AU2001248951A1 - A substrate for and a process in connection with the product of structures - Google Patents

A substrate for and a process in connection with the product of structures

Info

Publication number
AU2001248951A1
AU2001248951A1 AU2001248951A AU4895101A AU2001248951A1 AU 2001248951 A1 AU2001248951 A1 AU 2001248951A1 AU 2001248951 A AU2001248951 A AU 2001248951A AU 4895101 A AU4895101 A AU 4895101A AU 2001248951 A1 AU2001248951 A1 AU 2001248951A1
Authority
AU
Australia
Prior art keywords
structures
substrate
product
connection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001248951A
Inventor
Babak Heidari
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Obducat AB
Original Assignee
Obducat AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat AB filed Critical Obducat AB
Publication of AU2001248951A1 publication Critical patent/AU2001248951A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0331—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers for lift-off processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
AU2001248951A 2000-04-18 2001-04-10 A substrate for and a process in connection with the product of structures Abandoned AU2001248951A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SE0001430 2000-04-18
SE0001430A SE516194C2 (en) 2000-04-18 2000-04-18 Substrate for and process of fabrication of structures
PCT/SE2001/000788 WO2001079933A1 (en) 2000-04-18 2001-04-10 A substrate for and a process in connection with the product of structures

Publications (1)

Publication Number Publication Date
AU2001248951A1 true AU2001248951A1 (en) 2001-10-30

Family

ID=20279359

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001248951A Abandoned AU2001248951A1 (en) 2000-04-18 2001-04-10 A substrate for and a process in connection with the product of structures

Country Status (8)

Country Link
US (1) US7041228B2 (en)
EP (1) EP1275031A1 (en)
JP (1) JP2004513504A (en)
CN (1) CN1215528C (en)
AU (1) AU2001248951A1 (en)
HK (1) HK1052559A1 (en)
SE (1) SE516194C2 (en)
WO (1) WO2001079933A1 (en)

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FR2849221B1 (en) * 2002-12-23 2005-10-07 Commissariat Energie Atomique METHOD FOR PRESSING LITHOGRAPHY OF A SUBSTRATE EMPLOYING A NANO-PRINTING
US7005335B2 (en) * 2003-07-15 2006-02-28 Hewlett-Packard Development, L.P. Array of nanoscopic mosfet transistors and fabrication methods
GB2406543B (en) * 2003-10-04 2006-06-07 Agilent Technologies Inc A method for fabricating masters for imprint lithography and related imprint process
CN100373259C (en) * 2003-12-26 2008-03-05 中国科学院上海微系统与信息技术研究所 Printing and carving process for preparing pattern of minimum size in nano level
EP1730591B1 (en) * 2004-01-12 2011-08-03 Regents of the University of California Nanoscale electric lithography
US7730834B2 (en) * 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
US7141275B2 (en) * 2004-06-16 2006-11-28 Hewlett-Packard Development Company, L.P. Imprinting lithography using the liquid/solid transition of metals and their alloys
US7676088B2 (en) 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
US7762186B2 (en) 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7442029B2 (en) 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) * 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) * 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) * 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US7648641B2 (en) * 2005-06-17 2010-01-19 Hitachi Global Storage Technologies Netherlands B.V. Method and apparatus for creating a topographically patterned substrate
US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
US8318520B2 (en) * 2005-12-30 2012-11-27 Lin Ming-Nung Method of microminiaturizing a nano-structure
US20070134943A2 (en) * 2006-04-02 2007-06-14 Dunnrowicz Clarence J Subtractive - Additive Edge Defined Lithography
US8850980B2 (en) 2006-04-03 2014-10-07 Canon Nanotechnologies, Inc. Tessellated patterns in imprint lithography
US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) * 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) * 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
JP5441148B2 (en) * 2008-09-01 2014-03-12 学校法人東京電機大学 RESIST LAMINATED STRUCTURE AND METHOD FOR FORMING RESIST PATTERN
JP5692992B2 (en) * 2008-12-19 2015-04-01 キヤノン株式会社 Structure manufacturing method and inkjet head manufacturing method
US20100326819A1 (en) * 2009-06-24 2010-12-30 Hitachi Global Storage Technologies Netherlands B.V. Method for making a patterned perpendicular magnetic recording disk
CN102958555A (en) 2010-04-28 2013-03-06 金伯利-克拉克环球有限公司 Injection molded microneedle array and method for forming the microneedle array
JP5443408B2 (en) 2011-02-23 2014-03-19 株式会社東芝 Manufacturing method of semiconductor device
US9242498B2 (en) * 2011-07-26 2016-01-26 Seiko Epson Corporation Printing method, printing device, printed material and molded article
PL3542851T3 (en) 2011-10-27 2022-04-25 Sorrento Therapeutics, Inc. Implantable devices for delivery of bioactive agents
CN103365094B (en) * 2012-04-09 2015-09-02 中芯国际集成电路制造(上海)有限公司 Dual photoresist structure and disposal route thereof
US20140093688A1 (en) * 2012-09-28 2014-04-03 Yindar Chuo Method for fabrication of nano-structures
CN103353708A (en) * 2013-06-14 2013-10-16 大连理工大学 Multilayer negative photoresist mold manufacturing method
KR102480950B1 (en) * 2014-12-24 2022-12-23 올싸거널 인코포레이티드 Photolithographic patterning of electronic devices
CN107924121B (en) * 2015-07-07 2021-06-08 亿明达股份有限公司 Selective surface patterning via nanoimprinting
WO2017134545A1 (en) * 2016-02-01 2017-08-10 King Abdullah University Of Science And Technology Hybrid mask for deep etching
CN108037637A (en) * 2017-11-30 2018-05-15 深圳华远微电科技有限公司 A kind of double-deck glue stripping technology of SAW filter application pan-exposure
CN110571145B (en) * 2019-07-25 2022-03-11 西安电子科技大学 Preparation method of floating Y-shaped grid
CN110455033A (en) * 2019-09-16 2019-11-15 长虹美菱股份有限公司 A kind of decoration type ducting assembly of nano impression multichannel texture
JP7374826B2 (en) * 2020-03-19 2023-11-07 キオクシア株式会社 Template manufacturing method
EP3958291A1 (en) * 2020-08-21 2022-02-23 Ams Ag Method for forming a lift-off mask structure

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US6309580B1 (en) * 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
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Also Published As

Publication number Publication date
SE516194C2 (en) 2001-12-03
EP1275031A1 (en) 2003-01-15
HK1052559A1 (en) 2003-09-19
SE0001430L (en) 2001-10-19
CN1215528C (en) 2005-08-17
WO2001079933A1 (en) 2001-10-25
US20040005444A1 (en) 2004-01-08
CN1437715A (en) 2003-08-20
SE0001430D0 (en) 2000-04-18
JP2004513504A (en) 2004-04-30
US7041228B2 (en) 2006-05-09

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