AU1994699A - In-line fib process monitoring with wafer preservation - Google Patents

In-line fib process monitoring with wafer preservation

Info

Publication number
AU1994699A
AU1994699A AU19946/99A AU1994699A AU1994699A AU 1994699 A AU1994699 A AU 1994699A AU 19946/99 A AU19946/99 A AU 19946/99A AU 1994699 A AU1994699 A AU 1994699A AU 1994699 A AU1994699 A AU 1994699A
Authority
AU
Australia
Prior art keywords
preservation
wafer
process monitoring
fib process
line fib
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU19946/99A
Inventor
Nicholas Dawes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micrion Corp
Original Assignee
Micrion Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micrion Corp filed Critical Micrion Corp
Publication of AU1994699A publication Critical patent/AU1994699A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2255—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident ion beams, e.g. proton beams
    • G01N23/2258—Measuring secondary ion emission, e.g. secondary ion mass spectrometry [SIMS]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
AU19946/99A 1997-08-27 1998-08-27 In-line fib process monitoring with wafer preservation Abandoned AU1994699A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US5769697P 1997-08-27 1997-08-27
US60057696 1997-08-27
PCT/US1998/017781 WO1999017103A2 (en) 1997-08-27 1998-08-27 In-line fib process monitoring with wafer preservation

Publications (1)

Publication Number Publication Date
AU1994699A true AU1994699A (en) 1999-04-23

Family

ID=22012197

Family Applications (1)

Application Number Title Priority Date Filing Date
AU19946/99A Abandoned AU1994699A (en) 1997-08-27 1998-08-27 In-line fib process monitoring with wafer preservation

Country Status (2)

Country Link
AU (1) AU1994699A (en)
WO (1) WO1999017103A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2782894A1 (en) 1998-09-07 2000-03-10 Nufarm Ltd Preparation of pesticide dip to reduce the incidence of overdosing and underdosing by providing a reservoir containing a replenishment pesticide solution to top-up pesticide dip volume as dip is removed on animals

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4178741B2 (en) 2000-11-02 2008-11-12 株式会社日立製作所 Charged particle beam apparatus and sample preparation apparatus
JP4200665B2 (en) * 2001-05-08 2008-12-24 株式会社日立製作所 Processing equipment
JP4302933B2 (en) 2002-04-22 2009-07-29 株式会社日立ハイテクノロジーズ Ion beam filling method and ion beam apparatus
JP4747952B2 (en) * 2006-05-31 2011-08-17 株式会社日立製作所 Sample processing apparatus and sample processing method
JP4826680B2 (en) * 2010-07-30 2011-11-30 株式会社日立製作所 Beam member
JP5024468B2 (en) * 2011-03-25 2012-09-12 株式会社日立製作所 Sample processing equipment
US9378927B2 (en) * 2014-09-11 2016-06-28 Fei Company AutoSlice and view undercut method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2782894A1 (en) 1998-09-07 2000-03-10 Nufarm Ltd Preparation of pesticide dip to reduce the incidence of overdosing and underdosing by providing a reservoir containing a replenishment pesticide solution to top-up pesticide dip volume as dip is removed on animals

Also Published As

Publication number Publication date
WO1999017103A2 (en) 1999-04-08

Similar Documents

Publication Publication Date Title
AU6271599A (en) Wafer cleaning and vapor drying system and method
AU6106999A (en) Process
AU1340000A (en) Novel adenoviral vector and methods for making and using the same
AU2328499A (en) Wafer cleaning method and system
AU1111100A (en) Method for processing branch operations
AU3890299A (en) Cryo-sedimentation process
AU3922899A (en) Process for drying mango and pineapples
AU8070498A (en) Methods for treating semiconductor wafers
AU3026399A (en) An enzymatic oil-degumming process
AU1728500A (en) Autosecuring solenoid
AU2936897A (en) Subchirp processing method
EP1127060B8 (en) Hydroboronation process
AU6371399A (en) Compounds comprising polyene chain structure and processes for preparing the same
AU1994699A (en) In-line fib process monitoring with wafer preservation
AU7597798A (en) Semiconductor wafer processing apparatus and method with defect eradication
AUPM360694A0 (en) In-line galvanizing process
AU1559195A (en) Methods for improving semiconductor processing
EP0677467A3 (en) Method for transporting/processing individual planar substrates.
AU2502899A (en) Method for the elimination of pathogens from solutions containing proteins
AU4813099A (en) Method for processing food
AU2867299A (en) Fast single-article megasonic cleaning process
AU5862399A (en) Apparatus and process for preserving foods
AU3117300A (en) Heat-treatment process for liquids
AU5649299A (en) Protein solution preparation and method for stabilizing the same
AU5447898A (en) Wye connector with electrode elements for disinfecting

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase