AU2002254231A1 - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
AU2002254231A1
AU2002254231A1 AU2002254231A AU2002254231A AU2002254231A1 AU 2002254231 A1 AU2002254231 A1 AU 2002254231A1 AU 2002254231 A AU2002254231 A AU 2002254231A AU 2002254231 A AU2002254231 A AU 2002254231A AU 2002254231 A1 AU2002254231 A1 AU 2002254231A1
Authority
AU
Australia
Prior art keywords
photoresist composition
photoresist
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002254231A
Inventor
Charles R. Szmanda
Gary N. Taylor
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Electronic Materials LLC
Original Assignee
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co LLC filed Critical Shipley Co LLC
Publication of AU2002254231A1 publication Critical patent/AU2002254231A1/en
Abandoned legal-status Critical Current

Links

AU2002254231A 2001-03-22 2002-03-15 Photoresist composition Abandoned AU2002254231A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60/277,860 2001-03-22

Publications (1)

Publication Number Publication Date
AU2002254231A1 true AU2002254231A1 (en) 2002-10-08

Family

ID=

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