AU532313B2 - Insulation in semiconductor device - Google Patents

Insulation in semiconductor device

Info

Publication number
AU532313B2
AU532313B2 AU63012/80A AU6301280A AU532313B2 AU 532313 B2 AU532313 B2 AU 532313B2 AU 63012/80 A AU63012/80 A AU 63012/80A AU 6301280 A AU6301280 A AU 6301280A AU 532313 B2 AU532313 B2 AU 532313B2
Authority
AU
Australia
Prior art keywords
insulation
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU63012/80A
Other languages
English (en)
Other versions
AU6301280A (en
Inventor
Marnix Guillaume Collet
Hermanus Leonardus Peek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=19833974&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=AU532313(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of AU6301280A publication Critical patent/AU6301280A/en
Application granted granted Critical
Publication of AU532313B2 publication Critical patent/AU532313B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00—Charge transfer devices
    • H10D44/01—Manufacture or treatment
    • H10D44/041—Manufacture or treatment having insulated gates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/981—Utilizing varying dielectric thickness
AU63012/80A 1979-10-08 1980-10-07 Insulation in semiconductor device Ceased AU532313B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL7907434 1979-10-08
NL7907434A NL7907434A (nl) 1979-10-08 1979-10-08 Werkwijze voor het vervaardigen van een halfgeleider- inrichting.

Publications (2)

Publication Number Publication Date
AU6301280A AU6301280A (en) 1981-04-16
AU532313B2 true AU532313B2 (en) 1983-09-22

Family

ID=19833974

Family Applications (1)

Application Number Title Priority Date Filing Date
AU63012/80A Ceased AU532313B2 (en) 1979-10-08 1980-10-07 Insulation in semiconductor device

Country Status (7)

Country Link
US (1) US4332078A (https=)
EP (1) EP0026953B1 (https=)
JP (1) JPS5658246A (https=)
AU (1) AU532313B2 (https=)
CA (1) CA1150855A (https=)
DE (1) DE3067007D1 (https=)
NL (1) NL7907434A (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5687346A (en) * 1979-12-18 1981-07-15 Nec Corp Manufacture of semiconductor device
FR2533371B1 (fr) * 1982-09-21 1985-12-13 Thomson Csf Structure de grille pour circuit integre comportant des elements du type grille-isolant-semi-conducteur et procede de realisation d'un circuit integre utilisant une telle structure
NL8502478A (nl) * 1985-09-11 1987-04-01 Philips Nv Werkwijze ter vervaardiging van een halfgeleiderinrichting.
US4888298A (en) * 1988-12-23 1989-12-19 Eastman Kodak Company Process to eliminate the re-entrant profile in a double polysilicon gate structure
KR930006128B1 (ko) * 1991-01-31 1993-07-07 삼성전자 주식회사 반도체장치의 금속 배선 형성방법
TW218426B (https=) * 1992-05-11 1994-01-01 Samsung Electronics Co Ltd
TW219407B (https=) * 1992-06-24 1994-01-21 American Telephone & Telegraph
US5936286A (en) * 1996-06-20 1999-08-10 United Microelectronics Corp. Differential poly-edge oxidation for stable SRAM cells
JPH10163311A (ja) * 1996-11-27 1998-06-19 Mitsubishi Electric Corp 半導体装置およびその製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7404659A (nl) * 1974-04-05 1975-10-07 Philips Nv Werkwijze voor het vervaardigen van een halfge- leiderinrichting, en inrichting vervaardigd door toepassing van de werkwijze.
US3909925A (en) * 1974-05-06 1975-10-07 Telex Computer Products N-Channel charge coupled device fabrication process
US4077112A (en) * 1974-09-24 1978-03-07 U.S. Philips Corporation Method of manufacturing charge transfer device
JPS5928992B2 (ja) * 1975-02-14 1984-07-17 日本電信電話株式会社 Ｍｏｓトランジスタおよびその製造方法
US3961999A (en) * 1975-06-30 1976-06-08 Ibm Corporation Method for forming recessed dielectric isolation with a minimized "bird's beak" problem
US4027382A (en) * 1975-07-23 1977-06-07 Texas Instruments Incorporated Silicon gate CCD structure
NL7703942A (nl) * 1977-04-12 1978-10-16 Philips Nv Werkwijze ter vervaardiging van een halfgelei- derinrichting en inrichting, vervaardigd door toepassing van de werkwijze.
JPS5841659B2 (ja) * 1977-08-30 1983-09-13 株式会社東芝 絶縁膜の形成方法
US4288256A (en) * 1977-12-23 1981-09-08 International Business Machines Corporation Method of making FET containing stacked gates

Also Published As

Publication number Publication date
AU6301280A (en) 1981-04-16
US4332078A (en) 1982-06-01
EP0026953A1 (en) 1981-04-15
EP0026953B1 (en) 1984-03-14
CA1150855A (en) 1983-07-26
DE3067007D1 (en) 1984-04-19
JPS5658246A (en) 1981-05-21
NL7907434A (nl) 1981-04-10
JPH0214784B2 (https=) 1990-04-10

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