 2006-11-07 |
| WO1996036869A1 (en) | 1996-11-21 |
| JP2001509879A (ja) | 2001-07-24 |
| EP0826146A4 (en) | 1999-09-15 |
| CA2220002A1 (en) | 1996-11-21 |
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| MK5 | Application lapsed section 142(2)(e) - patent request and compl. specification not accepted |