AU2002364824A1 - Device for etching, rinsing and drying substrates in ultra-clean atmosphere - Google Patents

Device for etching, rinsing and drying substrates in ultra-clean atmosphere

Info

Publication number
AU2002364824A1
AU2002364824A1 AU2002364824A AU2002364824A AU2002364824A1 AU 2002364824 A1 AU2002364824 A1 AU 2002364824A1 AU 2002364824 A AU2002364824 A AU 2002364824A AU 2002364824 A AU2002364824 A AU 2002364824A AU 2002364824 A1 AU2002364824 A1 AU 2002364824A1
Authority
AU
Australia
Prior art keywords
rinsing
ultra
etching
clean atmosphere
drying substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002364824A
Inventor
Olivier Raccurt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vaco Microtechnologies
Original Assignee
Vaco Microtechnologies
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vaco Microtechnologies filed Critical Vaco Microtechnologies
Publication of AU2002364824A1 publication Critical patent/AU2002364824A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
AU2002364824A 2001-12-18 2002-12-10 Device for etching, rinsing and drying substrates in ultra-clean atmosphere Abandoned AU2002364824A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0116415A FR2833753B1 (en) 2001-12-18 2001-12-18 DEVICE FOR ENGRAVING, RINSING, AND DRYING SUBSTRATES IN AN ULTRA-CLEAN ATMOSPHERE
FR01/16415 2001-12-18
PCT/FR2002/004245 WO2003054930A2 (en) 2001-12-18 2002-12-10 Device for etching, rinsing and drying substrates in ultra-clean atmosphere

Publications (1)

Publication Number Publication Date
AU2002364824A1 true AU2002364824A1 (en) 2003-07-09

Family

ID=8870660

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002364824A Abandoned AU2002364824A1 (en) 2001-12-18 2002-12-10 Device for etching, rinsing and drying substrates in ultra-clean atmosphere

Country Status (7)

Country Link
US (1) US20050016680A1 (en)
EP (1) EP1456869A2 (en)
JP (1) JP2005513798A (en)
AU (1) AU2002364824A1 (en)
FR (1) FR2833753B1 (en)
TW (1) TW200303578A (en)
WO (1) WO2003054930A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050061775A1 (en) * 2003-09-19 2005-03-24 Kuo-Tang Hsu Novel design to eliminate wafer sticking
FR2877766A1 (en) * 2004-11-09 2006-05-12 Vaco Microtechnologies Sa Etching, rinsing and drying of substrates in the same tank using a protective liquid to limit sticking phenomena during the fabrication of microsystems
JP2009141022A (en) * 2007-12-04 2009-06-25 Tokyo Electron Ltd Substrate processing apparatus

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0331226A (en) * 1989-06-28 1991-02-12 Central Glass Co Ltd Azeotropic mixed solvent composition
JPH0969509A (en) * 1995-09-01 1997-03-11 Matsushita Electron Corp Cleaning/etching/drying system for semiconductor wafer and using method thereof
JPH11176798A (en) * 1997-12-08 1999-07-02 Toshiba Corp Substrate cleaning-drying system and method therefor
JP3174038B2 (en) * 1999-01-18 2001-06-11 東邦化成株式会社 Substrate drying method and apparatus
US6514355B1 (en) * 1999-02-08 2003-02-04 International Business Machines Corporation Method and apparatus for recovery of semiconductor wafers from a chemical tank
US6399517B2 (en) * 1999-03-30 2002-06-04 Tokyo Electron Limited Etching method and etching apparatus
FR2797405B1 (en) * 1999-08-12 2001-10-26 Coillard Sa Ets ULTRA CLEAN LIQUID RINSING BIN
US6415803B1 (en) * 1999-10-06 2002-07-09 Z Cap, L.L.C. Method and apparatus for semiconductor wafer cleaning with reuse of chemicals
KR100595302B1 (en) * 2000-12-30 2006-07-03 엘지.필립스 엘시디 주식회사 device for etching glass substrate in fabrication of LCD

Also Published As

Publication number Publication date
US20050016680A1 (en) 2005-01-27
TW200303578A (en) 2003-09-01
JP2005513798A (en) 2005-05-12
FR2833753B1 (en) 2004-02-20
FR2833753A1 (en) 2003-06-20
EP1456869A2 (en) 2004-09-15
WO2003054930A2 (en) 2003-07-03
WO2003054930A3 (en) 2004-01-22

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase