AU7597798A - Semiconductor wafer processing apparatus and method with defect eradication - Google Patents

Semiconductor wafer processing apparatus and method with defect eradication

Info

Publication number
AU7597798A
AU7597798A AU75977/98A AU7597798A AU7597798A AU 7597798 A AU7597798 A AU 7597798A AU 75977/98 A AU75977/98 A AU 75977/98A AU 7597798 A AU7597798 A AU 7597798A AU 7597798 A AU7597798 A AU 7597798A
Authority
AU
Australia
Prior art keywords
eradication
defect
processing apparatus
semiconductor wafer
wafer processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU75977/98A
Inventor
Kenneth Baldwin
Paul P. Castrucci
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU7597798A publication Critical patent/AU7597798A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67184—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the presence of more than one transfer chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
AU75977/98A 1997-05-29 1998-05-26 Semiconductor wafer processing apparatus and method with defect eradication Abandoned AU7597798A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US4790797P 1997-05-29 1997-05-29
US60047907 1997-05-29
PCT/US1998/010658 WO1998054632A2 (en) 1997-05-29 1998-05-26 Semiconductor wafer processing with defect eradication

Publications (1)

Publication Number Publication Date
AU7597798A true AU7597798A (en) 1998-12-30

Family

ID=21951684

Family Applications (1)

Application Number Title Priority Date Filing Date
AU75977/98A Abandoned AU7597798A (en) 1997-05-29 1998-05-26 Semiconductor wafer processing apparatus and method with defect eradication

Country Status (2)

Country Link
AU (1) AU7597798A (en)
WO (1) WO1998054632A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL127720A0 (en) * 1998-12-24 1999-10-28 Oramir Semiconductor Ltd Local particle cleaning
GB2351160A (en) * 1999-05-20 2000-12-20 Nec Corp Lot supply system for a production line
JP3365551B2 (en) 1999-05-20 2003-01-14 日本電気株式会社 Lot supply system and lot supply method
US6407373B1 (en) * 1999-06-15 2002-06-18 Applied Materials, Inc. Apparatus and method for reviewing defects on an object
TW543080B (en) 1999-10-26 2003-07-21 Fab Solutions Inc Semiconductor device
US6420864B1 (en) * 2000-04-13 2002-07-16 Nanophotonics Ag Modular substrate measurement system
EP1273031B1 (en) 2000-04-13 2005-08-10 NanoPhotonics AG Modular substrate measurement system
EP2365512A3 (en) * 2000-06-27 2012-01-04 Ebara Corporation Inspection system by charged particle beam
US6842659B2 (en) 2001-08-24 2005-01-11 Applied Materials Inc. Method and apparatus for providing intra-tool monitoring and control
US7236847B2 (en) * 2002-01-16 2007-06-26 Kla-Tencor Technologies Corp. Systems and methods for closed loop defect reduction
CN103962347B (en) * 2013-01-24 2016-05-11 北京京东方光电科技有限公司 A kind of cleaning systems and method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5531857A (en) * 1988-07-08 1996-07-02 Cauldron Limited Partnership Removal of surface contaminants by irradiation from a high energy source
US5598341A (en) * 1995-03-10 1997-01-28 Advanced Micro Devices, Inc. Real-time in-line defect disposition and yield forecasting system

Also Published As

Publication number Publication date
WO1998054632A2 (en) 1998-12-03
WO1998054632A3 (en) 1999-03-11

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase