AU1369576A - Gas plated ruthenium coating - Google Patents
Gas plated ruthenium coatingInfo
- Publication number
- AU1369576A AU1369576A AU13695/76A AU1369576A AU1369576A AU 1369576 A AU1369576 A AU 1369576A AU 13695/76 A AU13695/76 A AU 13695/76A AU 1369576 A AU1369576 A AU 1369576A AU 1369576 A AU1369576 A AU 1369576A
- Authority
- AU
- Australia
- Prior art keywords
- ruthenium coating
- gas plated
- plated ruthenium
- gas
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 title 1
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 229910052707 ruthenium Inorganic materials 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Contacts (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Electrolytic Production Of Metals (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB21497/75A GB1499549A (en) | 1975-05-20 | 1975-05-20 | Deposition of ruthenium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU1369576A true AU1369576A (en) | 1977-11-10 |
Family
ID=10163942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU13695/76A Expired AU1369576A (en) | 1975-05-20 | 1976-05-06 | Gas plated ruthenium coating |
Country Status (14)
| Country | Link |
|---|---|
| JP (1) | JPS51141738A (cs) |
| AT (1) | ATA366276A (cs) |
| AU (1) | AU1369576A (cs) |
| BE (1) | BE842027A (cs) |
| CA (1) | CA1087040A (cs) |
| CH (1) | CH603809A5 (cs) |
| DE (1) | DE2622181A1 (cs) |
| DK (1) | DK220776A (cs) |
| ES (1) | ES448043A1 (cs) |
| FR (1) | FR2311859A1 (cs) |
| GB (1) | GB1499549A (cs) |
| NL (1) | NL7605002A (cs) |
| SE (1) | SE7605668L (cs) |
| ZA (1) | ZA762641B (cs) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01301865A (ja) * | 1988-05-30 | 1989-12-06 | Nippon Telegr & Teleph Corp <Ntt> | 薄膜成長方法および薄膜成長装置 |
| JP2799763B2 (ja) * | 1990-07-11 | 1998-09-21 | 同和鉱業株式会社 | 有機金属錯体を用いる薄膜の製造法 |
| JP2802676B2 (ja) * | 1990-07-13 | 1998-09-24 | 同和鉱業株式会社 | 1,3―ジケトン系有機金属錯体を用いる薄膜の製造方法 |
| AT410757B (de) * | 1993-12-10 | 2003-07-25 | Tyrolia Freizeitgeraete | Skibremse |
| JP5792438B2 (ja) * | 2010-08-12 | 2015-10-14 | 東京エレクトロン株式会社 | 成膜装置及び成膜方法 |
| US9725794B2 (en) | 2014-12-17 | 2017-08-08 | Kennametal Inc. | Cemented carbide articles and applications thereof |
-
1975
- 1975-05-20 GB GB21497/75A patent/GB1499549A/en not_active Expired
-
1976
- 1976-05-03 ZA ZA762641A patent/ZA762641B/xx unknown
- 1976-05-06 AU AU13695/76A patent/AU1369576A/en not_active Expired
- 1976-05-11 NL NL7605002A patent/NL7605002A/xx unknown
- 1976-05-11 CA CA252,239A patent/CA1087040A/en not_active Expired
- 1976-05-12 CH CH594476A patent/CH603809A5/xx not_active IP Right Cessation
- 1976-05-18 ES ES448043A patent/ES448043A1/es not_active Expired
- 1976-05-18 FR FR7614916A patent/FR2311859A1/fr not_active Withdrawn
- 1976-05-19 AT AT763662A patent/ATA366276A/de not_active IP Right Cessation
- 1976-05-19 DE DE19762622181 patent/DE2622181A1/de active Pending
- 1976-05-19 SE SE7605668A patent/SE7605668L/xx unknown
- 1976-05-19 DK DK220776A patent/DK220776A/da unknown
- 1976-05-20 BE BE167182A patent/BE842027A/xx unknown
- 1976-05-20 JP JP51057340A patent/JPS51141738A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DK220776A (da) | 1976-11-21 |
| NL7605002A (nl) | 1976-11-23 |
| ATA366276A (de) | 1977-12-15 |
| BE842027A (fr) | 1976-11-22 |
| DE2622181A1 (de) | 1976-12-09 |
| FR2311859A1 (fr) | 1976-12-17 |
| GB1499549A (en) | 1978-02-01 |
| CH603809A5 (cs) | 1978-08-31 |
| ZA762641B (en) | 1977-04-27 |
| ES448043A1 (es) | 1977-07-01 |
| CA1087040A (en) | 1980-10-07 |
| JPS51141738A (en) | 1976-12-06 |
| SE7605668L (sv) | 1976-11-21 |
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