ATE534058T1 - Beweglicher phasenschritt-mikrospiegel mit einem mehrschichtigen substrat und verfahren zu seiner herstellung - Google Patents
Beweglicher phasenschritt-mikrospiegel mit einem mehrschichtigen substrat und verfahren zu seiner herstellungInfo
- Publication number
- ATE534058T1 ATE534058T1 AT07856289T AT07856289T ATE534058T1 AT E534058 T1 ATE534058 T1 AT E534058T1 AT 07856289 T AT07856289 T AT 07856289T AT 07856289 T AT07856289 T AT 07856289T AT E534058 T1 ATE534058 T1 AT E534058T1
- Authority
- AT
- Austria
- Prior art keywords
- production
- layer substrate
- micro mirror
- phase step
- movable phase
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1828—Diffraction gratings having means for producing variable diffraction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Micromachines (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102006057567A DE102006057567B4 (de) | 2006-11-28 | 2006-11-28 | Mikrooptisches Element mit einem Substrat, an dem an einer optisch wirksamen Oberfläche mindestens eine Höhenstufe ausgebildet ist, Verfahren zu seiner Herstellung und Verwendungen |
PCT/EP2007/010324 WO2008064879A1 (en) | 2006-11-28 | 2007-11-28 | Movable phase step micro mirror having a multilayer substrate and a method for its manufacture |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE534058T1 true ATE534058T1 (de) | 2011-12-15 |
Family
ID=39102985
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT07856289T ATE534058T1 (de) | 2006-11-28 | 2007-11-28 | Beweglicher phasenschritt-mikrospiegel mit einem mehrschichtigen substrat und verfahren zu seiner herstellung |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP2089773B1 (de) |
AT (1) | ATE534058T1 (de) |
DE (1) | DE102006057567B4 (de) |
WO (1) | WO2008064879A1 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102015225510A1 (de) | 2015-12-16 | 2017-01-12 | Carl Zeiss Smt Gmbh | Spiegelelement, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5789264A (en) | 1996-03-27 | 1998-08-04 | Daewoo Electronics Co., Ltd. | Method for manufacturing a thin film actuated mirror having a flat light reflecting surface |
US6529310B1 (en) * | 1998-09-24 | 2003-03-04 | Reflectivity, Inc. | Deflectable spatial light modulator having superimposed hinge and deflectable element |
US6795605B1 (en) | 2000-08-01 | 2004-09-21 | Cheetah Omni, Llc | Micromechanical optical switch |
KR100645640B1 (ko) * | 2003-11-03 | 2006-11-15 | 삼성전기주식회사 | 회절형 박막 압전 마이크로 미러 및 그 제조 방법 |
JP4464971B2 (ja) * | 2003-12-11 | 2010-05-19 | マイクロニック レーザー システムズ アクチボラゲット | 加工物にパターン形成するための方法及び装置、並びにその製造方法 |
-
2006
- 2006-11-28 DE DE102006057567A patent/DE102006057567B4/de active Active
-
2007
- 2007-11-28 EP EP07856289A patent/EP2089773B1/de active Active
- 2007-11-28 AT AT07856289T patent/ATE534058T1/de active
- 2007-11-28 WO PCT/EP2007/010324 patent/WO2008064879A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
DE102006057567A1 (de) | 2008-05-29 |
WO2008064879A1 (en) | 2008-06-05 |
EP2089773A1 (de) | 2009-08-19 |
EP2089773B1 (de) | 2011-11-16 |
DE102006057567B4 (de) | 2008-09-04 |
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ATE534058T1 (de) | Beweglicher phasenschritt-mikrospiegel mit einem mehrschichtigen substrat und verfahren zu seiner herstellung |