AU2618192A - Photosensitive compositions - Google Patents

Photosensitive compositions

Info

Publication number
AU2618192A
AU2618192A AU26181/92A AU2618192A AU2618192A AU 2618192 A AU2618192 A AU 2618192A AU 26181/92 A AU26181/92 A AU 26181/92A AU 2618192 A AU2618192 A AU 2618192A AU 2618192 A AU2618192 A AU 2618192A
Authority
AU
Australia
Prior art keywords
photosensitive compositions
photosensitive
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU26181/92A
Other languages
English (en)
Inventor
Max Hunziker
Adrian Schulthess
Bettina Steinmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of AU2618192A publication Critical patent/AU2618192A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
AU26181/92A 1991-10-03 1992-10-02 Photosensitive compositions Abandoned AU2618192A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH2922/91 1991-10-03
CH292291 1991-10-03

Publications (1)

Publication Number Publication Date
AU2618192A true AU2618192A (en) 1993-04-08

Family

ID=4244638

Family Applications (1)

Application Number Title Priority Date Filing Date
AU26181/92A Abandoned AU2618192A (en) 1991-10-03 1992-10-02 Photosensitive compositions

Country Status (6)

Country Link
EP (1) EP0536086A1 (enrdf_load_stackoverflow)
JP (1) JPH05255461A (enrdf_load_stackoverflow)
KR (2) KR100214816B1 (enrdf_load_stackoverflow)
AU (1) AU2618192A (enrdf_load_stackoverflow)
CA (1) CA2079652A1 (enrdf_load_stackoverflow)
TW (2) TW206284B (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5705116A (en) * 1994-06-27 1998-01-06 Sitzmann; Eugene Valentine Increasing the useful range of cationic photoinitiators in stereolithography
GB9504995D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
JPH10186638A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd ロールコート用放射線感応性組成物
JP2001270905A (ja) * 2000-01-21 2001-10-02 Mitsubishi Rayon Co Ltd 耐熱性メタクリル共重合体、その製造方法および光学素子
JP4839525B2 (ja) * 2000-09-29 2011-12-21 大日本印刷株式会社 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ
KR100503061B1 (ko) * 2002-03-21 2005-07-25 삼성전자주식회사 유기 감광체용 오버코트 형성용 조성물 및 이로부터형성된 오버코트층을 채용한 유기 감광체
US7211368B2 (en) 2003-01-07 2007-05-01 3 Birds, Inc. Stereolithography resins and methods
KR101042044B1 (ko) 2003-12-30 2011-06-16 주식회사 케이씨씨 저독성 폴리에스테르계 분체도료 조성물
KR102474841B1 (ko) * 2016-06-03 2022-12-06 바스프 에스이 적층식 제조용 광경화성 제형의 제조
CN111465493A (zh) * 2017-12-12 2020-07-28 3M创新有限公司 复合膜、电子器件的护盖及其制备方法
KR102037500B1 (ko) * 2018-10-08 2019-10-28 국도화학 주식회사 열경화성 수지 조성물 및 이의 경화물
CN118319830B (zh) * 2024-04-22 2025-01-28 广州博科化妆品有限公司 一种紧致皮肤抗皱精华液及其制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof
JPS573875A (en) * 1980-06-11 1982-01-09 Tamura Kaken Kk Photopolymerizable ink composition
EP0430992A4 (en) * 1988-08-08 1992-10-07 Desoto, Inc. Photocurable compositions and method of investment casting
US5051334A (en) * 1989-04-21 1991-09-24 E. I. Du Pont De Nemours And Company Solid imaging method using photohardenable compositions containing hollow spheres

Also Published As

Publication number Publication date
TW278081B (enrdf_load_stackoverflow) 1996-06-11
TW206284B (enrdf_load_stackoverflow) 1993-05-21
KR930008056A (ko) 1993-05-21
CA2079652A1 (en) 1993-04-04
JPH05255461A (ja) 1993-10-05
KR930008518A (ko) 1993-05-21
KR100214816B1 (ko) 1999-08-02
EP0536086A1 (de) 1993-04-07

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