AU2002214241A1 - Multi-layer printed circuit board fabrication system and method - Google Patents
Multi-layer printed circuit board fabrication system and methodInfo
- Publication number
- AU2002214241A1 AU2002214241A1 AU2002214241A AU1424102A AU2002214241A1 AU 2002214241 A1 AU2002214241 A1 AU 2002214241A1 AU 2002214241 A AU2002214241 A AU 2002214241A AU 1424102 A AU1424102 A AU 1424102A AU 2002214241 A1 AU2002214241 A1 AU 2002214241A1
- Authority
- AU
- Australia
- Prior art keywords
- circuit board
- printed circuit
- layer printed
- fabrication system
- board fabrication
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4679—Aligning added circuit layers or via connections relative to previous circuit layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0266—Marks, test patterns or identification means
- H05K1/0269—Marks, test patterns or identification means for visual or optical inspection
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09009—Substrate related
- H05K2201/09063—Holes or slots in insulating substrate not used for electrical connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09918—Optically detected marks used for aligning tool relative to the PCB, e.g. for mounting of components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0008—Apparatus or processes for manufacturing printed circuits for aligning or positioning of tools relative to the circuit board
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0035—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Image Processing (AREA)
- Facsimile Scanning Arrangements (AREA)
- Image Input (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/708,160 | 2000-11-08 | ||
US09/708,160 US6819789B1 (en) | 2000-11-08 | 2000-11-08 | Scaling and registration calibration especially in printed circuit board fabrication |
US09/792,498 US6701197B2 (en) | 2000-11-08 | 2001-02-23 | System and method for side to side registration in a printed circuit imager |
US09/792,498 | 2001-02-23 | ||
IL142354 | 2001-04-01 | ||
IL142354A IL142354A (en) | 2000-11-08 | 2001-04-01 | Multi-layer printed circuit board fabrication system and method |
PCT/IL2001/001027 WO2002039793A2 (en) | 2000-11-08 | 2001-11-06 | Multi-layer printed circuit board fabrication system and method |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2002214241A1 true AU2002214241A1 (en) | 2002-05-21 |
Family
ID=27271948
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002214241A Abandoned AU2002214241A1 (en) | 2000-11-08 | 2001-11-06 | Multi-layer printed circuit board fabrication system and method |
Country Status (5)
Country | Link |
---|---|
US (1) | US7283660B2 (en) |
JP (1) | JP2004523101A (en) |
AU (1) | AU2002214241A1 (en) |
TW (1) | TWI246382B (en) |
WO (1) | WO2002039793A2 (en) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4563170B2 (en) * | 2002-05-02 | 2010-10-13 | オーボテック リミテッド | Electric circuit pattern manufacturing method and system |
EP1482373A1 (en) * | 2003-05-30 | 2004-12-01 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2006259715A (en) * | 2005-02-21 | 2006-09-28 | Fuji Photo Film Co Ltd | Image-drawing method, image-drawing apparatus, image-drawing system, and correction method |
TW200704146A (en) * | 2005-02-21 | 2007-01-16 | Fuji Photo Film Co Ltd | Plotting method, plotting device, plotting system and correction method |
US7668364B2 (en) * | 2005-04-26 | 2010-02-23 | Hitachi Via Mechanics, Ltd. | Inspection method and apparatus for partially drilled microvias |
GB0517929D0 (en) * | 2005-09-02 | 2005-10-12 | Xaar Technology Ltd | Method of printing |
ES2706729T3 (en) * | 2005-12-02 | 2019-04-01 | Irobot Corp | Robot system |
KR20090104877A (en) | 2007-01-23 | 2009-10-06 | 후지필름 가부시키가이샤 | Oxime compound, photosensitive composition, color filter, method for production of the color filter, and liquid crystal display element |
US8482732B2 (en) * | 2007-10-01 | 2013-07-09 | Maskless Lithography, Inc. | Alignment system for various materials and material flows |
US7847938B2 (en) * | 2007-10-01 | 2010-12-07 | Maskless Lithography, Inc. | Alignment system for optical lithography |
JP2009109550A (en) * | 2007-10-26 | 2009-05-21 | Adtec Engineeng Co Ltd | Direct writing exposure apparatus |
IL194967A0 (en) * | 2008-10-28 | 2009-08-03 | Orbotech Ltd | Producing electrical circuit patterns using multi-population transformation |
EP2315507A1 (en) * | 2009-10-22 | 2011-04-27 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Apparatus and method for manufacturing devices on a flexible substrate |
TWI417984B (en) * | 2009-12-10 | 2013-12-01 | Orbotech Lt Solar Llc | Auto-sequencing multi-directional inline processing apparatus |
US9035673B2 (en) | 2010-01-25 | 2015-05-19 | Palo Alto Research Center Incorporated | Method of in-process intralayer yield detection, interlayer shunt detection and correction |
JP5481736B2 (en) * | 2010-09-06 | 2014-04-23 | 株式会社ブイ・テクノロジー | Film exposure equipment |
AT12737U1 (en) * | 2010-09-17 | 2012-10-15 | Austria Tech & System Tech | METHOD FOR PRODUCING A CONDUCTOR PLATE COMPOSED OF MULTIPLE PCB SURFACES AND PCB |
JP5424271B2 (en) | 2010-11-08 | 2014-02-26 | 株式会社ブイ・テクノロジー | Exposure equipment |
JP5685756B2 (en) | 2010-11-10 | 2015-03-18 | 株式会社ブイ・テクノロジー | Film exposure method |
US8459276B2 (en) | 2011-05-24 | 2013-06-11 | Orbotech LT Solar, LLC. | Broken wafer recovery system |
KR101206301B1 (en) * | 2011-06-02 | 2012-11-29 | 아페리오(주) | Method of fabricating a hole for chip-embedded printed circuit board |
KR101206289B1 (en) | 2011-06-08 | 2012-11-29 | 아페리오(주) | Method of processing holes for printed circuit board embedded with components |
JP5813555B2 (en) * | 2012-03-30 | 2015-11-17 | 株式会社アドテックエンジニアリング | Exposure drawing apparatus and exposure drawing method |
JP5813556B2 (en) * | 2012-03-30 | 2015-11-17 | 株式会社アドテックエンジニアリング | Exposure drawing apparatus, program, and exposure drawing method |
US9282686B2 (en) * | 2012-07-10 | 2016-03-08 | Flextronics International Usa, Inc. | System and method for high resolution, high throughput processing of conductive patterns of flexible substrates |
TWI485054B (en) * | 2012-09-07 | 2015-05-21 | Da Yeh Paper Co Ltd | Double - sided cutting positioning system and its method |
WO2015147820A1 (en) | 2014-03-27 | 2015-10-01 | Hewlett-Packard Development Company, L.P. | Locating a target through media |
TWI809201B (en) | 2018-10-23 | 2023-07-21 | 以色列商奧寶科技有限公司 | Adaptive routing for correcting die placement errors |
DE102020113134A1 (en) * | 2020-05-14 | 2021-11-18 | Skybrain Vermögensverwaltungs Gmbh | Processing station and method for processing workpieces |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4566038A (en) * | 1981-10-26 | 1986-01-21 | Excellon Industries | Scan line generator |
JPS61213612A (en) * | 1985-03-19 | 1986-09-22 | Hitachi Ltd | Inspecting instrument for pattern of printed board |
US4894790A (en) * | 1986-02-05 | 1990-01-16 | Omron Tateisi Electronics Co. | Input method for reference printed circuit board assembly data to an image processing printed circuit board assembly automatic inspection apparatus |
US5156772A (en) * | 1988-05-11 | 1992-10-20 | Ariel Electronics, Inc. | Circuit writer materials |
JPH0786466B2 (en) * | 1990-07-18 | 1995-09-20 | 大日本スクリーン製造株式会社 | Printed circuit board pattern inspection device |
DE69225659T2 (en) * | 1991-09-24 | 1998-09-24 | Raphael L Levien | Alignment marks |
US5170058A (en) * | 1991-10-30 | 1992-12-08 | International Business Machines Corporation | Apparatus and a method for alignment verification having an opaque work piece between two artwork masters |
US5403684A (en) * | 1993-08-11 | 1995-04-04 | Cray Research, Inc. | PCB tooling apparatus and method for forming patterns in registration on both sides of a substrate |
EP0669792B1 (en) * | 1994-02-28 | 1999-12-22 | Cybernetics Products, Inc. | Drill coordinate optimization for multi-layer printed circuit board |
JP3030749B2 (en) | 1994-03-31 | 2000-04-10 | セイコープレシジョン株式会社 | Drilling method and apparatus for printed circuit board |
DE4416882C2 (en) * | 1994-05-13 | 1999-03-18 | Multiline International Europa | Method of aligning a film and a circuit board |
JPH11513483A (en) * | 1995-09-21 | 1999-11-16 | オムニプラナー,インコーポレーテッド | Method and apparatus for determining position and orientation |
US5768443A (en) * | 1995-12-19 | 1998-06-16 | Cognex Corporation | Method for coordinating multiple fields of view in multi-camera |
JP3799091B2 (en) | 1995-12-20 | 2006-07-19 | イビデン株式会社 | Method for manufacturing printed wiring board |
JPH09323180A (en) * | 1996-06-04 | 1997-12-16 | Asahi Optical Co Ltd | Laser beam plotting device having scaling correcting function |
JPH1041636A (en) | 1996-07-25 | 1998-02-13 | Ibiden Co Ltd | Manufacture of multilayer printed wiring board |
JP3251862B2 (en) | 1996-09-06 | 2002-01-28 | 株式会社住友金属エレクトロデバイス | Manufacturing method of ceramic multilayer substrate |
US7732732B2 (en) * | 1996-11-20 | 2010-06-08 | Ibiden Co., Ltd. | Laser machining apparatus, and apparatus and method for manufacturing a multilayered printed wiring board |
US7462801B1 (en) * | 1996-11-20 | 2008-12-09 | Ibiden Co., Ltd. | Laser machining apparatus, and apparatus and method for manufacturing a multilayered printed wiring board |
US6246789B1 (en) * | 1997-08-29 | 2001-06-12 | Matsushita Electric Industrial Co., Ltd. | Component mounting apparatus and method |
US5963781A (en) * | 1997-09-30 | 1999-10-05 | Intel Corporation | Technique for determining semiconductor substrate thickness |
US6072898A (en) * | 1998-01-16 | 2000-06-06 | Beaty; Elwin M. | Method and apparatus for three dimensional inspection of electronic components |
US6030154A (en) * | 1998-06-19 | 2000-02-29 | International Business Machines Corporation | Minimum error algorithm/program |
JP2982000B1 (en) * | 1998-07-03 | 1999-11-22 | 株式会社新川 | Bonding method and apparatus |
US6205364B1 (en) * | 1999-02-02 | 2001-03-20 | Creo Ltd. | Method and apparatus for registration control during processing of a workpiece particularly during producing images on substrates in preparing printed circuit boards |
US6268920B1 (en) * | 1999-03-11 | 2001-07-31 | Olec Corporation | Registration of sheet materials using statistical targets and method |
US6165658A (en) * | 1999-07-06 | 2000-12-26 | Creo Ltd. | Nonlinear image distortion correction in printed circuit board manufacturing |
JP3758940B2 (en) * | 2000-04-26 | 2006-03-22 | シャープ株式会社 | Image forming apparatus |
-
2001
- 2001-04-02 TW TW090108036A patent/TWI246382B/en not_active IP Right Cessation
- 2001-11-06 AU AU2002214241A patent/AU2002214241A1/en not_active Abandoned
- 2001-11-06 WO PCT/IL2001/001027 patent/WO2002039793A2/en active Application Filing
- 2001-11-06 JP JP2002542182A patent/JP2004523101A/en active Pending
- 2001-11-07 US US10/045,651 patent/US7283660B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO2002039793A3 (en) | 2002-10-24 |
JP2004523101A (en) | 2004-07-29 |
US7283660B2 (en) | 2007-10-16 |
US20030190071A1 (en) | 2003-10-09 |
TWI246382B (en) | 2005-12-21 |
WO2002039793A2 (en) | 2002-05-16 |
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