ATE529779T1 - Vorläufer für eine flachdruckplatte - Google Patents
Vorläufer für eine flachdruckplatteInfo
- Publication number
- ATE529779T1 ATE529779T1 AT00123343T AT00123343T ATE529779T1 AT E529779 T1 ATE529779 T1 AT E529779T1 AT 00123343 T AT00123343 T AT 00123343T AT 00123343 T AT00123343 T AT 00123343T AT E529779 T1 ATE529779 T1 AT E529779T1
- Authority
- AT
- Austria
- Prior art keywords
- plate
- precursor
- ethylenically unsaturated
- printing plate
- printing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/0804—Manufacture of polymers containing ionic or ionogenic groups
- C08G18/0819—Manufacture of polymers containing ionic or ionogenic groups containing anionic or anionogenic groups
- C08G18/0823—Manufacture of polymers containing ionic or ionogenic groups containing anionic or anionogenic groups containing carboxylate salt groups or groups forming them
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/65—Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
- C08G18/66—Compounds of groups C08G18/42, C08G18/48, or C08G18/52
- C08G18/6633—Compounds of group C08G18/42
- C08G18/6659—Compounds of group C08G18/42 with compounds of group C08G18/34
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/65—Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
- C08G18/66—Compounds of groups C08G18/42, C08G18/48, or C08G18/52
- C08G18/6666—Compounds of group C08G18/48 or C08G18/52
- C08G18/6692—Compounds of group C08G18/48 or C08G18/52 with compounds of group C08G18/34
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8125—Unsaturated isocyanates or isothiocyanates having two or more isocyanate or isothiocyanate groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30573499A JP3948505B2 (ja) | 1999-10-27 | 1999-10-27 | 平版印刷版用原版 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE529779T1 true ATE529779T1 (de) | 2011-11-15 |
Family
ID=17948713
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT00123343T ATE529779T1 (de) | 1999-10-27 | 2000-10-27 | Vorläufer für eine flachdruckplatte |
Country Status (4)
Country | Link |
---|---|
US (1) | US6475700B1 (de) |
EP (1) | EP1096314B1 (de) |
JP (1) | JP3948505B2 (de) |
AT (1) | ATE529779T1 (de) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001188339A (ja) * | 1999-12-28 | 2001-07-10 | Fuji Photo Film Co Ltd | 湿し水不要平版印刷版原版 |
JP2001290267A (ja) * | 2000-02-01 | 2001-10-19 | Mitsubishi Chemicals Corp | 光重合性組成物、感光性平版印刷版及び印刷版の製版方法 |
US6660446B2 (en) * | 2000-05-30 | 2003-12-09 | Fuji Photo Film Co., Ltd. | Heat-sensitive composition and planographic printing plate |
EP1563991B1 (de) * | 2000-08-21 | 2007-05-23 | FUJIFILM Corporation | Bildaufzeichnungsmaterial |
JP2002251008A (ja) * | 2001-02-23 | 2002-09-06 | Fuji Photo Film Co Ltd | 画像記録材料 |
EP1288720B1 (de) * | 2001-08-29 | 2012-02-01 | FUJIFILM Corporation | Verfahren zur Herstellung einer Druckplatte |
JP2003270775A (ja) * | 2002-03-13 | 2003-09-25 | Fuji Photo Film Co Ltd | 平版印刷版用原版及び平版印刷版の製版方法 |
JP2003302771A (ja) * | 2002-04-08 | 2003-10-24 | Fuji Photo Film Co Ltd | 平版印刷版の製版方法 |
JP2004037713A (ja) * | 2002-07-02 | 2004-02-05 | Konica Minolta Holdings Inc | 感光性組成物および感光性平版印刷版 |
JP4040476B2 (ja) * | 2003-01-14 | 2008-01-30 | 富士フイルム株式会社 | 感光性平版印刷版 |
US7147989B2 (en) * | 2003-02-10 | 2006-12-12 | Konica Minolta Holdings, Inc. | Photosensitive composition, planographic printing plate and processing method of planograhic printing plate |
JP2005028774A (ja) | 2003-07-07 | 2005-02-03 | Fuji Photo Film Co Ltd | 平版印刷版用原版および平版印刷方法 |
JP2005070211A (ja) * | 2003-08-21 | 2005-03-17 | Konica Minolta Medical & Graphic Inc | 平版印刷版原版および平版印刷版の作製方法 |
US6902866B1 (en) * | 2003-11-24 | 2005-06-07 | Gary Ganghui Teng | Thermosensitive lithographic printing plate comprising specific acrylate monomers |
JP4401262B2 (ja) * | 2004-02-02 | 2010-01-20 | 富士フイルム株式会社 | 平版印刷版原版 |
JP2005221715A (ja) * | 2004-02-05 | 2005-08-18 | Konica Minolta Medical & Graphic Inc | 平版印刷版原版および平版印刷版の製版方法 |
JP4413069B2 (ja) * | 2004-04-28 | 2010-02-10 | 富士フイルム株式会社 | 平版印刷原版および平版印刷方法 |
JP4439327B2 (ja) * | 2004-04-30 | 2010-03-24 | 富士フイルム株式会社 | 平版印刷版用原版 |
US7977253B2 (en) * | 2004-08-31 | 2011-07-12 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of semiconductor device |
JP4411168B2 (ja) * | 2004-09-24 | 2010-02-10 | 富士フイルム株式会社 | 感光性平版印刷版 |
JP4469741B2 (ja) * | 2005-03-03 | 2010-05-26 | 富士フイルム株式会社 | 平版印刷版原版 |
JP4457034B2 (ja) * | 2005-03-28 | 2010-04-28 | 富士フイルム株式会社 | 感光性平版印刷版 |
JP2009502574A (ja) | 2005-07-29 | 2009-01-29 | アノコイル コーポレイション | 機上現像用の画像形成可能な印刷版 |
ES2320561T3 (es) | 2005-11-18 | 2009-05-25 | Agfa Graphics N.V. | Metodo para fabricar una plancha de impresion litografica. |
US20080254387A1 (en) * | 2007-04-13 | 2008-10-16 | Jianfei Yu | Negative-working imageable elements and methods of use |
CN101903814B (zh) * | 2007-12-17 | 2013-06-12 | 日立化成株式会社 | 光波导及其制造方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5416591A (en) * | 1977-07-08 | 1979-02-07 | Kansai Paint Co Ltd | Photosensitive resin composition |
US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
JP2712564B2 (ja) * | 1989-06-01 | 1998-02-16 | 大日本インキ化学工業株式会社 | 感光性組成物 |
CA2040097A1 (en) | 1990-04-12 | 1991-10-13 | Wako Yokoyama | Urethane polymers for printing plate compositions |
US5290663A (en) | 1991-03-01 | 1994-03-01 | W. R. Grace & Co.-Conn. | Photocurable polyurethane-acrylate ionomer compositions for aqueous developable printing plates |
US5952154A (en) | 1998-05-29 | 1999-09-14 | Morton International, Inc. | Photoimageable composition having improved flexibility |
-
1999
- 1999-10-27 JP JP30573499A patent/JP3948505B2/ja not_active Expired - Fee Related
-
2000
- 2000-10-25 US US09/695,143 patent/US6475700B1/en not_active Expired - Lifetime
- 2000-10-27 EP EP00123343A patent/EP1096314B1/de not_active Expired - Lifetime
- 2000-10-27 AT AT00123343T patent/ATE529779T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP3948505B2 (ja) | 2007-07-25 |
EP1096314A1 (de) | 2001-05-02 |
EP1096314B1 (de) | 2011-10-19 |
JP2001125265A (ja) | 2001-05-11 |
US6475700B1 (en) | 2002-11-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |