AU2003234413A1 - Compensation for geometric effects of beam misalignments in plane mirror interferometers - Google Patents

Compensation for geometric effects of beam misalignments in plane mirror interferometers

Info

Publication number
AU2003234413A1
AU2003234413A1 AU2003234413A AU2003234413A AU2003234413A1 AU 2003234413 A1 AU2003234413 A1 AU 2003234413A1 AU 2003234413 A AU2003234413 A AU 2003234413A AU 2003234413 A AU2003234413 A AU 2003234413A AU 2003234413 A1 AU2003234413 A1 AU 2003234413A1
Authority
AU
Australia
Prior art keywords
compensation
plane mirror
geometric effects
mirror interferometers
beam misalignments
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003234413A
Other languages
English (en)
Inventor
Henry A. Hill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zygo Corp
Original Assignee
Zygo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp filed Critical Zygo Corp
Publication of AU2003234413A1 publication Critical patent/AU2003234413A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02018—Multipass interferometers, e.g. double-pass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02019—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different points on same face of object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02061—Reduction or prevention of effects of tilts or misalignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
AU2003234413A 2002-05-13 2003-05-13 Compensation for geometric effects of beam misalignments in plane mirror interferometers Abandoned AU2003234413A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US37800402P 2002-05-13 2002-05-13
US60/378,004 2002-05-13
PCT/US2003/014915 WO2003095940A2 (en) 2002-05-13 2003-05-13 Compensation for geometric effects of beam misalignments in plane mirror interferometers

Publications (1)

Publication Number Publication Date
AU2003234413A1 true AU2003234413A1 (en) 2003-11-11

Family

ID=29420359

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003234413A Abandoned AU2003234413A1 (en) 2002-05-13 2003-05-13 Compensation for geometric effects of beam misalignments in plane mirror interferometers

Country Status (4)

Country Link
US (1) US7330274B2 (https=)
JP (1) JP2005525548A (https=)
AU (1) AU2003234413A1 (https=)
WO (1) WO2003095940A2 (https=)

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CN112013972A (zh) * 2019-05-28 2020-12-01 中国科学院上海光学精密机械研究所 横向剪切干涉波前传感器的剪切量标定装置及方法

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WO2005045529A2 (en) * 2003-11-04 2005-05-19 Zygo Corporation Characterization and compensation of errors in multi-axis interferometry system
WO2006041984A2 (en) * 2004-10-06 2006-04-20 Zygo Corporation Error correction in interferometry systems
US7405833B2 (en) * 2004-11-05 2008-07-29 Zygo Corporation Method for calibration and removal of wavefront errors
US7433049B2 (en) * 2005-03-18 2008-10-07 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
US7359057B2 (en) * 2005-08-26 2008-04-15 Ball Aerospace & Technologies Corp. Method and apparatus for measuring small shifts in optical wavelengths
JP4659019B2 (ja) * 2007-12-21 2011-03-30 大学共同利用機関法人自然科学研究機構 波面センサ
EP2526373B1 (de) * 2010-01-22 2013-12-11 Universität Stuttgart Verfahren und anordnung zur robusten interferometrie
BR112012024843A2 (pt) * 2010-04-01 2020-08-25 Koninklijke Philips Electronics N.V. sistema de rastreamento a laser rastrear um feixe de laser de um dispositivo de corte de pelo, dispositivo de corte de pelo e método de rastreamento de um feixe de laser por meios de um dispositivo de rastreamento a laser para gerar um movimento de rastreamento do feixe de laser
US9213227B2 (en) * 2011-08-18 2015-12-15 Nikon Corporation Custom color or polarization sensitive CCD for separating multiple signals in autofocus projection system
DE102016014802B4 (de) 2016-12-13 2018-09-27 Universität Stuttgart Anordnung und Verfahren zur robusten Zweistrahl-Interferometrie mit einer Dreifach-Reflexions-Anordnung
JP2020512551A (ja) * 2017-03-22 2020-04-23 エーエスエムエル ネザーランズ ビー．ブイ． 位置測定システム、ゼロ調整方法、リソグラフィ装置およびデバイス製造方法
US10998163B2 (en) * 2018-05-11 2021-05-04 University Of Maryland, College Park Cryogenic trapped-ion system
CN110553580B (zh) * 2019-06-04 2022-05-20 南京英特飞光电技术有限公司 一种倾斜入射相移干涉仪和直角棱镜大面测量方法
CN110441311B (zh) * 2019-07-22 2021-10-08 中国科学院上海光学精密机械研究所 用于多物面成像的多轴多焦镜头
CN111707616B (zh) * 2020-06-30 2023-02-21 西安工业大学 角分辨散射检测装置的多轴运动系统和检测方法
WO2022126198A1 (en) * 2020-12-18 2022-06-23 Rapid Phenotyping Pty Limited Method of processing interferometry signal, and associated interferometer
CN113607047B (zh) * 2021-08-04 2022-04-22 中国科学院长春光学精密机械与物理研究所 外差干涉信号模拟系统

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112013972A (zh) * 2019-05-28 2020-12-01 中国科学院上海光学精密机械研究所 横向剪切干涉波前传感器的剪切量标定装置及方法
CN112013972B (zh) * 2019-05-28 2024-03-01 中国科学院上海光学精密机械研究所 横向剪切干涉波前传感器的剪切量标定装置及方法

Also Published As

Publication number Publication date
JP2005525548A (ja) 2005-08-25
US20030223077A1 (en) 2003-12-04
WO2003095940A2 (en) 2003-11-20
WO2003095940A3 (en) 2004-02-12
US7330274B2 (en) 2008-02-12

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase
TH Corrigenda

Free format text: IN VOL 18, NO 2, PAGE(S) 614 UNDER THE HEADING APPLICATIONS OPI - NAME INDEX UNDER THE NAME ZYGO CORPORATION, APPLICATION NO. 2003234413, UNDER INID(43) CORRECT THE PUBLICATION DATE TO READ 24.11.2003