ATE91021T1 - Verfahren und vorrichtung zur inspektion von strichplatten. - Google Patents

Verfahren und vorrichtung zur inspektion von strichplatten.

Info

Publication number
ATE91021T1
ATE91021T1 AT89400326T AT89400326T ATE91021T1 AT E91021 T1 ATE91021 T1 AT E91021T1 AT 89400326 T AT89400326 T AT 89400326T AT 89400326 T AT89400326 T AT 89400326T AT E91021 T1 ATE91021 T1 AT E91021T1
Authority
AT
Austria
Prior art keywords
light beam
laser light
pair
low angle
mirrors
Prior art date
Application number
AT89400326T
Other languages
English (en)
Inventor
Kevin E Moran
Michael L Smith
Ernest R Lippard
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of ATE91021T1 publication Critical patent/ATE91021T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • H10P74/00—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AT89400326T 1988-02-25 1989-02-06 Verfahren und vorrichtung zur inspektion von strichplatten. ATE91021T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/160,194 US4875780A (en) 1988-02-25 1988-02-25 Method and apparatus for inspecting reticles
EP89400326A EP0330536B1 (de) 1988-02-25 1989-02-06 Verfahren und Vorrichtung zur Inspektion von Strichplatten

Publications (1)

Publication Number Publication Date
ATE91021T1 true ATE91021T1 (de) 1993-07-15

Family

ID=22575896

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89400326T ATE91021T1 (de) 1988-02-25 1989-02-06 Verfahren und vorrichtung zur inspektion von strichplatten.

Country Status (6)

Country Link
US (1) US4875780A (de)
EP (1) EP0330536B1 (de)
JP (1) JPH0760262B2 (de)
KR (1) KR930011703B1 (de)
AT (1) ATE91021T1 (de)
DE (1) DE68907233D1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5448364A (en) * 1993-03-22 1995-09-05 Estek Corporation Particle detection system with reflective line-to-spot collector
US6118525A (en) * 1995-03-06 2000-09-12 Ade Optical Systems Corporation Wafer inspection system for distinguishing pits and particles
US5712701A (en) * 1995-03-06 1998-01-27 Ade Optical Systems Corporation Surface inspection system and method of inspecting surface of workpiece
JP2000505906A (ja) * 1996-12-24 2000-05-16 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 光学式検査装置及びこの検査装置が設けられているリソグラフィ装置
US6204917B1 (en) * 1998-09-22 2001-03-20 Kla-Tencor Corporation Backside contamination inspection device
US6544278B1 (en) 1998-11-06 2003-04-08 Scimed Life Systems, Inc. Rolling membrane stent delivery system
US6784982B1 (en) * 1999-11-04 2004-08-31 Regents Of The University Of Minnesota Direct mapping of DNA chips to detector arrays
US6891627B1 (en) 2000-09-20 2005-05-10 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension and overlay of a specimen
US7349090B2 (en) 2000-09-20 2008-03-25 Kla-Tencor Technologies Corp. Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography
US7106425B1 (en) * 2000-09-20 2006-09-12 Kla-Tencor Technologies Corp. Methods and systems for determining a presence of defects and a thin film characteristic of a specimen
AU2001295060A1 (en) 2000-09-20 2002-04-02 Kla-Tencor-Inc. Methods and systems for semiconductor fabrication processes
JP4157037B2 (ja) * 2001-09-21 2008-09-24 オリンパス株式会社 欠陥検査装置
US20040207836A1 (en) * 2002-09-27 2004-10-21 Rajeshwar Chhibber High dynamic range optical inspection system and method
US7113624B2 (en) * 2002-10-15 2006-09-26 Palo Alto Research Center Incorporated Imaging apparatus and method employing a large linear aperture
US7305112B2 (en) * 2002-10-15 2007-12-04 The Scripps Research Institute Method of converting rare cell scanner image coordinates to microscope coordinates using reticle marks on a sample media
US7280261B2 (en) * 2004-12-20 2007-10-09 Palo Alto Research Center Incorporated Method of scanning and light collection for a rare cell detector
US7286224B2 (en) * 2004-12-21 2007-10-23 Palo Alto Research Center Incorporated Time-multiplexed scanning light source for multi-probe, multi-laser fluorescence detection systems
US7184139B2 (en) * 2005-01-13 2007-02-27 Komag, Inc. Test head for optically inspecting workpieces
DE102009041268A1 (de) * 2009-09-11 2011-05-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Partikeldetektor und Verfahren zur Detektion von Partikeln
CN102393178A (zh) * 2011-06-21 2012-03-28 上海工程技术大学 一种薄片型材料双侧表面纹理与颜色的数字化成像和分析装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3125265A (en) * 1964-03-17 Method and apparatus for scanning the surface of a moving web
GB1436124A (en) * 1972-07-29 1976-05-19 Ferranti Ltd Detection of blemishes in surfaces
DE2404972A1 (de) * 1974-02-01 1975-08-07 Ciba Geigy Ag Vorrichtung zur ermittlung von fehlstellen auf der oberflaeche eines bewegten reflektierenden materials
US4184082A (en) * 1975-12-08 1980-01-15 Howell Laboratories, Incorporated Linear flaw detector
JPS5953483B2 (ja) * 1978-01-27 1984-12-25 超エル・エス・アイ技術研究組合 鏡面の変形分布測定装置
US4376583A (en) * 1981-05-12 1983-03-15 Aeronca Electronics, Inc. Surface inspection scanning system
JPS58196021A (ja) * 1982-05-12 1983-11-15 Nec Corp レチクルの欠陥検査方法
US4669875A (en) * 1982-11-04 1987-06-02 Hitachi, Ltd. Foreign particle detecting method and apparatus
JPS60220940A (ja) * 1983-05-20 1985-11-05 Hitachi Ltd 異物自動検査装置
DE3484982D1 (de) * 1983-11-26 1991-10-02 Toshiba Kawasaki Kk Apparat zum nachweis von oberflaechenfehlern.
DE3475566D1 (en) * 1984-05-14 1989-01-12 Ibm Deutschland Method and device for the inspection of surfaces
US4630276A (en) * 1984-10-09 1986-12-16 Aeronca Electronics, Inc. Compact laser scanning system
KR910000794B1 (ko) * 1985-03-28 1991-02-08 가부시끼가이샤 도오시바 기판의 표면검사방법 및 장치
JPS62274248A (ja) * 1986-05-23 1987-11-28 Canon Inc 表面状態測定装置

Also Published As

Publication number Publication date
DE68907233D1 (de) 1993-07-29
KR890013742A (ko) 1989-09-25
EP0330536A2 (de) 1989-08-30
EP0330536B1 (de) 1993-06-23
US4875780A (en) 1989-10-24
JPH02140742A (ja) 1990-05-30
JPH0760262B2 (ja) 1995-06-28
EP0330536A3 (en) 1990-11-28
KR930011703B1 (ko) 1993-12-18

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