TW200739213A - Method for patterning alignment layer - Google Patents

Method for patterning alignment layer

Info

Publication number
TW200739213A
TW200739213A TW096104119A TW96104119A TW200739213A TW 200739213 A TW200739213 A TW 200739213A TW 096104119 A TW096104119 A TW 096104119A TW 96104119 A TW96104119 A TW 96104119A TW 200739213 A TW200739213 A TW 200739213A
Authority
TW
Taiwan
Prior art keywords
alignment layer
film
polyimide film
transparent electrode
layer pattern
Prior art date
Application number
TW096104119A
Other languages
Chinese (zh)
Inventor
Hidehisa Murase
Yoshinari Sasaki
Naoki Yamada
Kosei Aso
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of TW200739213A publication Critical patent/TW200739213A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G02F1/133723—Polyimide, polyamide-imide
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133773—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers the alignment material or treatment being different for the two opposite substrates

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Laser Beam Processing (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

To provide a simple and highly accurate method for forming an alignment layer pattern. A polyimide film 5 is formed so as to cover an entire surface of a panel substrate 30 comprising a metal film 3 and a transparent electrode film 4 formed on a glass substrate 2, and subsequently the polyimide film is selectively removed by irradiating it with an ArF excimer laser beam having an energy intensity distribution with a flattened apex and having energy of 140 mJ/cm<SP>2</SP>or more and 400 mJ/cm<SP>2</SP>or less. Sublimation of the polyimide film 5 takes place by generating an abrasion reaction thereof, and an alignment layer pattern 5A with a predetermined shape is simply formed in a short period of time without damaging the metal film 3 and the transparent electrode film 4.
TW096104119A 2006-02-08 2007-02-05 Method for patterning alignment layer TW200739213A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006031245A JP2007212666A (en) 2006-02-08 2006-02-08 Method for patterning alignment layer

Publications (1)

Publication Number Publication Date
TW200739213A true TW200739213A (en) 2007-10-16

Family

ID=38491178

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096104119A TW200739213A (en) 2006-02-08 2007-02-05 Method for patterning alignment layer

Country Status (4)

Country Link
JP (1) JP2007212666A (en)
KR (1) KR20070080835A (en)
CN (1) CN100533230C (en)
TW (1) TW200739213A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI497193B (en) * 2008-02-19 2015-08-21 Asahi Glass Co Ltd Optical component for euvl and smoothing method thereof

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101380227B1 (en) * 2007-11-21 2014-04-02 엘지디스플레이 주식회사 Method of patterning alignment layer and fabricating liquid crystal panel using the same
WO2011125273A1 (en) * 2010-04-01 2011-10-13 シャープ株式会社 Method for manufacturing liquid crystal display panel, and liquid crystal display panel manufactured by the method
KR102074422B1 (en) * 2013-10-10 2020-02-07 삼성디스플레이 주식회사 Liquid crystal display and manufacturing method thereof
CN106132627B (en) * 2015-01-13 2018-09-07 罗芬-新纳技术有限责任公司 For carrying out scribing and the then method and system of progress chemical etching to fragile material
CN109922962B (en) * 2016-11-11 2021-04-27 株式会社Lg化学 Method for forming pattern of large-area liquid crystal device
KR102066472B1 (en) 2016-12-27 2020-01-15 주식회사 엘지화학 Method for forming wire portion of color changeable liquid crystal device and color changeable liquid crystal device
KR102178118B1 (en) 2017-09-25 2020-11-13 주식회사 엘지화학 Manufacturing method of film for liquid crystal alignment
CN110491888A (en) * 2019-08-30 2019-11-22 京东方科技集团股份有限公司 Display panel, array substrate and preparation method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI497193B (en) * 2008-02-19 2015-08-21 Asahi Glass Co Ltd Optical component for euvl and smoothing method thereof

Also Published As

Publication number Publication date
CN100533230C (en) 2009-08-26
JP2007212666A (en) 2007-08-23
KR20070080835A (en) 2007-08-13
CN101017287A (en) 2007-08-15

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