AU2003289146A1 - Shape measurement method, shape measurement device, tilt measurement method, stage device, exposure device, exposure method, and device manufacturing method - Google Patents
Shape measurement method, shape measurement device, tilt measurement method, stage device, exposure device, exposure method, and device manufacturing methodInfo
- Publication number
- AU2003289146A1 AU2003289146A1 AU2003289146A AU2003289146A AU2003289146A1 AU 2003289146 A1 AU2003289146 A1 AU 2003289146A1 AU 2003289146 A AU2003289146 A AU 2003289146A AU 2003289146 A AU2003289146 A AU 2003289146A AU 2003289146 A1 AU2003289146 A1 AU 2003289146A1
- Authority
- AU
- Australia
- Prior art keywords
- exposure
- shape measurement
- measurement method
- tilt
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002-351650 | 2002-12-03 | ||
JP2002351650 | 2002-12-03 | ||
PCT/JP2003/015491 WO2004051184A1 (ja) | 2002-12-03 | 2003-12-03 | 形状計測方法、形状計測装置、チルト計測方法、ステージ装置、露光装置、露光方法、及びデバイス製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003289146A1 true AU2003289146A1 (en) | 2004-06-23 |
Family
ID=32463162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003289146A Abandoned AU2003289146A1 (en) | 2002-12-03 | 2003-12-03 | Shape measurement method, shape measurement device, tilt measurement method, stage device, exposure device, exposure method, and device manufacturing method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2004051184A1 (ja) |
AU (1) | AU2003289146A1 (ja) |
WO (1) | WO2004051184A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4775709B2 (ja) * | 2006-06-26 | 2011-09-21 | 横河電機株式会社 | Xyステージ |
CN101405840B (zh) * | 2006-08-31 | 2012-01-18 | 株式会社尼康 | 移动体驱动方法和移动体驱动系统、图案形成方法和装置、曝光方法和装置、以及组件制造方法 |
JP5370106B2 (ja) * | 2009-11-30 | 2013-12-18 | 株式会社ニコン | 干渉計システム、ステージ装置及び露光装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0382013A (ja) * | 1989-08-24 | 1991-04-08 | Canon Inc | ステージ位置決め制御方法 |
JPH11186129A (ja) * | 1997-12-19 | 1999-07-09 | Nikon Corp | 走査型露光方法及び装置 |
-
2003
- 2003-12-03 WO PCT/JP2003/015491 patent/WO2004051184A1/ja active Application Filing
- 2003-12-03 AU AU2003289146A patent/AU2003289146A1/en not_active Abandoned
- 2003-12-03 JP JP2004556903A patent/JPWO2004051184A1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPWO2004051184A1 (ja) | 2006-04-06 |
WO2004051184A1 (ja) | 2004-06-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |