AU2001290283A1 - Dielectric thin film element, actuator comprising it, ink jet head, and ink jet recorder. - Google Patents

Dielectric thin film element, actuator comprising it, ink jet head, and ink jet recorder.

Info

Publication number
AU2001290283A1
AU2001290283A1 AU2001290283A AU9028301A AU2001290283A1 AU 2001290283 A1 AU2001290283 A1 AU 2001290283A1 AU 2001290283 A AU2001290283 A AU 2001290283A AU 9028301 A AU9028301 A AU 9028301A AU 2001290283 A1 AU2001290283 A1 AU 2001290283A1
Authority
AU
Australia
Prior art keywords
ink jet
actuator
thin film
film element
dielectric thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001290283A
Inventor
Takeshi Kamada
Ryoichi Takayama
Hideo Torii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of AU2001290283A1 publication Critical patent/AU2001290283A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/85—Piezoelectric or electrostrictive active materials
    • H10N30/853—Ceramic compositions
    • H10N30/8548—Lead based oxides
    • H10N30/8554—Lead zirconium titanate based
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/06—Forming electrodes or interconnections, e.g. leads or terminals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H10N30/076—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by vapour phase deposition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01—Embodiments of or processes related to ink-jet heads
    • B41J2202/03—Specific materials used
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/87—Electrodes or interconnections, e.g. leads or terminals
    • H10N30/877—Conductive materials
AU2001290283A 2000-09-27 2001-09-26 Dielectric thin film element, actuator comprising it, ink jet head, and ink jet recorder. Abandoned AU2001290283A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-293803 2000-09-27
JP2000293803 2000-09-27
PCT/JP2001/008402 WO2002027809A1 (en) 2000-09-27 2001-09-26 Dielectric thin film element, actuator comprising it, ink jet head, and ink jet recorder.

Publications (1)

Publication Number Publication Date
AU2001290283A1 true AU2001290283A1 (en) 2002-04-08

Family

ID=18776526

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001290283A Abandoned AU2001290283A1 (en) 2000-09-27 2001-09-26 Dielectric thin film element, actuator comprising it, ink jet head, and ink jet recorder.

Country Status (7)

Country Link
US (1) US20030189241A1 (en)
EP (1) EP1324401A1 (en)
JP (1) JPWO2002027809A1 (en)
KR (1) KR100532736B1 (en)
CN (1) CN1483225A (en)
AU (1) AU2001290283A1 (en)
WO (1) WO2002027809A1 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE20202297U1 (en) * 2001-09-07 2002-08-29 Drei S Werk Praez Swerkzeuge G Flat actuator or sensor with internal preload
JP4513252B2 (en) * 2002-10-25 2010-07-28 パナソニック株式会社 Piezoelectric thin film element and actuator, ink jet head, and ink jet recording apparatus using the same
JP2005136115A (en) * 2003-10-30 2005-05-26 Tdk Corp Electronic device and its manufacturing method
JP5089860B2 (en) * 2004-12-03 2012-12-05 富士フイルム株式会社 Piezoelectric actuator and liquid discharge head
JP2006245247A (en) * 2005-03-02 2006-09-14 Seiko Epson Corp Piezoelectric element and its fabrication process, liquid ejection head and its manufacturing process, and liquid ejector
JP4543985B2 (en) * 2005-03-24 2010-09-15 セイコーエプソン株式会社 Lead zirconate titanate niobate laminate
JP5391395B2 (en) * 2007-10-15 2014-01-15 日立金属株式会社 Substrate with piezoelectric thin film and piezoelectric element
JP2009286120A (en) * 2008-04-30 2009-12-10 Seiko Epson Corp Liquid jet head and piezoelectric element
DE102008055123B3 (en) * 2008-12-23 2010-07-22 Robert Bosch Gmbh Ultrasonic transducer for use in a fluid medium
CN104640638B (en) * 2012-04-10 2018-01-05 艾诺维亚股份有限公司 Separation of charge and controllable droplet electric charge, and the spray injector mechanical device and equipment of the administration of low dosage volume eye are provided
JP6240170B2 (en) 2012-05-15 2017-11-29 アイノビア，インコーポレイティド Ejector device and method, driver and circuit thereof
US9136820B2 (en) 2012-07-31 2015-09-15 Tdk Corporation Piezoelectric device
WO2014088691A1 (en) * 2012-12-03 2014-06-12 Advanced Technology Materials Inc. IN-SITU OXIDIZED NiO AS ELECTRODE SURFACE FOR HIGH k MIM DEVICE
US9016836B2 (en) 2013-05-14 2015-04-28 Stmicroelectronics, Inc. Ink jet printhead with polarity-changing driver for thermal resistors
US9016837B2 (en) 2013-05-14 2015-04-28 Stmicroelectronics, Inc. Ink jet printhead device with compressive stressed dielectric layer
JP6467258B2 (en) * 2015-03-20 2019-02-06 日本碍子株式会社 Bonded body, honeycomb structure, and manufacturing method of bonded body

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2532410B2 (en) * 1986-11-14 1996-09-11 松下電器産業株式会社 Dielectric thin film element
JP3419008B2 (en) * 1992-12-24 2003-06-23 株式会社村田製作所 Method for manufacturing piezoelectric element
JPH06196648A (en) * 1992-12-25 1994-07-15 Fuji Xerox Co Ltd Oriented ferroelectric thin film device
US5866238A (en) * 1994-05-05 1999-02-02 Minolta Co., Ltd. Ferroelectric thin film device and its process
JPH07300397A (en) * 1994-05-10 1995-11-14 Matsushita Electric Ind Co Ltd Ferroelectric thin film element and its production
JPH0867599A (en) * 1994-08-30 1996-03-12 Sanyo Electric Co Ltd Production of ferroelectric thin film
JP3689913B2 (en) * 1994-12-27 2005-08-31 セイコーエプソン株式会社 Manufacturing method of thin film piezoelectric element
JPH08186182A (en) * 1994-12-28 1996-07-16 Matsushita Electric Ind Co Ltd Ferroelectric thin-film element
JPH10154834A (en) * 1996-11-21 1998-06-09 Matsushita Electric Ind Co Ltd Ferroelectric element and manufacture thereof
US5719417A (en) * 1996-11-27 1998-02-17 Advanced Technology Materials, Inc. Ferroelectric integrated circuit structure
US6376090B1 (en) * 1998-09-25 2002-04-23 Sharp Kabushiki Kaisha Method for manufacturing a substrate with an oxide ferroelectric thin film formed thereon and a substrate with an oxide ferroelectric thin film formed thereon
JP2000196157A (en) * 1998-12-28 2000-07-14 Ube Ind Ltd Piezoelectric device, manufacture thereof, ink jet head provided therewith, and ink jet printer

Also Published As

Publication number Publication date
KR100532736B1 (en) 2005-12-01
WO2002027809A1 (en) 2002-04-04
KR20030048413A (en) 2003-06-19
CN1483225A (en) 2004-03-17
US20030189241A1 (en) 2003-10-09
EP1324401A1 (en) 2003-07-02
JPWO2002027809A1 (en) 2004-02-05

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