AU2003252349A1 - Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method - Google Patents

Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method

Info

Publication number
AU2003252349A1
AU2003252349A1 AU2003252349A AU2003252349A AU2003252349A1 AU 2003252349 A1 AU2003252349 A1 AU 2003252349A1 AU 2003252349 A AU2003252349 A AU 2003252349A AU 2003252349 A AU2003252349 A AU 2003252349A AU 2003252349 A1 AU2003252349 A1 AU 2003252349A1
Authority
AU
Australia
Prior art keywords
exposure
device manufacturing
exposure apparatus
position control
position measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003252349A
Other languages
English (en)
Inventor
Norihiko Fujimaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003252349A1 publication Critical patent/AU2003252349A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2003252349A 2002-07-31 2003-07-30 Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method Abandoned AU2003252349A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002223252 2002-07-31
JP2002-223252 2002-07-31
PCT/JP2003/009691 WO2004012245A1 (ja) 2002-07-31 2003-07-30 位置計測方法、位置制御方法、露光方法及び露光装置、並びにデバイス製造方法

Publications (1)

Publication Number Publication Date
AU2003252349A1 true AU2003252349A1 (en) 2004-02-16

Family

ID=31184956

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003252349A Abandoned AU2003252349A1 (en) 2002-07-31 2003-07-30 Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method

Country Status (4)

Country Link
JP (1) JPWO2004012245A1 (ja)
KR (1) KR20050025626A (ja)
AU (1) AU2003252349A1 (ja)
WO (1) WO2004012245A1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6934005B2 (en) 2002-09-06 2005-08-23 Asml Holding N.V. Reticle focus measurement method using multiple interferometric beams
EP1396757A3 (en) 2002-09-06 2008-12-17 ASML Holding N.V. Reticle focus measurement system and method using multiple interferometric beams
KR100734648B1 (ko) * 2005-12-28 2007-07-02 동부일렉트로닉스 주식회사 얼라인유닛을 구비한 반도체 노광장치
EP2752714B8 (en) * 2006-01-19 2015-10-28 Nikon Corporation Exposure apparatus and exposure method
TWI590005B (zh) * 2006-08-31 2017-07-01 尼康股份有限公司 Exposure method and exposure apparatus, and device manufacturing method
KR101824374B1 (ko) * 2006-08-31 2018-01-31 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI547769B (zh) * 2007-12-28 2016-09-01 尼康股份有限公司 An exposure apparatus, a moving body driving system, a pattern forming apparatus, and an exposure method, and an element manufacturing method
JP5787483B2 (ja) * 2010-01-16 2015-09-30 キヤノン株式会社 計測装置及び露光装置
JP5984459B2 (ja) * 2012-03-30 2016-09-06 キヤノン株式会社 露光装置、露光装置の制御方法及びデバイス製造方法
JP6564727B2 (ja) * 2016-03-28 2019-08-21 株式会社ブイ・テクノロジー マスク製造装置及びマスク製造装置の制御方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09320924A (ja) * 1996-05-27 1997-12-12 Nikon Corp 投影露光装置
KR20010033118A (ko) * 1997-12-18 2001-04-25 오노 시게오 스테이지 장치 및 노광장치
JPH11248419A (ja) * 1998-03-06 1999-09-17 Nikon Corp 干渉計及びそれを備えた露光装置
JP2001007003A (ja) * 1999-06-23 2001-01-12 Kyocera Corp レ−ザ−干渉測長装置
JP2003202204A (ja) * 2002-01-07 2003-07-18 Nikon Corp 干渉計、露光装置、および露光方法

Also Published As

Publication number Publication date
KR20050025626A (ko) 2005-03-14
WO2004012245A1 (ja) 2004-02-05
JPWO2004012245A1 (ja) 2005-11-24

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase