AU2003281856A1 - Device and method for coating substrates - Google Patents
Device and method for coating substratesInfo
- Publication number
- AU2003281856A1 AU2003281856A1 AU2003281856A AU2003281856A AU2003281856A1 AU 2003281856 A1 AU2003281856 A1 AU 2003281856A1 AU 2003281856 A AU2003281856 A AU 2003281856A AU 2003281856 A AU2003281856 A AU 2003281856A AU 2003281856 A1 AU2003281856 A1 AU 2003281856A1
- Authority
- AU
- Australia
- Prior art keywords
- coating substrates
- substrates
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10234859.6 | 2002-07-31 | ||
DE2002134859 DE10234859B4 (de) | 2002-07-31 | 2002-07-31 | Einrichtung und Verfahren zum Beschichten von Substraten |
PCT/EP2003/008001 WO2004013374A2 (de) | 2002-07-31 | 2003-07-22 | Einrichtung und verfahren zum beschichten von substraten |
Publications (2)
Publication Number | Publication Date |
---|---|
AU2003281856A1 true AU2003281856A1 (en) | 2004-02-23 |
AU2003281856A8 AU2003281856A8 (en) | 2004-02-23 |
Family
ID=30128547
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003281856A Abandoned AU2003281856A1 (en) | 2002-07-31 | 2003-07-22 | Device and method for coating substrates |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4457007B2 (ja) |
AU (1) | AU2003281856A1 (ja) |
DE (1) | DE10234859B4 (ja) |
WO (1) | WO2004013374A2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007054731A1 (de) * | 2007-11-14 | 2009-05-20 | Carl Zeiss Smt Ag | Optisches Element zur Reflexion von UV-Strahlung, Herstellungsverfahren dafür und Projektionsbelichtungsanlage damit |
DE102013106351A1 (de) * | 2013-06-18 | 2014-12-18 | Innovative Ion Coatings Ltd. | Verfahren zur Vorbehandlung einer zu beschichtenden Oberfläche |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4581118A (en) * | 1983-01-26 | 1986-04-08 | Materials Research Corporation | Shaped field magnetron electrode |
CH668565A5 (de) * | 1986-06-23 | 1989-01-13 | Balzers Hochvakuum | Verfahren und anordnung zum zerstaeuben eines materials mittels hochfrequenz. |
DE3727901A1 (de) * | 1987-08-21 | 1989-03-02 | Leybold Ag | Zerstaeubungskathode nach dem magnetronprinzip |
EP0404973A1 (de) * | 1989-06-27 | 1991-01-02 | Hauzer Holding B.V. | Verfahren und Vorrichtung zur Beschichtung von Substraten |
DE4009151A1 (de) * | 1990-03-22 | 1991-09-26 | Leybold Ag | Vorrichtung zum beschichten von substraten durch katodenzerstaeubung |
DE4345403C2 (de) * | 1993-05-06 | 1997-11-20 | Leybold Ag | Vorrichtung zur Kathodenzerstäubung |
DE4412906C1 (de) * | 1994-04-14 | 1995-07-13 | Fraunhofer Ges Forschung | Verfahren und Einrichtung für die ionengestützte Vakuumbeschichtung |
AU2001223384A1 (en) * | 2000-02-23 | 2001-09-03 | Unaxis Balzers Aktiengesellschaft | Method for controlling plasma density or the distribution thereof |
-
2002
- 2002-07-31 DE DE2002134859 patent/DE10234859B4/de not_active Expired - Fee Related
-
2003
- 2003-07-22 AU AU2003281856A patent/AU2003281856A1/en not_active Abandoned
- 2003-07-22 WO PCT/EP2003/008001 patent/WO2004013374A2/de active Application Filing
- 2003-07-22 JP JP2004525279A patent/JP4457007B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE10234859A1 (de) | 2004-02-12 |
DE10234859B4 (de) | 2007-05-03 |
WO2004013374A3 (de) | 2004-12-09 |
JP2005534807A (ja) | 2005-11-17 |
WO2004013374A2 (de) | 2004-02-12 |
AU2003281856A8 (en) | 2004-02-23 |
JP4457007B2 (ja) | 2010-04-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |