AU2001268237A1 - Method and apparatus for interfacing a statistical process control system with amanufacturing process control framework - Google Patents

Method and apparatus for interfacing a statistical process control system with amanufacturing process control framework

Info

Publication number
AU2001268237A1
AU2001268237A1 AU2001268237A AU6823701A AU2001268237A1 AU 2001268237 A1 AU2001268237 A1 AU 2001268237A1 AU 2001268237 A AU2001268237 A AU 2001268237A AU 6823701 A AU6823701 A AU 6823701A AU 2001268237 A1 AU2001268237 A1 AU 2001268237A1
Authority
AU
Australia
Prior art keywords
process control
amanufacturing
interfacing
control system
framework
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001268237A
Other languages
English (en)
Inventor
William J. Campbell
Michael L. Miller
Anastasia L. Oshelski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Micro Devices Inc
Original Assignee
Advanced Micro Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Micro Devices Inc filed Critical Advanced Micro Devices Inc
Publication of AU2001268237A1 publication Critical patent/AU2001268237A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G05B23/0243—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults model based detection method, e.g. first-principles knowledge model
    • G05B23/0254—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults model based detection method, e.g. first-principles knowledge model based on a quantitative model, e.g. mathematical relationships between inputs and outputs; functions: observer, Kalman filter, residual calculation, Neural Networks
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
    • G05B19/41875—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by quality surveillance of production
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0259—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterized by the response to fault detection
    • G05B23/0286—Modifications to the monitored process, e.g. stopping operation or adapting control
    • G05B23/0294—Optimizing process, e.g. process efficiency, product quality
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/32—Operator till task planning
    • G05B2219/32017—Adapt real process as function of changing simulation model, changing for better results
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/32—Operator till task planning
    • G05B2219/32191—Real time statistical process monitoring
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/45—Nc applications
    • G05B2219/45031—Manufacturing semiconductor wafers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
AU2001268237A 2000-06-16 2001-06-06 Method and apparatus for interfacing a statistical process control system with amanufacturing process control framework Abandoned AU2001268237A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09596260 2000-06-16
US09/596,260 US6556884B1 (en) 2000-06-16 2000-06-16 Method and apparatus for interfacing a statistical process control system with a manufacturing process control framework
PCT/US2001/018472 WO2001098848A2 (fr) 2000-06-16 2001-06-06 Methode et dispositif permettant d'interfacer un systeme de commande de processus statistique et un cadre de commande de processus de fabrication

Publications (1)

Publication Number Publication Date
AU2001268237A1 true AU2001268237A1 (en) 2002-01-02

Family

ID=24386613

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001268237A Abandoned AU2001268237A1 (en) 2000-06-16 2001-06-06 Method and apparatus for interfacing a statistical process control system with amanufacturing process control framework

Country Status (5)

Country Link
US (1) US6556884B1 (fr)
EP (1) EP1290516A2 (fr)
AU (1) AU2001268237A1 (fr)
TW (1) TWI235897B (fr)
WO (1) WO2001098848A2 (fr)

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US8914300B2 (en) 2001-08-10 2014-12-16 Rockwell Automation Technologies, Inc. System and method for dynamic multi-objective optimization of machine selection, integration and utilization
US20090204237A1 (en) * 2001-08-10 2009-08-13 Rockwell Automation Technologies, Inc. System and method for dynamic multi-objective optimization of machine selection, integration and utilization
US9729639B2 (en) * 2001-08-10 2017-08-08 Rockwell Automation Technologies, Inc. System and method for dynamic multi-objective optimization of machine selection, integration and utilization
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US7853904B2 (en) * 2002-06-07 2010-12-14 Cadence Design Systems, Inc. Method and system for handling process related variations for integrated circuits based upon reflections
US7393755B2 (en) * 2002-06-07 2008-07-01 Cadence Design Systems, Inc. Dummy fill for integrated circuits
US7124386B2 (en) * 2002-06-07 2006-10-17 Praesagus, Inc. Dummy fill for integrated circuits
US7363099B2 (en) * 2002-06-07 2008-04-22 Cadence Design Systems, Inc. Integrated circuit metrology
US7712056B2 (en) * 2002-06-07 2010-05-04 Cadence Design Systems, Inc. Characterization and verification for integrated circuit designs
US7152215B2 (en) * 2002-06-07 2006-12-19 Praesagus, Inc. Dummy fill for integrated circuits
US7774726B2 (en) * 2002-06-07 2010-08-10 Cadence Design Systems, Inc. Dummy fill for integrated circuits
US20030229875A1 (en) * 2002-06-07 2003-12-11 Smith Taber H. Use of models in integrated circuit fabrication
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JP4643560B2 (ja) * 2003-02-18 2011-03-02 東京エレクトロン株式会社 処理システムの自動構成のための方法
US7684887B2 (en) * 2003-04-30 2010-03-23 Infineon Technologies Ag Advanced process control method and advanced process control system for acquiring production data in a chip production installation
CN1902501B (zh) * 2003-07-17 2010-06-09 凸版光掩膜公司 校准计量工具的方法和装置
US7010382B2 (en) * 2004-02-26 2006-03-07 Taiwan Semiconductor Manufacturing Co., Ltd. Method and system for improving process control for semiconductor manufacturing operations
US7268699B2 (en) * 2004-03-06 2007-09-11 Fibera, Inc. Highway-rail grade crossing hazard mitigation
US6980873B2 (en) 2004-04-23 2005-12-27 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for real-time fault detection, classification, and correction in a semiconductor manufacturing environment
US7545531B2 (en) * 2004-05-18 2009-06-09 Xerox Corporation Method and apparatus for implementing statistical process control (SPC) in a printing environment
US7437404B2 (en) * 2004-05-20 2008-10-14 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for improving equipment communication in semiconductor manufacturing equipment
EP1794659A2 (fr) * 2004-09-17 2007-06-13 MKS Instruments, Inc. Controle a variables multiples de procedes semi-conducteurs
US20060079983A1 (en) * 2004-10-13 2006-04-13 Tokyo Electron Limited R2R controller to automate the data collection during a DOE
US7477960B2 (en) * 2005-02-16 2009-01-13 Tokyo Electron Limited Fault detection and classification (FDC) using a run-to-run controller
US7117059B1 (en) * 2005-04-18 2006-10-03 Promos Technologies Inc. Run-to-run control system and operating method of the same
WO2007008538A2 (fr) * 2005-07-07 2007-01-18 Mks Instruments, Inc. Analyse multivariable a autocorrection destinees a des parametres dynamiques de surveillance dans des environnements de traitement
US7930058B2 (en) * 2006-01-30 2011-04-19 Memc Electronic Materials, Inc. Nanotopography control and optimization using feedback from warp data
US8055370B1 (en) * 2006-06-23 2011-11-08 Novellus Systems, Inc. Apparatus and methods for monitoring health of semiconductor process systems
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US20090005888A1 (en) * 2007-06-29 2009-01-01 Patel Nital S Configurable advanced process control
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CN101251754B (zh) * 2008-03-13 2010-06-02 西安交通大学 一种多工序加工过程误差流的处理及控制方法
US8494798B2 (en) * 2008-09-02 2013-07-23 Mks Instruments, Inc. Automated model building and batch model building for a manufacturing process, process monitoring, and fault detection
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KR102238648B1 (ko) * 2014-06-03 2021-04-09 삼성전자주식회사 반도체 공정 관리 시스템, 이를 포함하는 반도체 제조 시스템 및 반도체 제조 방법
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Also Published As

Publication number Publication date
EP1290516A2 (fr) 2003-03-12
TWI235897B (en) 2005-07-11
US6556884B1 (en) 2003-04-29
WO2001098848A3 (fr) 2002-06-20
WO2001098848A2 (fr) 2001-12-27

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