ATE519136T1 - Laser-oberflächenbehandlung - Google Patents

Laser-oberflächenbehandlung

Info

Publication number
ATE519136T1
ATE519136T1 AT06006249T AT06006249T ATE519136T1 AT E519136 T1 ATE519136 T1 AT E519136T1 AT 06006249 T AT06006249 T AT 06006249T AT 06006249 T AT06006249 T AT 06006249T AT E519136 T1 ATE519136 T1 AT E519136T1
Authority
AT
Austria
Prior art keywords
optical material
metal film
surface treatment
laser surface
laser
Prior art date
Application number
AT06006249T
Other languages
English (en)
Inventor
Kenichiro Tanaka
Masayuki Fujita
Original Assignee
Panasonic Elec Works Co Ltd
Inst Laser Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Elec Works Co Ltd, Inst Laser Technology filed Critical Panasonic Elec Works Co Ltd
Application granted granted Critical
Publication of ATE519136T1 publication Critical patent/ATE519136T1/de

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/111Anti-reflection coatings using layers comprising organic materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/118Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/483Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laser Beam Processing (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Lasers (AREA)
AT06006249T 2005-03-28 2006-03-27 Laser-oberflächenbehandlung ATE519136T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005093145A JP4791745B2 (ja) 2005-03-28 2005-03-28 光学媒質の光入出射部処理方法

Publications (1)

Publication Number Publication Date
ATE519136T1 true ATE519136T1 (de) 2011-08-15

Family

ID=36616874

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06006249T ATE519136T1 (de) 2005-03-28 2006-03-27 Laser-oberflächenbehandlung

Country Status (7)

Country Link
US (1) US8026459B2 (de)
EP (1) EP1707994B1 (de)
JP (1) JP4791745B2 (de)
KR (1) KR100774436B1 (de)
CN (1) CN100381838C (de)
AT (1) ATE519136T1 (de)
TW (1) TWI289209B (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8178028B2 (en) * 2006-11-06 2012-05-15 Samsung Electronics Co., Ltd. Laser patterning of nanostructure-films
JP2010513961A (ja) * 2006-12-22 2010-04-30 シュライフリング ウント アパラーテバウ ゲゼルシャフト ミット ベシュレンクテル ハフツング 反射減衰量の大きな光回転結合器
US7893385B2 (en) * 2007-03-01 2011-02-22 James Neil Rodgers Method for enhancing gain and range of an RFID antenna
JP5217218B2 (ja) * 2007-04-09 2013-06-19 住友金属鉱山株式会社 吸収型多層膜ndフィルターチップの製造方法と吸収型多層膜ndフィルターチップ並びに吸収型多層膜ndフィルターチップの接合方法および吸収型多層膜ndフィルター付き絞り羽根とその製造方法
JP2008289818A (ja) * 2007-05-28 2008-12-04 Panasonic Electric Works Co Ltd 光脱毛機器
US8279579B1 (en) * 2007-12-10 2012-10-02 Victor Rivas Alvarez Energy transforming, storing and shielding devices
US20100078418A1 (en) * 2008-09-26 2010-04-01 Electro Scientific Industries, Inc. Method of laser micro-machining stainless steel with high cosmetic quality
CN102741010A (zh) * 2010-02-05 2012-10-17 株式会社藤仓 表面微细构造的形成方法以及具有表面微细构造的基体
JP5513227B2 (ja) * 2010-04-08 2014-06-04 株式会社フジクラ 微細構造の形成方法、レーザー照射装置、及び基板
CN102416527B (zh) * 2011-07-29 2014-12-03 武汉理工大学 纳秒激光刻蚀亚波长周期性条纹的方法
CN102700281A (zh) * 2012-04-26 2012-10-03 湖北联合天诚防伪技术股份有限公司 一种环保型激光精细脱铝的方法
US9925621B2 (en) 2012-11-14 2018-03-27 Perfect Ip, Llp Intraocular lens (IOL) fabrication system and method
US9023257B2 (en) 2012-11-14 2015-05-05 Perfect Ip, Llc Hydrophilicity alteration system and method
CN104942443B (zh) * 2014-03-28 2017-01-25 汉达精密电子(昆山)有限公司 表面处理方法及其产品
US10629434B2 (en) * 2015-04-08 2020-04-21 The Trustees Of Columbia University In The City Of New York Laser irradiation induced surface planarization of polycrystalline silicon films
US10569365B2 (en) * 2015-11-23 2020-02-25 The Boeing Company Method for preparing a fluid flow surface
EP3429524B1 (de) 2016-03-15 2019-11-20 The Procter and Gamble Company Verfahren und vorrichtungen zur trennung und positionierung von diskreten artikeln
WO2018021392A1 (ja) * 2016-07-27 2018-02-01 古河電気工業株式会社 レーザ処理方法、接合方法、銅部材、多層プリント配線基板の製造方法、及び多層プリント配線基板
WO2018090010A1 (en) * 2016-11-14 2018-05-17 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Antirefctive surface structures on optical elements
WO2019082314A1 (ja) * 2017-10-25 2019-05-02 株式会社ニコン 加工装置、加工システム、及び、移動体の製造方法
CN108680976B (zh) * 2018-07-25 2021-11-09 浙江夜光明光电科技股份有限公司 一种双色反光热贴膜的制作方法
DE102018221189A1 (de) 2018-12-07 2020-06-10 Carl Zeiss Smt Gmbh Verfahren zum Bilden von Nanostrukturen an einer Oberfläche und optisches Element
EP3956258A1 (de) * 2019-04-15 2022-02-23 Facebook Technologies, LLC. Substratmodifikation durch femtosekundenlaser zur erzielung einer variablen ätztiefe beim trockenätzen
CN114451073A (zh) * 2019-07-22 2022-05-06 阿沙芬堡应用技术大学 具有改进的可焊性的电连接焊盘
JP6822699B1 (ja) * 2019-09-24 2021-01-27 フェニックス電機株式会社 レーザー照射装置、およびそれを用いた表面荒らし処理方法
CN111185678B (zh) * 2020-02-07 2021-07-27 吉林大学 一种在透明材料表面和内部制备镂空结构的方法
CN112091418A (zh) * 2020-09-10 2020-12-18 南开大学 一种宽禁带半导体表面深亚波长周期性条纹结构的制备方法
CN112799161A (zh) * 2021-02-02 2021-05-14 廊坊市莱格光电仪器有限公司 一种金属柱面光栅及其制造工艺
US20230193455A1 (en) * 2021-12-16 2023-06-22 Applied Materials, Inc. Vacuum chamber, vacuum system and method for vacuum processing

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5072091A (en) * 1989-04-03 1991-12-10 The Local Government Of Osaka Prefecture Method and apparatus for metal surface process by laser beam
DE4225554A1 (de) * 1992-08-03 1994-02-10 Basf Magnetics Gmbh Flächige Polyethylenterephthalat-Materialien mit geringer Oberflächenrauhigkeit sowie ein Verfahren zu ihrer Herstellung und ihre Verwendung
JPH06212451A (ja) * 1993-01-11 1994-08-02 Osaka Prefecture 金属表面の加飾加工方法
JPH0811309B2 (ja) * 1993-01-11 1996-02-07 大阪府 虹色発色加工方法
US5558789A (en) * 1994-03-02 1996-09-24 University Of Florida Method of applying a laser beam creating micro-scale surface structures prior to deposition of film for increased adhesion
EP0959051A4 (en) * 1996-08-13 1999-12-15 Nippon Sheet Glass Co Ltd Laser machining method for glass substrate, diffraction type optical device fabricated by the machining method, and method of manufacturing optical device
JP3270814B2 (ja) * 1996-08-27 2002-04-02 日本板硝子株式会社 回折型光学素子の製造方法
US6785447B2 (en) * 1998-10-09 2004-08-31 Fujitsu Limited Single and multilayer waveguides and fabrication process
DE19853023A1 (de) 1998-11-18 2000-05-31 Forschungszentrum Juelich Gmbh Verfahren zur Herstellung von Nanostrukturen in dünnen Filmen
US6555781B2 (en) * 1999-05-10 2003-04-29 Nanyang Technological University Ultrashort pulsed laser micromachining/submicromachining using an acoustooptic scanning device with dispersion compensation
US6682688B1 (en) 2000-06-16 2004-01-27 Matsushita Electric Works, Ltd. Method of manufacturing a three-dimensional object
JP2002059700A (ja) * 2000-08-22 2002-02-26 Osaka Prefecture 虹色発色加工法
TW506868B (en) 2000-10-05 2002-10-21 Matsushita Electric Works Ltd Method of and apparatus for making a three-dimensional object
JP2002372641A (ja) * 2001-06-13 2002-12-26 Ngk Insulators Ltd 光導波路の製造方法、光導波路および波長変換デバイス
JP4132750B2 (ja) * 2001-08-17 2008-08-13 独立行政法人科学技術振興機構 フェムト秒レーザー照射による量子ドット素子の作成方法
JP4035981B2 (ja) * 2001-10-26 2008-01-23 松下電工株式会社 超短パルスレーザを用いた回路形成方法
JP4006994B2 (ja) * 2001-12-18 2007-11-14 株式会社リコー 立体構造体の加工方法、立体形状品の製造方法及び立体構造体
DE60237139D1 (de) 2002-03-26 2010-09-09 Panasonic Elec Works Co Ltd Verfahren zur Herstellung eines gesinterten Formkörpers durch selektives Laser-Sintern
JP4054330B2 (ja) * 2002-09-27 2008-02-27 キヤノンマシナリー株式会社 周期構造作成方法および表面処理方法
DE10344901B4 (de) 2002-09-30 2006-09-07 Matsushita Electric Works, Ltd., Kadoma Verfahren zum Herstellen eines dreidimensionalen gesinterten Produkts
DE10344902B4 (de) 2002-09-30 2009-02-26 Matsushita Electric Works, Ltd., Kadoma Verfahren zum Herstellen eines dreidimensionalen Objekts
US7258720B2 (en) 2003-02-25 2007-08-21 Matsushita Electric Works, Ltd. Metal powder composition for use in selective laser sintering
JP4322045B2 (ja) * 2003-05-13 2009-08-26 独立行政法人科学技術振興機構 微小バンプ作製方法
JP4542317B2 (ja) * 2003-05-27 2010-09-15 パナソニック電工株式会社 光学媒質の光入出射部処理方法
JP4092256B2 (ja) 2003-06-04 2008-05-28 財団法人レーザー技術総合研究所 金属密着面表面処理方法

Also Published As

Publication number Publication date
US8026459B2 (en) 2011-09-27
EP1707994B1 (de) 2011-08-03
TW200634329A (en) 2006-10-01
CN1841097A (zh) 2006-10-04
KR100774436B1 (ko) 2007-11-08
JP2006276282A (ja) 2006-10-12
JP4791745B2 (ja) 2011-10-12
KR20060104938A (ko) 2006-10-09
EP1707994A1 (de) 2006-10-04
TWI289209B (en) 2007-11-01
US20060213880A1 (en) 2006-09-28
CN100381838C (zh) 2008-04-16

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