ATE554198T1 - Vorrichtung und verfahren zur abscheidung von schichten aus diamantartigem kohlenstoff - Google Patents

Vorrichtung und verfahren zur abscheidung von schichten aus diamantartigem kohlenstoff

Info

Publication number
ATE554198T1
ATE554198T1 AT03720657T AT03720657T ATE554198T1 AT E554198 T1 ATE554198 T1 AT E554198T1 AT 03720657 T AT03720657 T AT 03720657T AT 03720657 T AT03720657 T AT 03720657T AT E554198 T1 ATE554198 T1 AT E554198T1
Authority
AT
Austria
Prior art keywords
carbon
diamond
electrode
power supply
dlc
Prior art date
Application number
AT03720657T
Other languages
English (en)
Inventor
Denis Teer
Original Assignee
Teer Coatings Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teer Coatings Ltd filed Critical Teer Coatings Ltd
Application granted granted Critical
Publication of ATE554198T1 publication Critical patent/ATE554198T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0084—Producing gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/029—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32027—DC powered

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AT03720657T 2002-03-14 2003-03-14 Vorrichtung und verfahren zur abscheidung von schichten aus diamantartigem kohlenstoff ATE554198T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0205959.0A GB0205959D0 (en) 2002-03-14 2002-03-14 Apparatus and method for applying diamond-like carbon coatings
PCT/GB2003/001078 WO2003078679A1 (en) 2002-03-14 2003-03-14 Apparatus and method for applying diamond-like carbon coatings

Publications (1)

Publication Number Publication Date
ATE554198T1 true ATE554198T1 (de) 2012-05-15

Family

ID=9932911

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03720657T ATE554198T1 (de) 2002-03-14 2003-03-14 Vorrichtung und verfahren zur abscheidung von schichten aus diamantartigem kohlenstoff

Country Status (6)

Country Link
US (1) US7323219B2 (de)
EP (1) EP1483426B1 (de)
AT (1) ATE554198T1 (de)
AU (1) AU2003224234A1 (de)
GB (1) GB0205959D0 (de)
WO (1) WO2003078679A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3555844B2 (ja) 1999-04-09 2004-08-18 三宅 正二郎 摺動部材およびその製造方法
US6969198B2 (en) 2002-11-06 2005-11-29 Nissan Motor Co., Ltd. Low-friction sliding mechanism
JP4863152B2 (ja) 2003-07-31 2012-01-25 日産自動車株式会社 歯車
US7771821B2 (en) 2003-08-21 2010-08-10 Nissan Motor Co., Ltd. Low-friction sliding member and low-friction sliding mechanism using same
JP4696823B2 (ja) * 2005-10-06 2011-06-08 トヨタ自動車株式会社 金属複合ダイヤモンドライクカーボン（ｄｌｃ）皮膜、その形成方法、及び摺動部材
TWI363742B (en) * 2005-10-28 2012-05-11 Hon Hai Prec Ind Co Ltd Diamond-like carbon film
JP4735309B2 (ja) * 2006-02-10 2011-07-27 トヨタ自動車株式会社 耐キャビテーションエロージョン用部材及びその製造方法
US20070259184A1 (en) * 2006-05-04 2007-11-08 Commonwealth Scientific And Industrial Research Organisation Method of mounting objects for chemical vapour deposition
GB2452190B (en) * 2006-05-17 2011-12-28 G & H Technologies Llc Wear resistant depositied coating, method of coating deposition and applications therefor
GB2446593B (en) 2007-02-16 2009-07-22 Diamond Hard Surfaces Ltd Methods and apparatus for forming diamond-like coatings
CN201614406U (zh) * 2008-08-27 2010-10-27 梯尔涂层有限公司 沉积材料形成镀层的设备
CN102216487B (zh) * 2008-10-29 2014-07-02 Ntn株式会社 硬质多层膜成型体及其制造方法
US20100261058A1 (en) * 2009-04-13 2010-10-14 Applied Materials, Inc. Composite materials containing metallized carbon nanotubes and nanofibers
JP5577110B2 (ja) * 2010-02-05 2014-08-20 富士フイルム株式会社 光学素子成形用型、並びに光学素子、及び該光学素子の製造方法
GB2476004B (en) * 2011-02-23 2011-12-28 Portal Medical Ltd Medicament Dispenser Device
US10224189B2 (en) * 2011-09-30 2019-03-05 Teer Coatings Limited Apparatus and a method for deposition of material to form a coating
US20150197918A1 (en) * 2014-01-10 2015-07-16 Caterpillar Inc. Thin film coating for linkage pin
US20150197295A1 (en) * 2014-01-10 2015-07-16 Caterpillar Inc. Thin film coating on undercarriage track pins
CN108359938B (zh) * 2018-05-22 2020-04-07 南京飞燕活塞环股份有限公司 一种活塞环表面超厚类金刚石薄膜涂层制备方法
CN112899639B (zh) * 2019-12-04 2022-08-19 江苏菲沃泰纳米科技股份有限公司 类金刚石薄膜制备装置和制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0221531A3 (de) * 1985-11-06 1992-02-19 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Isoliertes gut wärmeleitendes Substrat und sein Herstellungsverfahren
US6083570A (en) * 1987-03-31 2000-07-04 Lemelson; Jerome H. Synthetic diamond coatings with intermediate amorphous metal bonding layers and methods of applying such coatings
US5202156A (en) * 1988-08-16 1993-04-13 Canon Kabushiki Kaisha Method of making an optical element mold with a hard carbon film
US5112458A (en) * 1989-12-27 1992-05-12 Tdk Corporation Process for producing diamond-like films and apparatus therefor
FR2682125A1 (fr) * 1991-10-07 1993-04-09 Nitruvid Procede de traitement pour deposer une couche de carbone en phase vapeur sur la surface d'une piece metallique et piece ainsi obtenue.
US5249554A (en) * 1993-01-08 1993-10-05 Ford Motor Company Powertrain component with adherent film having a graded composition
JP2531438B2 (ja) * 1993-06-17 1996-09-04 日本電気株式会社 磁気ヘッドおよびその製造方法
DE69609244T2 (de) * 1995-03-31 2001-03-08 Ceramoptec Gmbh Verfahren zur Herstellung diamantartiger Beschichtungen
JP3119172B2 (ja) * 1995-09-13 2000-12-18 日新電機株式会社 プラズマｃｖｄ法及び装置
US5780119A (en) * 1996-03-20 1998-07-14 Southwest Research Institute Treatments to reduce friction and wear on metal alloy components
US6726993B2 (en) * 1997-12-02 2004-04-27 Teer Coatings Limited Carbon coatings, method and apparatus for applying them, and articles bearing such coatings
USH1924H (en) * 1998-09-15 2000-12-05 The United States Of America As Represented By The Secretary Of The Air Force Load-adaptive nanocrystalline carbon/amorphous diamond-like carbon composite and preparation method
GB9910842D0 (en) * 1999-05-10 1999-07-07 Univ Nanyang Composite coatings
CN1138020C (zh) * 1999-09-29 2004-02-11 永源科技股份有限公司 阴极电弧蒸镀方式淀积类金刚石碳膜的制备方法
DE10018143C5 (de) * 2000-04-12 2012-09-06 Oerlikon Trading Ag, Trübbach DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems

Also Published As

Publication number Publication date
EP1483426A1 (de) 2004-12-08
US20050126486A1 (en) 2005-06-16
WO2003078679A1 (en) 2003-09-25
EP1483426B1 (de) 2012-04-18
GB0205959D0 (en) 2002-04-24
US7323219B2 (en) 2008-01-29
AU2003224234A1 (en) 2003-09-29

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