AU3078101A - Micromolds fabricated using mems technology and methods of use therefor - Google Patents

Micromolds fabricated using mems technology and methods of use therefor

Info

Publication number
AU3078101A
AU3078101A AU30781/01A AU3078101A AU3078101A AU 3078101 A AU3078101 A AU 3078101A AU 30781/01 A AU30781/01 A AU 30781/01A AU 3078101 A AU3078101 A AU 3078101A AU 3078101 A AU3078101 A AU 3078101A
Authority
AU
Australia
Prior art keywords
micromolds
fabricated
methods
mems technology
use therefor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU30781/01A
Inventor
John Evans
Noel Harvey
John R. Havens
Dan Smolko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanogen Inc
Original Assignee
Nanogen Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanogen Inc filed Critical Nanogen Inc
Publication of AU3078101A publication Critical patent/AU3078101A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
AU30781/01A 1999-12-15 2000-10-31 Micromolds fabricated using mems technology and methods of use therefor Abandoned AU3078101A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US46438099A 1999-12-15 1999-12-15
US09464380 1999-12-15
PCT/US2000/041781 WO2001044875A2 (en) 1999-12-15 2000-10-31 Micromolds fabricated using mems technology and methods of use therefor

Publications (1)

Publication Number Publication Date
AU3078101A true AU3078101A (en) 2001-06-25

Family

ID=23843714

Family Applications (1)

Application Number Title Priority Date Filing Date
AU30781/01A Abandoned AU3078101A (en) 1999-12-15 2000-10-31 Micromolds fabricated using mems technology and methods of use therefor

Country Status (2)

Country Link
AU (1) AU3078101A (en)
WO (1) WO2001044875A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7091034B2 (en) 2000-12-15 2006-08-15 Burstein Technologies, Inc. Detection system for disk-based laboratory and improved optical bio-disc including same
TWI245970B (en) * 2002-08-30 2005-12-21 Tadashi Hattori Method for producing a pattern formation mold
US7524672B2 (en) 2004-09-22 2009-04-28 Sandia Corporation Microfluidic microarray systems and methods thereof
GB2477468B (en) * 2008-10-28 2013-10-02 Hewlett Packard Development Co Composite stamp for embossing

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60202557A (en) * 1984-03-28 1985-10-14 Hitachi Ltd Manufacture of substrate for optical disk
EP0168530B1 (en) * 1984-07-05 1990-04-04 Docdata N.V. Method and apparatus for reproducing relief structures onto a substrate
US5171392A (en) * 1988-11-08 1992-12-15 Pioneer Electronic Corporation Method of producing an optical information record carrier
JPH0354569A (en) * 1989-07-24 1991-03-08 Dainippon Printing Co Ltd Formation of resist pattern
JPH0580530A (en) * 1991-09-24 1993-04-02 Hitachi Ltd Production of thin film pattern
EP0623440B1 (en) * 1993-03-16 1997-09-10 Koninklijke Philips Electronics N.V. Method of and device for providing a patterned relief of cured photoresist on a flat substrate surface

Also Published As

Publication number Publication date
WO2001044875A2 (en) 2001-06-21
WO2001044875A3 (en) 2002-06-27

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase