AU2003236329A1 - Plasma processing system - Google Patents

Plasma processing system

Info

Publication number
AU2003236329A1
AU2003236329A1 AU2003236329A AU2003236329A AU2003236329A1 AU 2003236329 A1 AU2003236329 A1 AU 2003236329A1 AU 2003236329 A AU2003236329 A AU 2003236329A AU 2003236329 A AU2003236329 A AU 2003236329A AU 2003236329 A1 AU2003236329 A1 AU 2003236329A1
Authority
AU
Australia
Prior art keywords
processing system
plasma processing
plasma
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003236329A
Inventor
Nobuo Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2003236329A1 publication Critical patent/AU2003236329A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
AU2003236329A 2002-04-09 2003-04-08 Plasma processing system Abandoned AU2003236329A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002106776A JP4204799B2 (en) 2002-04-09 2002-04-09 Plasma processing equipment
JP2002-106776 2002-04-09
PCT/JP2003/004447 WO2003085718A1 (en) 2002-04-09 2003-04-08 Plasma processing system

Publications (1)

Publication Number Publication Date
AU2003236329A1 true AU2003236329A1 (en) 2003-10-20

Family

ID=28786439

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003236329A Abandoned AU2003236329A1 (en) 2002-04-09 2003-04-08 Plasma processing system

Country Status (5)

Country Link
US (1) US20050087304A1 (en)
JP (1) JP4204799B2 (en)
AU (1) AU2003236329A1 (en)
TW (1) TWI228281B (en)
WO (1) WO2003085718A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5312411B2 (en) * 2003-02-14 2013-10-09 東京エレクトロン株式会社 Plasma generator and remote plasma processing apparatus
US6984299B2 (en) * 2004-04-27 2006-01-10 Advanced Technology Material, Inc. Methods for determining organic component concentrations in an electrolytic solution
JP5913817B2 (en) * 2011-02-25 2016-04-27 株式会社日立ハイテクノロジーズ Plasma processing equipment
US20120186747A1 (en) * 2011-01-26 2012-07-26 Obama Shinji Plasma processing apparatus

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10134995A (en) * 1996-10-28 1998-05-22 Toshiba Corp Plasma processing device and processing method for plasma
US6652709B1 (en) * 1999-11-02 2003-11-25 Canon Kabushiki Kaisha Plasma processing apparatus having circular waveguide, and plasma processing method
JP4263338B2 (en) * 2000-05-10 2009-05-13 宏之 新井 Plasma processing equipment
JP2002075969A (en) * 2000-08-25 2002-03-15 Hitachi Ltd Plasma processing system
JP3872650B2 (en) * 2000-09-06 2007-01-24 東京エレクトロン株式会社 Plasma processing apparatus and method
JP3591642B2 (en) * 2001-02-07 2004-11-24 株式会社日立製作所 Plasma processing equipment
JP3893888B2 (en) * 2001-03-19 2007-03-14 株式会社日立製作所 Plasma processing equipment

Also Published As

Publication number Publication date
JP4204799B2 (en) 2009-01-07
JP2003303775A (en) 2003-10-24
WO2003085718A1 (en) 2003-10-16
TW200402793A (en) 2004-02-16
US20050087304A1 (en) 2005-04-28
TWI228281B (en) 2005-02-21

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase