AU2001251528A1 - Magnetron sputtering source with improved target utilization and deposition rate - Google Patents

Magnetron sputtering source with improved target utilization and deposition rate

Info

Publication number
AU2001251528A1
AU2001251528A1 AU2001251528A AU5152801A AU2001251528A1 AU 2001251528 A1 AU2001251528 A1 AU 2001251528A1 AU 2001251528 A AU2001251528 A AU 2001251528A AU 5152801 A AU5152801 A AU 5152801A AU 2001251528 A1 AU2001251528 A1 AU 2001251528A1
Authority
AU
Australia
Prior art keywords
magnetron sputtering
deposition rate
sputtering source
improved target
target utilization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001251528A
Inventor
Jeffrey T. Brown
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kurt J Lesker Co
Original Assignee
Kurt J Lesker Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurt J Lesker Co filed Critical Kurt J Lesker Co
Publication of AU2001251528A1 publication Critical patent/AU2001251528A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
AU2001251528A 2000-04-10 2001-04-10 Magnetron sputtering source with improved target utilization and deposition rate Abandoned AU2001251528A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US19590600P 2000-04-10 2000-04-10
US60195906 2000-04-10
PCT/US2001/011780 WO2001077405A1 (en) 2000-04-10 2001-04-10 Magnetron sputtering source with improved target utilization and deposition rate

Publications (1)

Publication Number Publication Date
AU2001251528A1 true AU2001251528A1 (en) 2001-10-23

Family

ID=22723300

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001251528A Abandoned AU2001251528A1 (en) 2000-04-10 2001-04-10 Magnetron sputtering source with improved target utilization and deposition rate

Country Status (2)

Country Link
AU (1) AU2001251528A1 (en)
WO (1) WO2001077405A1 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4401539A (en) * 1981-01-30 1983-08-30 Hitachi, Ltd. Sputtering cathode structure for sputtering apparatuses, method of controlling magnetic flux generated by said sputtering cathode structure, and method of forming films by use of said sputtering cathode structure
JPS63109165A (en) * 1986-10-27 1988-05-13 Nec Corp Magnetron type sputtering device
JPH076061B2 (en) * 1988-06-24 1995-01-25 日本真空技術株式会社 Magnetron sputtering equipment
US5328585A (en) * 1992-12-11 1994-07-12 Photran Corporation Linear planar-magnetron sputtering apparatus with reciprocating magnet-array
US5800687A (en) * 1996-04-13 1998-09-01 Singulus Technologies Gmbh Device for masking or covering substrates

Also Published As

Publication number Publication date
WO2001077405A1 (en) 2001-10-18

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