ATE458278T1 - Magnetvorrichtung, die einen magnetoresistiven stapel und mindestens einen nanokontakt umfasst - Google Patents

Magnetvorrichtung, die einen magnetoresistiven stapel und mindestens einen nanokontakt umfasst

Info

Publication number
ATE458278T1
ATE458278T1 AT09356014T AT09356014T ATE458278T1 AT E458278 T1 ATE458278 T1 AT E458278T1 AT 09356014 T AT09356014 T AT 09356014T AT 09356014 T AT09356014 T AT 09356014T AT E458278 T1 ATE458278 T1 AT E458278T1
Authority
AT
Austria
Prior art keywords
nanocontact
stack
electrode
magnetorresistive
magnetic device
Prior art date
Application number
AT09356014T
Other languages
English (en)
Inventor
Veronique Sousa
Jean-Francois Nodin
Marie-Claire Cyrille
Bertrand Delaet
Original Assignee
Commissariat Energie Atomique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique filed Critical Commissariat Energie Atomique
Application granted granted Critical
Publication of ATE458278T1 publication Critical patent/ATE458278T1/de

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/10Magnetoresistive devices
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03BGENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
    • H03B15/00Generation of oscillations using galvano-magnetic devices, e.g. Hall-effect devices, or using superconductivity effects
    • H03B15/006Generation of oscillations using galvano-magnetic devices, e.g. Hall-effect devices, or using superconductivity effects using spin transfer effects or giant magnetoresistance
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B61/00Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Hall/Mr Elements (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)
AT09356014T 2008-04-03 2009-02-19 Magnetvorrichtung, die einen magnetoresistiven stapel und mindestens einen nanokontakt umfasst ATE458278T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0852236A FR2929759B1 (fr) 2008-04-03 2008-04-03 Dispositif magnetique integrant un empilement magnetoresistif

Publications (1)

Publication Number Publication Date
ATE458278T1 true ATE458278T1 (de) 2010-03-15

Family

ID=39864814

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09356014T ATE458278T1 (de) 2008-04-03 2009-02-19 Magnetvorrichtung, die einen magnetoresistiven stapel und mindestens einen nanokontakt umfasst

Country Status (6)

Country Link
US (1) US8148709B2 (de)
EP (1) EP2107623B1 (de)
JP (1) JP2009267369A (de)
AT (1) ATE458278T1 (de)
DE (1) DE602009000005D1 (de)
FR (1) FR2929759B1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2939256B1 (fr) * 2008-12-01 2011-06-17 Commissariat Energie Atomique Oscillateur radiofrequence a vanne de spin ou a jonction tunnel
KR20110008553A (ko) * 2009-07-20 2011-01-27 삼성전자주식회사 반도체 메모리 장치 및 그 제조 방법
US8164861B2 (en) * 2009-12-11 2012-04-24 Hitachi Global Storage Technologies Netherlands B.V. Spin torque oscillator sensor employing antiparallel coupled oscilation layers
FR2969425B1 (fr) * 2010-12-16 2013-08-23 Commissariat Energie Atomique Circuit oscillant a jonctions a effet de magnétorésistance géante

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6734455B2 (en) * 2001-03-15 2004-05-11 Micron Technology, Inc. Agglomeration elimination for metal sputter deposition of chalcogenides
US6730949B2 (en) * 2001-03-22 2004-05-04 Kabushiki Kaisha Toshiba Magnetoresistance effect device
US6709958B2 (en) * 2001-08-30 2004-03-23 Micron Technology, Inc. Integrated circuit device and fabrication using metal-doped chalcogenide materials
US20030047765A1 (en) * 2001-08-30 2003-03-13 Campbell Kristy A. Stoichiometry for chalcogenide glasses useful for memory devices and method of formation
US6963500B2 (en) * 2003-03-14 2005-11-08 Applied Spintronics Technology, Inc. Magnetic tunneling junction cell array with shared reference layer for MRAM applications
EP1548702A1 (de) * 2003-12-24 2005-06-29 Interuniversitair Microelektronica Centrum Vzw Verfahren zur superschnellen Steuerung magnetischer Zelle sowie zugehörige Vorrichtungen
JP4877575B2 (ja) * 2005-05-19 2012-02-15 日本電気株式会社 磁気ランダムアクセスメモリ
JP4504273B2 (ja) * 2005-07-06 2010-07-14 株式会社東芝 磁気抵抗効果素子および磁気メモリ
US7635903B2 (en) * 2005-09-13 2009-12-22 Everspin Technologies, Inc. Oscillator and method of manufacture
JP4444241B2 (ja) * 2005-10-19 2010-03-31 株式会社東芝 磁気抵抗効果素子、磁気ランダムアクセスメモリ、電子カード及び電子装置
FR2892871B1 (fr) * 2005-11-02 2007-11-23 Commissariat Energie Atomique Oscillateur radio frequence a courant elelctrique polarise en spin
US7732881B2 (en) * 2006-11-01 2010-06-08 Avalanche Technology, Inc. Current-confined effect of magnetic nano-current-channel (NCC) for magnetic random access memory (MRAM)
FR2904724B1 (fr) * 2006-08-03 2011-03-04 Commissariat Energie Atomique Dispositif magnetique en couches minces a forte polarisation en spin perpendiculaire au plan des couches, jonction tunnel magnetique et vanne de spin mettant en oeuvre un tel dispositif
US7532506B2 (en) * 2007-09-17 2009-05-12 Qimonda Ag Integrated circuit, cell arrangement, method of operating an integrated circuit, memory module
US7936027B2 (en) * 2008-01-07 2011-05-03 Magic Technologies, Inc. Method of MRAM fabrication with zero electrical shorting
FR2939256B1 (fr) * 2008-12-01 2011-06-17 Commissariat Energie Atomique Oscillateur radiofrequence a vanne de spin ou a jonction tunnel

Also Published As

Publication number Publication date
FR2929759B1 (fr) 2010-04-16
EP2107623A1 (de) 2009-10-07
US8148709B2 (en) 2012-04-03
DE602009000005D1 (de) 2010-04-01
US20090250775A1 (en) 2009-10-08
FR2929759A1 (fr) 2009-10-09
EP2107623B1 (de) 2010-02-17
JP2009267369A (ja) 2009-11-12

Similar Documents

Publication Publication Date Title
EP2605283A3 (de) In-situ-gewachsenes Gate-Dielektrikum und Feldplatten-Dielektrikum
GB2495826B (en) Patterning contacts in carbon nanotube devices
EP3876290A3 (de) Halbleitervorrichtungen
WO2008130465A3 (en) Nanodevices for spintronics methods of using same
SG196852A1 (en) Semiconductor device and method of forming interconnect structure over seed layer on contact pad of semiconductor die without undercutting seed layer beneath interconnect structure
JP2012068627A5 (ja) 半導体装置の作製方法
WO2012143784A3 (en) Semiconductor device and manufacturing method thereof
JP2013042154A5 (de)
WO2013025994A3 (en) Spin hall effect magnetic apparatus, method and applications
WO2011066579A3 (en) Fabrication and integration of devices with top and bottom electrodes including magnetic tunnel junctions
TW200742060A (en) Method for making an electronic device including a poled superlattice having a net electrical dipole moment
WO2014028598A3 (en) Method of manufacturing a magnetoresistive-based device
JP2008511169A5 (de)
JP2011501420A5 (de)
WO2009038897A3 (en) Nanowire battery methods and arrangements
WO2009126204A8 (en) High aspect ratio openings
WO2011088375A3 (en) Spin torque driven magnetic tunnel junction with non-uniform current path and composite hardmask architecture for forming the same
EP2779246A3 (de) Verfahren zur Herstellung einer Halbleitervorrichtung mit hoher Elektronenmobilität und Struktur dafür
ATE458278T1 (de) Magnetvorrichtung, die einen magnetoresistiven stapel und mindestens einen nanokontakt umfasst
SG178945A1 (en) A sensor arrangement
JP2012018919A5 (de)
DE60313660D1 (de) Synthetisch antiferromagnetische struktur für ein magnetoelektronisches gerät
WO2011028581A3 (en) Charge-trap based memory
EP2453635A3 (de) Tragbares Endgerät und Verfahren zu dessen Herstellung
GB201111513D0 (en) Memory resistors

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties