AU2000275620A1 - Field emission photocathode array for lithography system and lithography system provided with such an array - Google Patents

Field emission photocathode array for lithography system and lithography system provided with such an array

Info

Publication number
AU2000275620A1
AU2000275620A1 AU2000275620A AU7562000A AU2000275620A1 AU 2000275620 A1 AU2000275620 A1 AU 2000275620A1 AU 2000275620 A AU2000275620 A AU 2000275620A AU 7562000 A AU7562000 A AU 7562000A AU 2000275620 A1 AU2000275620 A1 AU 2000275620A1
Authority
AU
Australia
Prior art keywords
array
lithography system
field emission
system provided
emission photocathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2000275620A
Inventor
Bert Jan Kampherbeek
Pieter Kruit
Marco Jan-Jaco Wieland
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mapper Lithopraphy IP BV
Original Assignee
Mapper Lithopraphy IP BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mapper Lithopraphy IP BV filed Critical Mapper Lithopraphy IP BV
Publication of AU2000275620A1 publication Critical patent/AU2000275620A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H01J1/304—Field-emissive cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31779—Lithography by projection from patterned photocathode
AU2000275620A 2000-09-18 2000-09-18 Field emission photocathode array for lithography system and lithography system provided with such an array Abandoned AU2000275620A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/NL2000/000657 WO2002023580A1 (en) 2000-09-18 2000-09-18 Field emission photocathode array for lithography system and lithography system provided with such an array

Publications (1)

Publication Number Publication Date
AU2000275620A1 true AU2000275620A1 (en) 2002-03-26

Family

ID=19760705

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2000275620A Abandoned AU2000275620A1 (en) 2000-09-18 2000-09-18 Field emission photocathode array for lithography system and lithography system provided with such an array

Country Status (2)

Country Link
AU (1) AU2000275620A1 (en)
WO (1) WO2002023580A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1602451A (en) * 2001-11-07 2005-03-30 应用材料有限公司 Maskless photon-electron spot-grid array printer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3894332A (en) * 1972-02-11 1975-07-15 Westinghouse Electric Corp Solid state radiation sensitive field electron emitter and methods of fabrication thereof
US5932966A (en) * 1995-07-10 1999-08-03 Intevac, Inc. Electron sources utilizing patterned negative electron affinity photocathodes
EP0881542A1 (en) * 1997-05-26 1998-12-02 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Lithography system

Also Published As

Publication number Publication date
WO2002023580A1 (en) 2002-03-21

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