ATE500347T1 - Magnetische shunts in rohrtargets - Google Patents
Magnetische shunts in rohrtargetsInfo
- Publication number
- ATE500347T1 ATE500347T1 AT08019797T AT08019797T ATE500347T1 AT E500347 T1 ATE500347 T1 AT E500347T1 AT 08019797 T AT08019797 T AT 08019797T AT 08019797 T AT08019797 T AT 08019797T AT E500347 T1 ATE500347 T1 AT E500347T1
- Authority
- AT
- Austria
- Prior art keywords
- tube target
- magnetic shunts
- carrier body
- target
- target material
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/342—Hollow targets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/347—Thickness uniformity of coated layers or desired profile of target erosion
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Tires In General (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Control Of Combustion (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007057870 | 2007-11-29 | ||
DE102007060306A DE102007060306B4 (de) | 2007-11-29 | 2007-12-12 | Magnetische Shunts in Rohrtargets |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE500347T1 true ATE500347T1 (de) | 2011-03-15 |
Family
ID=40621309
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT08019797T ATE500347T1 (de) | 2007-11-29 | 2008-11-12 | Magnetische shunts in rohrtargets |
Country Status (4)
Country | Link |
---|---|
US (1) | US8137518B2 (de) |
CN (1) | CN101445914B (de) |
AT (1) | ATE500347T1 (de) |
DE (2) | DE102007060306B4 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8951394B2 (en) * | 2010-01-29 | 2015-02-10 | Angstrom Sciences, Inc. | Cylindrical magnetron having a shunt |
KR20130099194A (ko) * | 2011-04-12 | 2013-09-05 | 가부시키가이샤 아루박 | 타겟 및 타겟의 제조 방법 |
AT14912U1 (de) * | 2015-05-06 | 2016-08-15 | Plansee Se | Anschlussstück für Rohrtarget |
WO2022145244A1 (ja) * | 2020-12-28 | 2022-07-07 | デクセリアルズ株式会社 | スパッタリングターゲット部材及びその製造方法、スパッタ膜の製造方法、並びにマグネトロンスパッタリング装置 |
CN112899628A (zh) * | 2021-01-18 | 2021-06-04 | 福建阿石创新材料股份有限公司 | 一种可均匀溅射旋转硅靶材及其制备方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3318828C2 (de) * | 1983-05-24 | 1986-01-02 | Interpane Entwicklungs- und Beratungsgesellschaft mbH & Co. KG, 3471 Lauenförde | Verfahren zum Aufbonden von Targetmaterial |
JPH01147063A (ja) | 1987-12-03 | 1989-06-08 | Ulvac Corp | マグネトロン・スパッタ装置 |
WO1996015283A1 (en) | 1994-11-15 | 1996-05-23 | Tosoh Smd, Inc. | Method of bonding targets to backing plate member |
DE19622606C2 (de) | 1996-06-05 | 2002-02-28 | Applied Films Gmbh & Co Kg | Sputterkathode |
DE69937948D1 (de) | 1999-06-21 | 2008-02-21 | Bekaert Advanced Coatings N V | Magnetron mit beweglicher Magnetanordnung zur Kompensation des Erosionsprofils |
DE10063383C1 (de) * | 2000-12-19 | 2002-03-14 | Heraeus Gmbh W C | Verfahren zur Herstellung eines Rohrtargets und Verwendung |
JP2003138372A (ja) | 2001-10-30 | 2003-05-14 | Applied Materials Inc | スパッタリングターゲット及びスパッタリング装置 |
DE10336422A1 (de) | 2003-08-08 | 2005-03-17 | Applied Films Gmbh & Co. Kg | Vorrichtung zur Kathodenzerstäubung |
DE102004058316A1 (de) * | 2004-12-02 | 2006-06-08 | W.C. Heraeus Gmbh | Rohrförmiges Sputtertarget |
DE202005015067U1 (de) | 2005-09-23 | 2005-12-29 | Applied Films Gmbh & Co. Kg | Kathodenanordnung, Beschichtungskompartment und Beschichtungsanlage |
DE102006026005A1 (de) * | 2006-06-01 | 2007-12-06 | W.C. Heraeus Gmbh | Kaltgepresste Sputtertargets |
-
2007
- 2007-12-12 DE DE102007060306A patent/DE102007060306B4/de not_active Expired - Fee Related
-
2008
- 2008-11-12 DE DE502008002715T patent/DE502008002715D1/de active Active
- 2008-11-12 AT AT08019797T patent/ATE500347T1/de active
- 2008-11-25 US US12/277,808 patent/US8137518B2/en not_active Expired - Fee Related
- 2008-12-01 CN CN2008101792394A patent/CN101445914B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101445914B (zh) | 2012-08-22 |
DE502008002715D1 (de) | 2011-04-14 |
CN101445914A (zh) | 2009-06-03 |
DE102007060306A1 (de) | 2009-06-10 |
US20090139861A1 (en) | 2009-06-04 |
DE102007060306B4 (de) | 2011-12-15 |
US8137518B2 (en) | 2012-03-20 |
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