BE842027A - Perfectionnements au depot de ruthenium - Google Patents

Perfectionnements au depot de ruthenium

Info

Publication number
BE842027A
BE842027A BE167182A BE167182A BE842027A BE 842027 A BE842027 A BE 842027A BE 167182 A BE167182 A BE 167182A BE 167182 A BE167182 A BE 167182A BE 842027 A BE842027 A BE 842027A
Authority
BE
Belgium
Prior art keywords
ruthenium deposit
ruthenium
deposit
Prior art date
Application number
BE167182A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE842027A publication Critical patent/BE842027A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Contacts (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Physical Vapour Deposition (AREA)
BE167182A 1975-05-20 1976-05-20 Perfectionnements au depot de ruthenium BE842027A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB21497/75A GB1499549A (en) 1975-05-20 1975-05-20 Deposition of ruthenium

Publications (1)

Publication Number Publication Date
BE842027A true BE842027A (fr) 1976-11-22

Family

ID=10163942

Family Applications (1)

Application Number Title Priority Date Filing Date
BE167182A BE842027A (fr) 1975-05-20 1976-05-20 Perfectionnements au depot de ruthenium

Country Status (14)

Country Link
JP (1) JPS51141738A (fr)
AT (1) ATA366276A (fr)
AU (1) AU1369576A (fr)
BE (1) BE842027A (fr)
CA (1) CA1087040A (fr)
CH (1) CH603809A5 (fr)
DE (1) DE2622181A1 (fr)
DK (1) DK220776A (fr)
ES (1) ES448043A1 (fr)
FR (1) FR2311859A1 (fr)
GB (1) GB1499549A (fr)
NL (1) NL7605002A (fr)
SE (1) SE7605668L (fr)
ZA (1) ZA762641B (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01301865A (ja) * 1988-05-30 1989-12-06 Nippon Telegr & Teleph Corp <Ntt> 薄膜成長方法および薄膜成長装置
JP2799763B2 (ja) * 1990-07-11 1998-09-21 同和鉱業株式会社 有機金属錯体を用いる薄膜の製造法
JP2802676B2 (ja) * 1990-07-13 1998-09-24 同和鉱業株式会社 １，３―ジケトン系有機金属錯体を用いる薄膜の製造方法
AT410757B (de) * 1993-12-10 2003-07-25 Tyrolia Freizeitgeraete Skibremse
JP5792438B2 (ja) * 2010-08-12 2015-10-14 東京エレクトロン株式会社 成膜装置及び成膜方法
US9725794B2 (en) 2014-12-17 2017-08-08 Kennametal Inc. Cemented carbide articles and applications thereof

Also Published As

Publication number Publication date
DK220776A (da) 1976-11-21
CA1087040A (fr) 1980-10-07
NL7605002A (nl) 1976-11-23
DE2622181A1 (de) 1976-12-09
SE7605668L (sv) 1976-11-21
AU1369576A (en) 1977-11-10
ATA366276A (de) 1977-12-15
ZA762641B (en) 1977-04-27
FR2311859A1 (fr) 1976-12-17
ES448043A1 (es) 1977-07-01
CH603809A5 (fr) 1978-08-31
JPS51141738A (en) 1976-12-06
GB1499549A (en) 1978-02-01

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