AU2002257066A1 - Photoresist compositions comprising solvents for short wavelength imaging - Google Patents
Photoresist compositions comprising solvents for short wavelength imagingInfo
- Publication number
- AU2002257066A1 AU2002257066A1 AU2002257066A AU2002257066A AU2002257066A1 AU 2002257066 A1 AU2002257066 A1 AU 2002257066A1 AU 2002257066 A AU2002257066 A AU 2002257066A AU 2002257066 A AU2002257066 A AU 2002257066A AU 2002257066 A1 AU2002257066 A1 AU 2002257066A1
- Authority
- AU
- Australia
- Prior art keywords
- solvents
- short wavelength
- photoresist compositions
- wavelength imaging
- imaging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US27817001P | 2001-03-22 | 2001-03-22 | |
US60/278,170 | 2001-03-22 | ||
PCT/US2002/008127 WO2002084401A2 (en) | 2001-03-22 | 2002-03-15 | Photoresist compositions comprising solvents for short wavelength imaging |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2002257066A1 true AU2002257066A1 (en) | 2002-10-28 |
Family
ID=23063955
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002257066A Abandoned AU2002257066A1 (en) | 2001-03-22 | 2002-03-15 | Photoresist compositions comprising solvents for short wavelength imaging |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1377879A2 (en) |
JP (1) | JP2005509180A (en) |
KR (1) | KR20040062877A (en) |
CN (1) | CN100378578C (en) |
AU (1) | AU2002257066A1 (en) |
TW (1) | TWI308256B (en) |
WO (1) | WO2002084401A2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003140345A (en) * | 2001-11-02 | 2003-05-14 | Fuji Photo Film Co Ltd | Positive resist composition |
US7335454B2 (en) | 2001-12-13 | 2008-02-26 | Fujifilm Corporation | Positive resist composition |
CN105334697B (en) * | 2015-12-08 | 2019-10-11 | 深圳市华星光电技术有限公司 | The production method of photoetching compositions and colored filter |
CN106444281A (en) * | 2016-09-22 | 2017-02-22 | 京东方科技集团股份有限公司 | Photoresist and etching method |
CN113296360B (en) * | 2021-05-21 | 2024-06-14 | 上海邃铸科技有限公司 | Acid inhibitor for photoresist composition, preparation method and photoresist composition |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5229473A (en) * | 1989-07-07 | 1993-07-20 | Daikin Industries Ltd. | Fluorine-containing copolymer and method of preparing the same |
DE4319178C2 (en) * | 1992-06-10 | 1997-07-17 | Fujitsu Ltd | Resist composition containing a polymer material and an acid generator |
JP3804138B2 (en) * | 1996-02-09 | 2006-08-02 | Jsr株式会社 | Radiation sensitive resin composition for ArF excimer laser irradiation |
IL141803A0 (en) * | 1998-09-23 | 2002-03-10 | Du Pont | Photoresists, polymers and processes for microlithography |
WO2000067072A1 (en) * | 1999-05-04 | 2000-11-09 | E.I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
-
2002
- 2002-03-15 KR KR10-2003-7012363A patent/KR20040062877A/en active Search and Examination
- 2002-03-15 WO PCT/US2002/008127 patent/WO2002084401A2/en active Application Filing
- 2002-03-15 EP EP02726647A patent/EP1377879A2/en not_active Withdrawn
- 2002-03-15 CN CNB028089448A patent/CN100378578C/en not_active Expired - Fee Related
- 2002-03-15 JP JP2002582085A patent/JP2005509180A/en active Pending
- 2002-03-15 AU AU2002257066A patent/AU2002257066A1/en not_active Abandoned
- 2002-03-21 TW TW091105402A patent/TWI308256B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO2002084401A3 (en) | 2003-05-15 |
TWI308256B (en) | 2009-04-01 |
JP2005509180A (en) | 2005-04-07 |
KR20040062877A (en) | 2004-07-09 |
WO2002084401A9 (en) | 2004-02-19 |
WO2002084401A2 (en) | 2002-10-24 |
CN100378578C (en) | 2008-04-02 |
EP1377879A2 (en) | 2004-01-07 |
CN1505773A (en) | 2004-06-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |