ATE548480T1 - Transportsystem und -verfahren - Google Patents

Transportsystem und -verfahren

Info

Publication number
ATE548480T1
ATE548480T1 AT07754376T AT07754376T ATE548480T1 AT E548480 T1 ATE548480 T1 AT E548480T1 AT 07754376 T AT07754376 T AT 07754376T AT 07754376 T AT07754376 T AT 07754376T AT E548480 T1 ATE548480 T1 AT E548480T1
Authority
AT
Austria
Prior art keywords
transport system
deposition source
deposition
method includes
location proximate
Prior art date
Application number
AT07754376T
Other languages
English (en)
Inventor
Ricky Powell
Original Assignee
First Solar Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by First Solar Inc filed Critical First Solar Inc
Application granted granted Critical
Publication of ATE548480T1 publication Critical patent/ATE548480T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B35/00—Transporting of glass products during their manufacture, e.g. hot glass lenses, prisms
    • C03B35/14—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands
    • C03B35/16—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands by roller conveyors
    • C03B35/18—Construction of the conveyor rollers ; Materials, coatings or coverings thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B35/00—Transporting of glass products during their manufacture, e.g. hot glass lenses, prisms
    • C03B35/14—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands
    • C03B35/16—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands by roller conveyors
    • C03B35/18—Construction of the conveyor rollers ; Materials, coatings or coverings thereof
    • C03B35/181—Materials, coatings, loose coverings or sleeves thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B35/00—Transporting of glass products during their manufacture, e.g. hot glass lenses, prisms
    • C03B35/14—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands
    • C03B35/16—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands by roller conveyors
    • C03B35/18—Construction of the conveyor rollers ; Materials, coatings or coverings thereof
    • C03B35/183—Construction of the conveyor rollers ; Materials, coatings or coverings thereof specially adapted for thermal adjustment of the rollers, e.g. insulating, heating, cooling thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45591—Fixed means, e.g. wings, baffles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3202—Mechanical details, e.g. rollers or belts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3314—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Specific Conveyance Elements (AREA)
  • Forklifts And Lifting Vehicles (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Rollers For Roller Conveyors For Transfer (AREA)
AT07754376T 2006-04-06 2007-03-29 Transportsystem und -verfahren ATE548480T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US78958006P 2006-04-06 2006-04-06
US11/692,667 US9017480B2 (en) 2006-04-06 2007-03-28 System and method for transport
PCT/US2007/007850 WO2007127007A2 (en) 2006-04-06 2007-03-29 System and method for transport

Publications (1)

Publication Number Publication Date
ATE548480T1 true ATE548480T1 (de) 2012-03-15

Family

ID=38575633

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07754376T ATE548480T1 (de) 2006-04-06 2007-03-29 Transportsystem und -verfahren

Country Status (6)

Country Link
US (2) US9017480B2 (de)
EP (1) EP2013375B1 (de)
AT (1) ATE548480T1 (de)
MX (1) MX2008012868A (de)
MY (1) MY148149A (de)
WO (1) WO2007127007A2 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090050057A1 (en) * 2007-08-23 2009-02-26 Von Ardenne Anlagentechnik Gmbh Apparatus for continuous coating
WO2009094622A2 (en) * 2008-01-24 2009-07-30 Microcontinuum, Inc. Vacuum coating techniques
KR20100126717A (ko) * 2008-03-04 2010-12-02 솔렉슨트 코포레이션 태양 전지의 제조 방법
US8334455B2 (en) 2008-07-24 2012-12-18 First Solar, Inc. Photovoltaic devices including Mg-doped semiconductor films
US20100059115A1 (en) * 2008-09-05 2010-03-11 First Solar, Inc. Coated Substrates and Semiconductor Devices Including the Substrates
TW201027769A (en) * 2008-10-28 2010-07-16 Solopower Inc Improved drum design for web processing
TW201027779A (en) * 2008-11-19 2010-07-16 First Solar Inc Photovoltaic devices including heterojunctions
WO2010065246A1 (en) * 2008-11-25 2010-06-10 First Solar, Inc. Photovoltaic devices including copper indium gallium selenide
US20100212731A1 (en) * 2009-02-25 2010-08-26 First Solar, Inc. Photovoltaic Devices Including Controlled Copper Uptake
KR20120052296A (ko) * 2009-07-10 2012-05-23 퍼스트 솔라, 인코포레이티드 아연을 포함하는 광전지 소자
US9303316B1 (en) * 2010-01-15 2016-04-05 Apollo Precision Kunming Yuanhong Limited Continuous web apparatus and method using an air to vacuum seal and accumulator
DE102010049017A1 (de) * 2010-10-21 2012-04-26 Leybold Optics Gmbh Vorrichtung zum Beschichten eines Substrats
DE102010052761A1 (de) * 2010-11-30 2012-05-31 Leybold Optics Gmbh Vorrichtung zum Beschichten eines Substrats
KR101114832B1 (ko) * 2011-05-31 2012-03-06 에스엔유 프리시젼 주식회사 진공증착장치
WO2013096436A1 (en) 2011-12-22 2013-06-27 First Solar, Inc. Photovoltaic substrate cleaning system and method
US9692039B2 (en) 2012-07-24 2017-06-27 Quantumscape Corporation Nanostructured materials for electrochemical conversion reactions
DE102013108405B4 (de) * 2012-09-14 2015-11-05 Von Ardenne Gmbh Durchlauf-Substratbehandlungsanlage und Reinigungsverfahren
US10158115B2 (en) 2013-06-06 2018-12-18 Quantumscape Corporation Flash evaporation of solid state battery component
DE102013108403B4 (de) * 2013-08-05 2017-08-24 Von Ardenne Gmbh Durchlauf-Substratbehandlungsanlage
EP3111493B1 (de) 2014-02-25 2020-12-09 QuantumScape Corporation Hybridelektroden mit einlagerungs- sowie umwandlungsmaterialien
US10326135B2 (en) 2014-08-15 2019-06-18 Quantumscape Corporation Doped conversion materials for secondary battery cathodes
US20180127875A1 (en) * 2016-11-04 2018-05-10 National Chung Shan Institute Of Science And Technology Apparatus for performing selenization and sulfurization process on glass substrate
US11283395B2 (en) 2018-03-23 2022-03-22 Nextracker Inc. Multiple actuator system for solar tracker
US11387771B2 (en) 2018-06-07 2022-07-12 Nextracker Llc Helical actuator system for solar tracker
US11050383B2 (en) 2019-05-21 2021-06-29 Nextracker Inc Radial cam helix with 0 degree stow for solar tracker
DE102019008884A1 (de) * 2019-12-19 2021-06-24 Singulus Technologies Ag Behandlungsanlage, Antriebseinheit für eine Behandlungsanlage und Verwendung der Behandlungsanlage
US20220290293A1 (en) * 2021-03-15 2022-09-15 HelioSource Tech, LLC Hardware and processes for in operando deposition shield replacement/surface cleaning
CN114351123B (zh) * 2021-12-15 2024-07-05 北京博纳晶科科技有限公司 一种大腔体、多功能化学气相沉积设备及使用方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB721704A (en) * 1952-06-10 1955-01-12 James Henry Billington Improvements in or relating to conveyors of the roller-way type
US2872254A (en) 1955-03-23 1959-02-03 Cook Electric Co Bearing assembly
US3735728A (en) 1971-12-01 1973-05-29 Andvari Inc Apparatus for continuous vacuum deposition
US4100004A (en) 1976-05-11 1978-07-11 Securicum S.A. Method of making carbon fibers and resin-impregnated carbon fibers
DE3138853C2 (de) 1981-09-30 1984-12-20 Dornier System Gmbh, 7990 Friedrichshafen Zerlegbare Brücke
US4724764B1 (en) 1983-05-11 1994-09-20 Baldwin Technology Corp Dampening system
EP0155643B1 (de) * 1984-03-19 1990-06-27 Mitsubishi Jukogyo Kabushiki Kaisha Vorrichtung zur Bedampfung
US4742750A (en) 1985-12-10 1988-05-10 Storey David C Adjustable fine tuning bridge system and tremolo for stringed musical instruments
US4945707A (en) 1989-04-24 1990-08-07 K. C. Technical Servies, Inc. Machine and method for overwrapping cylindrical articles
US5248349A (en) * 1992-05-12 1993-09-28 Solar Cells, Inc. Process for making photovoltaic devices and resultant product
GB9300400D0 (en) * 1993-01-11 1993-03-03 Glaverbel A device and method for forming a coating by pyrolysis
IT1261918B (it) * 1993-06-11 1996-06-04 Cetev Cent Tecnolog Vuoto Struttura per deposizione reattiva di metalli in impianti da vuoto continui e relativo processo.
JP2629590B2 (ja) * 1993-12-10 1997-07-09 村田機械株式会社 ローラーの駆動装置
JP3149075B2 (ja) 1994-12-07 2001-03-26 キヤノン株式会社 電子写真装置
US5762177A (en) * 1997-01-14 1998-06-09 International Business Machines Corporation Method and apparatus to convey flat products of different widths
US5772715A (en) 1997-01-17 1998-06-30 Solar Cells, Inc. System and method for processing sheet glass
US6132517A (en) * 1997-02-21 2000-10-17 Applied Materials, Inc. Multiple substrate processing apparatus for enhanced throughput
EP1028895B1 (de) 1997-02-25 2005-03-09 Gerro Plast GmbH Labels Aufbringstation für klebstoffe und etikettiermaschine
US6037241A (en) 1998-02-19 2000-03-14 First Solar, Llc Apparatus and method for depositing a semiconductor material
US5945163A (en) 1998-02-19 1999-08-31 First Solar, Llc Apparatus and method for depositing a material on a substrate
US6719848B2 (en) * 2001-08-16 2004-04-13 First Solar, Llc Chemical vapor deposition system
US7780787B2 (en) 2004-08-11 2010-08-24 First Solar, Inc. Apparatus and method for depositing a material on a substrate
DE102005016406A1 (de) * 2005-04-08 2006-10-19 Von Ardenne Anlagentechnik Gmbh Transporteinrichtung, insbesondere zum Transport flächiger Substrate durch eine Beschichtungsanlage
DE102006011517B4 (de) 2005-04-08 2009-07-16 Von Ardenne Anlagentechnik Gmbh Transporteinrichtung, insbesondere zum Transport flächiger Substrate durch eine Beschichtungsanlage

Also Published As

Publication number Publication date
US20150203963A1 (en) 2015-07-23
US20070237894A1 (en) 2007-10-11
WO2007127007A8 (en) 2008-03-27
US9017480B2 (en) 2015-04-28
MY148149A (en) 2013-03-15
WO2007127007A3 (en) 2008-07-17
EP2013375A2 (de) 2009-01-14
EP2013375A4 (de) 2010-05-19
EP2013375B1 (de) 2012-03-07
WO2007127007A2 (en) 2007-11-08
MX2008012868A (es) 2009-01-15
US10570516B2 (en) 2020-02-25

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